@phdthesis{Ames2015,
  author    = {Ames, Christopher},
  title     = {Molecular Beam Epitaxy of 2D and 3D HgTe, a Topological Insulator},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-151136},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2015},
  abstract  = {In the present thesis the MBE growth and sample characterization of HgTe structures is investigated and discussed. Due to the first experimental discovery of the quantum Spin Hall effect (QSHE) in HgTe quantum wells, this material system attains a huge interest in the spintronics society. Because of the long history of growing Hg-based heterostructures here at the Experimentelle Physik III in W{\"u}rzburg, there are very good requirements to analyze this material system more precisely and in new directions. Since in former days only doped HgTe quantum wells were grown, this thesis deals with the MBE growth in the (001) direction of undoped HgTe quantum wells, surface located quantum wells and three dimensional bulk layers. All Hg-based layers were grown on CdTe substrates which generate strain in the layer stack and provide therefore new physical effects. In the same time, the (001) CdTe growth was investigated on n-doped (001) GaAs:Si because the Japanese supplier of CdTe substrates had a supply bottleneck due to the Tohoku earthquake and its aftermath in 2011. After a short introduction of the material system, the experimental techniques were demonstrated and explained explicitly. After that, the experimental part of this thesis is displayed. So, the investigation of the (001) CdTe growth on (001) GaAs:Si is discussed in chapter 4. Firstly, the surface preparation of GaAs:Si by oxide desorption is explored and analyzed. Here, rapid thermal desorption of the GaAs oxide with following cool down in Zn atmosphere provides the best results for the CdTe due to small holes at the surface, while e.g. an atomic flat GaAs buffer deteriorates the CdTe growth quality. The following ZnTe layer supplies the (001) growth direction of the CdTe and exhibits best end results of the CdTe for 30 seconds growth time at a flux ratio of Zn/Te ~ 1/1.2. Without this ZnTe layer, CdTe will grow in the (111) direction. However, the main investigation is here the optimization of the MBE growth of CdTe. The substrate temperature, Cd/Te flux ratio and the growth time has to be adjusted systematically. Therefore, a complex growth process is developed and established. This optimized CdTe growth process results in a RMS roughness of around 2.5 nm and a FWHM value of the HRXRD w-scan of 150 arcsec. Compared to the literature, there is no lower FWHM value traceable for this growth direction. Furthermore, etch pit density measurements show that the surface crystallinity is matchable with the commercial CdTe substrates (around 1x10^4 cm^(-2)). However, this whole process is not completely perfect and offers still room for improvements. The growth of undoped HgTe quantum wells was also a new direction in research in contrast to the previous n-doped grown HgTe quantum wells. Here in chapter 5, the goal of very low carrier densities was achieved and therefore it is now possible to do transport experiments in the n - and p - region by tuning the gate voltage. To achieve this high sample quality, very precise growth of symmetric HgTe QWs and their HRXRD characterization is examined. Here, the quantum well thickness can now determined accurate to under 0.3 nm. Furthermore, the transport analysis of different quantum well thicknesses shows that the carrier density and mobility increase with rising HgTe layer thickness. However, it is found out that the band gap of the HgTe QW closes indirectly at a thickness of 11.6 nm. This is caused by the tensile strained growth on CdTe substrates. Moreover, surface quantum wells are studied. These quantum wells exhibit no or a very thin HgCdTe cap. Though, oxidization and contamination of the surface reduces here the carrier mobility immensely and a HgCdTe layer of around 5 nm provides the pleasing results for transport experiments with superconductors connected to the topological insulator [119]. A completely new achievement is the realization of MBE growth of HgTe quantum wells on CdTe/GaAs:Si substrates. This is attended by the optimization of the CdTe growth on GaAs:Si. It exposes that HgTe quantum wells grown in-situ on optimized CdTe/GaAs:Si show very nice transport data with clear Hall plateaus, SdH oscillations, low carrier densities and carrier mobilities up to 500 000 cm^2/Vs. Furthermore, a new oxide etching process is developed and analyzed which should serve as an alternative to the