@phdthesis{Schmitz2016,
  author    = {Schmitz, Tobias},
  title     = {Functional coatings by physical vapor deposition (PVD) for biomedical applications},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-144825},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2016},
  abstract  = {Metals are the most used materials for implant devices, especially in orthopedics, but despite their long history of application issues such as material failure through wear and corrosion remain unsolved leading to a certain number of revision surgeries. Apart from the problems associated with insufficient material properties, another serious issue is an implant associated infection due to the formation of a biofilm on the surface of the material after implantation. Thus, improvements in implant technology are demanded, especially since there is a projected rise of implants needed in the future. Surface modification methods such as physical vapour deposition (PVD), oxygen diffusion hardening and electrochemical anodization have shown to be efficient methods to improve the surfaces of metallic bulk materials regarding biomedical issues. This thesis was focused on the development of functional PVD coatings that are suitable for further treatment with surface modification techniques originally developed for bulk metals. The aim was to precisely adjust the surface properties of the implant according to the targeted application to prevent possible failure mechanisms such as coating delamination, wear or the occurrence of post-operative infections. Initially,  tantalum layers with approx 5 µm thickness were deposited at elevated substrate temperatures on cp Ti by RF magnetron sputtering. Due to the high affinity of tantalum to oxygen, these coatings are known to provide a self healing capacity since the rapid oxide formation is known to close surface cracks. Here, the work aimed to reduce the abrupt change of mechanical properties between the hard and brittle coating and the ductile substrate by creating an oxygen diffusion zone. It was found that the hardness and adhesion could be significantly increased when the coatings were treated afterwards by oxygen diffusion hardening in a two step process. Firstly, the surface was oxidized at a pressure of 6.7•10-3 mbar at 350 450 °C, followed by 1-2 h annealing in oxygen-free atmosphere at the same temperature leading to a diffusion of oxygen atoms into deeper parts of the substrate as proved by X-ray diffraction (XRD) analysis. The hereby caused mechanical stress in the crystal lattice led to an increase in Vickers hardness of the Ta layers from 570 HV to over 900 HV. Investigations into the adhesion of oxygen diffusion treated samples by Rockwell measurements demonstrated an increase of critical force for coating delamination from 12 N for untreated samples up to 25 N for diffusion treated samples. In a second approach, the development of modular targets aimed to produce functional coatings by metallic doping of titanium with biologically active agents. This was demonstrated by the fabrication of antimicrobial Ti(Ag) coatings using a single magnetron sputtering source equipped with a titanium target containing implemented silver modules under variation of bias voltage and substrate temperature. The deposition of both Ti and Ag was confirmed by X-ray diffraction and a clear correlation between the applied sputtering parameters and the silver content of the coatings was demonstrated by ICP-MS and EDX. Surface-sensitive XPS measurements revealed that higher substrate temperatures led to an accumulation of Ag in the near-surface region, while the application of a bias voltage had the opposite effect. SEM and AFM microscopy revealed that substrate heating during film deposition supported the formation of even and dense surface layers with small roughness values, which could even be enforced by applying a substrate bias voltage. Additional elution measurements using ICP-MS showed that the release kinetics depended on the amount of silver located at the film surface and hence could be tailored by variation of the sputter parameters. In a final step, the applied Ti and Ti(Ag) coatings deposited on cp Ti, stainless steel (316L) and glass substrates were subsequently