TY  - JOUR
A1  - Wu, Y. S.
A1  - Becker, Charles R.
A1  - Waag, A.
A1  - Schmiedl, R.
A1  - Einfeldt, S.
A1  - Landwehr, G.
T1  - Oxygen on the (100) CdTe surface
N2  - We have investigated oxygen on CdTe substrates by means of x-ray photoelectron spectroscopy (XPS) and reflection high-energy electron diffraction (RHEED). A Te oxide layer that was at least 15 A thick was found on the surface of as-delivered CdTe substrates that were mechanically polished. This oxide is not easily evaporated at temperatures lower than 350°C. Furthermore, heating in air, which further oxidizes the CdTe layer, should be avoided. Etching with HCI acid (15% HCl) for at least 20 s and then rinsing with de-ionized water reduces the Te oxide layer on the surface down to 4% of a monoatomic layer. However, according to XPS measurements of the 0 Is peak, 20%-30% of a monoatomic layer of oxygen remains on the surface, which can be eliminated by heating at temperatures ranging between 300 and 340 cC. The RHEED patterns for a molecular beam epitaxially (MBE)-grown CdTe film on a (lOO) CdTe substrate with approximately one monoatomic layer of oxidized Te on the surface lose the characteristics of the normal RHEED pattems for a MBE-grown CdTe film on an oxygen-free CdTe substrate.
Y1  - 1993
UR  - https://opus.bibliothek.uni-wuerzburg.de/frontdoor/index/index/docId/3182
UR  - https://nbn-resolving.org/urn:nbn:de:bvb:20-opus-37869
ER  -