standard HCl process which generates volcano defects at some time. However, during the testing time the result does not differ in Nomarski, HRXRD, AFM and transport measurements. Here, long-time tests or etching and mounting in nitrogen atmosphere may provide new elaborate results. The main focus of this thesis is on the MBE growth and standard characterization of HgTe bulk layers and is discussed in chapter 6. Due to the tensile strained growth on lattice mismatched CdTe, HgTe bulk opens up a band gap of around 22 meV at the G-point and exhibits therefore its topological surface states. The analysis of surface condition, roughness, crystalline quality, carrier density and mobility via Nomarski, AFM, XPS, HRXRD and transport measurements is therefore included in this work. Layer thickness dependence of carrier density and mobility is identified for bulk layer grown directly on CdTe substrates. So, there is no clear correlation visible between HgTe layer thickness and carrier density or mobility. So, the carrier density is almost constant around 1x10^11 cm^(-2) at 0 V gate voltage. The carrier mobility of these bulk samples however scatters between 5 000 and 60 000 cm^2/Vs almost randomly. Further experiments should be made for a clearer understanding and therefore the avoidance of unusable bad samples.But, other topological insulator materials show much higher carrier densities and lower mobility values. For example, Bi2Se3 exhibits just density values around 1019 cm^(-2) and mobility values clearly below 5000 cm2/Vs. The carrier density however depends much on lithography and surface treatment after growth. Furthermore, the relaxation behavior and critical thickness of HgTe grown on CdTe is determined and is in very good agreement with theoretical prediction (d_c = 155 nm). The embedding of the HgTe bulk layer between HgCdTe layers created a further huge improvement. Similar to the quantum well structures the carrier mobility increases immensely while the carrier density levels at around 1x10^11 cm^(-2) at 0 V gate voltage as well. Additionally, the relaxation behavior and critical thickness of these barrier layers has to be determined. HgCdTe grown on commercial CdTe shows a behavior as predicted except the critical thickness which is slightly higher than expected (d_c = 850 nm). Otherwise, the relaxation of HgCdTe grown on CdTe/GaAs:Si occurs in two parts. The layer is fully strained up to 250 nm. Between 250 nm and 725 nm the HgCdTe film starts to relax randomly up to 10 \%. The relaxation behavior for thicknesses larger than 725 nm occurs than linearly to the inverse layer thickness. A explanation is given due to rough interface conditions and crystalline defects of the CdTe/GaAs:Si compared to the commercial CdTe substrate. HRXRD and AFM data support this statement. Another point is that the HgCdTe barriers protect the active HgTe layer and because of the high carrier mobilities the Hall measurements provide new transport data which have to be interpreted more in detail in the future. In addition, HgTe bulk samples show very interesting transport data by gating the sample from the top and the back. It is now possible to manipulate the carrier densities of the top and bottom surface states almost separately. The back gate consisting of the n-doped GaAs substrate and the thick insulating CdTe buffer can tune the carrier density for Delta(n) ~ 3x10^11 cm^(-2). This is sufficient to tune the Fermi energy from the p-type into the n-type region [138]. In this thesis it is shown that strained HgTe bulk layers exhibit superior transport data by embedding between HgCdTe barrier layers. The n-doped GaAs can here serve as a back gate. Furthermore, MBE growth of high crystalline, undoped HgTe quantum wells shows also new and extended transport output. Finally, it is notable that due to the investigated CdTe growth on GaAs the Hg-based heterostructure MBE growth is partially independent from commercial suppliers.},
  subject      = {Quecksilbertellurid},
  language  = {en}
}
@phdthesis{Bass2011,
  author    = {Baß, Utz},
  title     = {Analysis of MBE-grown II-VI Hetero-Interfaces and Quantum-Dots by Raman Spectroscopy},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-73413},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2011},