nanostructured using a self-ordering process induced by electrochemical anodization in aqueous fluoride containing electrolytes. SEM analysis showed that nanotube arrays could be grown from the Ti and Ti(Ag) coatings deposited at elevated temperatures on any substrate, whereby no influence of the substrate on nanotube morphology could be observed. EDX measurements indicated that the anodization process led to the selective etching of Ti from Ti(Ag) coating. Further experiments on coatings deposited on glass surfaces revealed that moderate substrate temperatures during deposition resulting in smooth Ti layers as determined by AFM measurements, are favorable for the generation of highly ordered nanotube arrays. Such arrays exhibited superhydrophilic behavior as proved by contact angle measurements. XRD analysis revealed that the nanostructured coatings were amorphous after anodization but could be crystallized to anatase structure by thermal treatment at temperatures of 450°C.},
  subject      = {PVD-Verfahren},
  language  = {en}
}
@phdthesis{Bonfig2004,
  author    = {Bonfig, Jochen},
  title     = {Tantalmodifikationen auf Implantat-Stahl f{\"u}r kardiale Stents, Herstellung und Charakterisierung},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-13807},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2004},
  abstract  = {Mit Hilfe der PVD-Technik (Physical Vapour Disposition) hergestellte Tantal/Tantaloxidschichten auf Edelstahlpl{\"a}ttchen wurden bez{\"u}glich ihrer mechanischen Eigenschaften und ihrer Biokompatibilit{\"a}t untersucht. Dabei kamen als Untersuchungsmethoden die Rasterelektronenmikroskopie (REM), das XRD (X-Ray Diffraction) und die Sekund{\"a}r-Neutralteilchen-Massen-Spektrometrie (SNMS) zum Einsatz. Abschließend wurden die Repassivierungseigenschaften der Oberfl{\"a}che des Systems Stahl/Tantal/Tantaloxid unter mechanischer Belastung bestimmt.},
  language  = {de}
}
@phdthesis{Schmidt2002,
  author    = {Schmidt, Simone},
  title     = {Phosphorylid-Chemie an Niob(V)- und Tantal(V)-N-Organoimiden},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-5498},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2002},
  abstract  = {Ziel der vorliegenden Arbeit war es, h{\"o}hervalente Imido- und Amidoverbindungen des Niobs und Tantals zu synthetisieren und deren Reaktivit{\"a}t gegen{\"u}ber Phosphoryliden zu untersuchen. Klassische Phosphorylid-Komplexe des Typs [LnM-CHR-PR'3] (R = Alkyl, Aryl, etc.) sind in der Literatur zahlreiche beschrieben. Metall-substituierte Phosphorylide, so genannte a-Phosphoniomethyliden-Komplexe der Art [LnM=CH-PR3] sind dagegen vergleichsweise wenig untersucht, wobei sich die Arbeiten vor allem mit tetravalenten Metallocenderivaten der 4. Gruppe, des Urans sowie im eigenen Arbeitskreis mit den Elementen der VI. Nebengruppe und des Rheniums besch{\"a}ftigen. Vertreter von Imidoyl-substituierten Ylidkomplexen des Niobs und Tantals, die isolobal zu den Metallocenen der IV. Nebengruppe und der Diimide der VI. Nebengruppe sind, waren dagegen zu Beginn dieser Studien g{\"a}nzlich unbekannt. Im Vergleich zu den im eigenen Arbeitskreis hergestellten Molybd{\"a}n- und Wolframverbindungen der allgemeinen Zusammensetzung [M(NtBu)2(CHPR3)R'] sollten Komplexe der 5. Gruppe [(h5-C5R5)M(NtBu)(CHPR3)R'] noch st{\"a}rker polare und daher reaktivere Metall-Kohlenstoff-Bindungen enthalten. Diese galt es zu synthetisieren und in ihrer Reaktivit{\"a}t zu untersuchen. Die in dieser Arbeit beschriebenen Verbindungen umfassen Halbsandwichkomplexe des Typs [(h5-C5R5)M(NtBu)R'2] (M = Nb, Ta; R = H, Me), Metallocen-Imide [(h5-C5H5)2M(NtBu)Cl], Imido-verbr{\"u}ckten d1-Dimere [(h5-C5H5)M(m-NtBu)Cl]2, a-Phosphonio(methyliden)-Komplexe, den Bis-a-phosphonio(methyliden)-Komplex [(h5-C5Me5)Nb(NtBu)(CHPPh2Me)2], Ylid-Addukte [(h5-C5Me5)MCl4(CH2PPh3)], h2-Iminoacyl-, h2-Acyl-, Carboxylato-, Dithiocarboxylato-Komplexe gebildet durch Insertionsreaktionen an Ylid- und Amido-Komplexen, Biaryl-Metallacyclen durch Insertion von Ylid- und Amidokomplexen in diastereotope Biaryllactone, Bisimido-Tantalmetallate, Imido-Amido-Pyridin-Addukte [M(NtBu)(NHtBu)Cl2py2], der tris-Phosphonio(methyliden)-Komplex [Ta(NtBu)(CHPPh3)3.},
  subject      = {Niobverbindungen},
  language  = {de}
}