  abstract  = {The material system of interest in this thesis are II-VI-semiconductors. The first part of this thesis focuses on the formation of self-assembled CdSe-based quantum dots (QD) on ZnSe. The lattice constants of ZnSe and CdSe differ as much as about 7\\% and therefore a CdSe layer grown on top of ZnSe experiences a huge strain. The aspired strain relief constitutes in the self-assembly of QDs (i.e. a roughened layer structure). Additionally, this QD layer is intermixed with Zn as this is also a possibility to decrease the strain in the layer. For CdSe on ZnSe, in Molecular Beam Epitaxy (MBE), various QD growth procedures were analysed with respect to the resulting Cd-content of the non-stoichiometric ternary (Zn,Cd)Se. The evaluation was performed by Raman Spectroscopy as the phonon frequency depends on the Cd-content. The second part of the thesis emphasis on the interface properties of n-ZnSe on n-GaAs. Different growth start procedures of the ZnSe epilayer may lead to different interface configurations with characteristic band-offsets and carrier depletion layer widths. The analysis is mainly focused on the individual depletion layer widths in the GaAs and ZnSe. This non-destructive analysis is performed by evaluating the Raman signal which comprises of phonon scattering from the depleted regions and coupled plasmon-phonon scattering from regions with free carriers.},
  subject      = {Zwei-Sechs-Halbleiter},
  language  = {en}
}
@phdthesis{Ebel2013,
  author    = {Ebel, Lars Frederik},
  title     = {Molecular Beam Epitaxy and Characterization of Ferromagnetic Bulk and Thin (Ga,Mn)As Layers/Heterostructures},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-83942},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2013},
  abstract  = {Die vorgelegte Arbeit untersucht den ferromagnetischen Halbleiter (Ga,Mn)As mit seinen komplexen Eigenschaften im Hinblick auf die Optimierung der Materialeigenschaften sehr d{\"u}nner (4 nm) (Ga,Mn)As Schichten, welche mit der Technologie der Molekularstrahlepitaxie (MBE) hergestellt wurden. Zuerst werden die strukturellen, ferromagnetischen und elektrischen Eigenschaften von (Ga,Mn)As vorgestellt. Die Einfl{\"u}sse von Punktdefekten, Grenzfl{\"a}chen- und Oberfl{\"a}chen-Effekten auf dicke und d{\"u}nne (Ga,Mn)As Schichten werden mit Hilfe von vereinfachten, selbstkonsistenten Berechnungen der Bandkantenverl{\"a}ufe diskutiert. Der Experimental-Teil ist in drei Teile unterteilt: Der erste Teil untersucht den Einfluss der epitaktischen Wachstumsbedingungen auf die elektrischen und magnetischen Eigenschaften von dicken (70 nm) (Ga,Mn)As Schichten. Der zweite Teil f{\"u}hrt ein alternatives, parabolisches Mn-Dotierprofil mit effektiver Schichtdicke von 4 nm ein im Vergleich zu einer gleich d{\"u}nnen Schicht mit homogenem Mn-Dotierprofil. Es konnten einerseits verbesserte Eigenschaften dieser parabolischen Schicht erreicht werden, anderseits sind die magnetischen und elektrischen Eigenschaften vergleichbar zu dicken (Ga,Mn)As Schichten mit gleichem Mn-Gehalt von 4\%. MBE Wachstumsbedingungen f{\"u}r (Ga,Mn)As Schichten mit parabolischem Mn-Dotierprofil und verringertem nominellem Mn-Gehalt von 2.5\% wurden ebenfalls untersucht. Ein schmales Wachstumsfenster wurde hierbei ermittelt, in dem die Tieftemperatur-Eigenschaften verbessert sind. Der letzte Teil der Arbeit pr{\"a}sentiert eine Anwendung der magnetischen Anisotropiekontrolle einer dicken (Ga,Mn)As Schicht.},
  subject      = {Molekularstrahlepitaxie},
  language  = {en}
}
@phdthesis{Frey2011,
  author    = {Frey, Alexander},
  title     = {Spin-Dependent Tunneling and Heterovalent Heterointerface Effects in Diluted Magnetic II-VI Semiconductor Heterostructures},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-78133},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2011},
  abstract  = {The contribution of the present thesis consists of three parts. They are centered around investigating certain semiconductor heterointerfaces relevant to spin injection, exploring novel, diluted magnetic single barrier tunneling structures, and further developing diluted magnetic II-VI resonant tunneling diodes.},
  subject      = {Zwei-Sechs-Halbleiter},
  language  = {en}
}
@phdthesis{Gerhard2014,
  author    = {Gerhard, Felicitas Irene Veronika},
  title     = {Controlling structural and magnetic properties of epitaxial NiMnSb for application in spin torque devices},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-111690},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2014},
  abstract  = {This thesis describes the epitaxial growth of the Half-Heusler alloy NiMnSb by molecular beam epitaxy. Its structural and magnetic properties are controlled by tuning the composition and the resulting small deviation from stoichiometry. The magnetic in-plane anisotropy depends on the Mn concentration of the sample and can be controlled in both strength and orientation. This control of the magnetic anisotropy allows for growing NiMnSb layers of a given thickness and magnetic properties as requested for the design of NiMnSb-based devices. The growth and characterization of NiMnSb-ZnTe-NiMnSb heterostructures is presented - such heterostructures form an all-NiMnSb based spin-valve and are a promising basis for spin torque devices.},
  subject      = {Nickelverbindungen},
  language  = {en}
}
@phdthesis{Kagerer2024,
  author    = {Kagerer, Philipp Thomas},
  title     = {Two-Dimensional Ferromagnetism and Topology at the Surface of MnBi\(_2\)Te\(_4\) - Bi\(_2\)Te\(_3\) Heterostructures - MBE Growth, Magnetism and Electronic Properties},
  doi       = {10.25972/OPUS-36012},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-360121},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2024},
  abstract  = {In this thesis, a model system of a magnetic topological heterostructure is studied, namely a heterosystem consisting of a single ferromagnetic septuple-layer (SL) of \(MnBi_2Te_4\) on the surface of the three-dimensional topological insulator \(Bi_2Te_3\). Using MBE and developing a specialized experimental setup, the first part of this thesis deals with the growth of \(Bi_2Te_3\) and thin films of \(MnBi_2Te_4\) on \(BaF_2\)-substrates by the co-evaporation of its binary constituents. The structural analysis is conducted along several suitable probes such as X-ray diffraction (XRD, XRR), AFM and scanning tunnelling electron microscopy (STEM). It is furthermore found that the growth of a single septuple-layer of \(MnBi_2Te_4\) on the surface of \(Bi_2Te_3\) can be facilitated. By using X-ray absorption and circular magnetic dichroism (XAS, XMCD), the magnetic properties of \(MnBi_2Te_4\) are explored down to the monolayer limit. The layered nature of the vdW crystal and a strong uniaxial magnetocrystalline anisotropy establish stable out-of plane magnetic order at the surface of \(MnBi_2Te_4\), which is stable even down to the 2D limit. Pushing the material system to there, i.e. a single SL \(MnBi_2Te_4\) further allows to study the phase transition of this 2D ferromagnet and extract its critical behaviour with \(T_c \, = \, 14.89~k\) and \(\beta \, = \, 0.484\). Utilizing bulk crystals of the ferromagnetic \(Fe_3GeTe_2\) as substrate allows to influence, enhance and bias the magnetism in the single SL of \(MnBi_2Te_4\). By growing heterostructures of the type \(MnBi_2Te_4\) -- n layer \(Bi_2Te_3\) -- \(Fe_3GeTe_2\)for n between 0 and 2, it is shown, that a considerable magnetic coupling can be introduced between the \(MnBi_2Te_4\) top-layer and the substrate. Finally the interplay between topology and magnetism in the ferromagnetic extension is studied directly by angle-resolved photoemission spectroscopy. The heterostructure is found to host a linearly dispersing TSS at the centre of the Brillouin zone. Using low temperature and high-resolution ARPES a large magnetic gap opening of \(\sim\) 35 meV is found at the Dirac point of the TSS. By following its temperature evolution, it is apparent that the scaling behaviour coincides with the magnetic order parameter of the modified surface.},
  subject      = {Molekularstrahlepitaxie},
  language  = {en}
}
@phdthesis{Leubner2017,
  author    = {Leubner, Philipp},
  title     = {Strain-engineering of the Topological Insulator HgTe},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-152446},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2017},
  abstract  = {The subject of this thesis is the control of strain in HgTe thin-film crystals. Such systems are members of the new class of topological insulator materials and therefore of special research interest. A major task was the experimental control of the strain in the HgTe films. This was achieved by a new epitaxial approach and confirmed by cristallographic analysis and magneto-transport measurements. In this work, strain was induced in thin films by means of coherent epitaxy on substrate crystals. This means that the film adopts the lattice constant of the substrate in the plane of the substrate-epilayer interface. The level of strain is determined by the difference between the strain-free lattice constants of the substrate and epilayer material (the so-called lattice mismatch). The film responds to an in-plane strain with a change of its lattice constant perpendicular to the interface. This relationship is crucial for both the correct interpretation of high resolution X-ray diffraction (HRXRD) measurements, and the precise determination of the band dispersion. The lattice constant of HgTe is smaller than the lattice constant of CdTe. Therefore, strain in HgTe is tensile if it is grown on a CdTe substrate. In principle, compressive strain can be achieved by using an appropriate \(\text{Cd}_{1-x}\text{Zn}_{x}\text{Te}\) substrate. This concept was modified and applied in this work. Epilayers have been fabricated by molecular-beam epitaxy (MBE). The growth of thick buffer layers of CdTe on GaAs:Si was established as an alternative to commercial CdTe and \(text{Cd}_{0.96}\text{Zn}_{0.04}\text{Te}\) substrates. The growth conditions have been optimized by an analysis of atomic force microscopy and HRXRD studies. HRXRD measurements reveal a power-law increase of the crystal quality with increasing thickness. Residual strain was found in the buffer layers, and was attributed to a combination of finite layer thickness and mismatch of the thermal expansion coefficients of CdTe and GaAs. In order to control the strain in HgTe epilayers, we have developed a new type of substrate with freely adjustable lattice constant. CdTe-\(\text{Cd}_{0.5}\text{Zn}_{0.5}\text{Te}\) strained-layer-superlattices have been grown by a combination of MBE and atomic-layer epitaxy (ALE), and have been analyzed by HRXRD. ALE of the \(\text{Cd}_{0.5}\text{Zn}_{0.5}\text{Te}\) layer is self-limiting to one monolayer, and the effective lattice constant can be controlled reproducibly and straightforward by adjusting the CdTe layer thickness. The crystal quality has been found to degrade with increasing Zn-fraction. However, the effect is less drastic compared to single layer \(\text{Cd}_{1-x}\text{Zn}_{x}\text{Te}\) solid solutions. HgTe quantum wells (QWs) sandwiched in between CdHgTe barriers have been fabricated in a similar fashion on superlattices and conventional CdTe and \(\text{Cd}_{0.96}\text{Zn}_{0.04}\text{Te}\) substrates. The lower critical thickness of the CdHgTe barrier material grown on superlattice substrates had to be considered regarding the sample design. The electronic properties of the QWs depend on the strain and thickness of the QW. We have determined the QW thickness with an accuracy of \(\pm\)0.5 nm by an analysis of the beating patterns in the thickness fringes of HRXRD measurements and X-ray reflectometry measurements. We have, for the first time, induced compressive strain in HgTe QWs by an epitaxial technique (i.e. the effective lattice constant of the superlattice is lower compared to the lattice constant of HgTe). The problem of the lattice mismatch between superlattice and barriers has been circumvented by using CdHgTe-ZnHgTe superlattices instead of CdHgTe as a barrier material. Furthermore, the growth of compressively strained HgTe bulk layers (with a thickness of at least 50 nm) was demonstrated as well. The control of the state of strain adds a new degree of freedom to the design of HgTe epilayers, which has a major influence on the band structure of QWs and bulk layers. Strain in bulk layers lifts the degeneracy of the \(\Gamma_8\) bands at \(\mathbf{k}=0\). Tensile strain opens an energy gap, compressive strain shifts the touching points of the valence- and conduction band to positions in the Brillouin zone with finite \(\mathbf{k}\). Such a situation has been realized for the first time in the course of this work. For QWs in the inverted regime, it is demonstrated that compressive strain can be used to significantly enhance the thermal energy gap of the two-dimensional electron gas (2DEG). In addition, semi-metallic and semiconducting behavior is expected in wide QWs, depending on the state of strain. An examination of the temperature dependence of the subband ordering in QWs revealed that the band gap is only temperature-stable for appropriate sample parameters and temperature regimes. The band inversion is always lifted for sufficiently high temperatures. A large number of models investigate the influence of the band gap on the stability of the quantum-spin-Hall (QSH) effect. An enhancement of the stability of QSH edge state conductance is expected for enlarged band gaps. Furthermore, experimental studies on the temperature dependence of the QSH conductance are in contradiction to theoretical predictions. Systematic studies of these aspects have become feasible based on the new flexibility of the sample design. Detailed low-temperature magnetotransport studies have been carried out on QWs and bulk layers. For this purpose, devices have been fabricated lithographically, which consist of two Hall-bar geometries with different dimensions. This allows to discriminate between conductance at the plane of the 2DEG and the edge of the sample. The Fermi energy in the 2DEG has been adjusted by means of a top gate electrode. The strain-induced transition from semi-metallic to semiconducting characteristics in wide QWs was shown. The magnitude of the semi-metallic overlap of valence- and conduction band was determined by an analysis of the two-carrier conductance and is in agreement with band structure calculations. The band gap of the semiconducting sample was determined by measurements of the temperature dependence of the conductance at the charge-neutrality point. Agreement with the value expected from theory has been achieved for the first time in this work. The influence of the band gap on the stability of QSH edge state conductance has been investigated on a set of six samples. The band gap of the set spans a range of 10 to 55 meV. The latter value has been achieved in a highly compressively strained QW, has been confirmed by temperature-dependent conductance measurements, and is the highest ever reported in the inverted regime. Studies of the carrier mobility reveal a degradation of the sample quality with increasing Zn-fraction in the superlattice, in agreement with HRXRD observations. The enhanced band gap does not suppress scattering mechanisms in QSH edge channels, but lowers the conductance in the plane of the 2DEG. Hence, edge state conductance is the dominant conducting process even at elevated temperatures. An increase in conductance with increasing temperature has been found, in agreement with reports from other groups. The increase follows a power-law dependency, the underlying physical mechanism remains open. A cause for the lack of an increase of the QSH edge state conductance with increasing energy gap has been discussed. Possibly, the sample remains insulating even at finite carrier densities, due to localization effects. The measurement does not probe the QSH edge state conductance at the situation where the Fermi energy is located in the center of the energy gap, but in the regime of maximized puddle-driven scattering. In a first set of measurements, it has been shown that the QSH edge state conductance can be influenced by hysteretic charging effects of trapped states in the insulating dielectric. A maximized conductance of \(1.6\ \text{e}^2/\text{h}\) was obtained in a \(58\ \mu\text{m}\) edge channel. Finally, measurements on three dimensional samples have been discussed. Recent theoretical works assign compressively strained HgTe bulk layers to the Weyl semi-metal class of materials. Such layers have been synthesized and studied in magnetotransport experiments for the first time. Pronounced quantum-Hall- and Shubnikov-de-Haas features in the Hall- and longitudinal resistance indicate two-dimensional conductance on the sample surface. However, this conductance cannot be assigned definitely to Weyl surface states, due to the inversion of \(\Gamma_6\) and \(\Gamma_8\) bands. If a magnetic field is aligned parallel to the current in the device, a decrease in the longitudinal resistance is observed with increasing magnetic field. This is a signature of the chiral anomaly, which is expected in Weyl semi-metals.},
  subject      = {Quecksilbertellurid},
  language  = {en}
}
@phdthesis{Lochner2011,
  author    = {Lochner, Florian},
  title     = {Epitaxial growth and characterization of NiMnSb layers for novel spintronic devices},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-72276},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2011},
  abstract  = {In dieser Dissertation wurde das epitaktische Wachstum und die Charakterisierung des halb-metallischen Ferromagneten NiMnSb vorgestellt. NiMnSb kristallisiert in der C1b Kristallstruktur, welche {\"a}hnlich der Zinkblendestruktur von h{\"a}ufig verwendeten III-V Halbleitern ist. Eine besondere Eigenschaft von NiMnSb ist die theoretische 100\% Spin-polarisation an der Fermikante, die es zu einem perfekten Kandidaten f{\"u}r Spintronikexperimente macht. Eine weitere große Rolle f{\"u}r diese Arbeit spielten die magnetischen Eigenschaften von NiMnSb, insbesondere die niedrige magnetische D{\"a}mpfung der abgeschiedenen Schichten. Alle gewachsenen Schichten wurden mit der MBE-Technik hergestellt. Die Schichtstapel f{\"u}r alle unterschiedlichen Experimente und Anwendungen wurden auf InP Substrate in (001) oder (111)B Orientierung abgeschieden. Vor der NiMnSb Schicht wurde eine undotierte (In,Ga)As Pufferschicht gewachsen. F{\"u}r einige Proben auf InP(111)B wurde zus{\"a}tzlich eine Si-dotierte (In,Ga)As-Schicht auf die undotierte (In,Ga)As-Schicht gewachsen. Die Dotierungskonzentration der n-dotierenten Schicht wurde per ETCH-CV bestimmt. Alle Schichten wurden auf strukturelle Eigenschaften und die NiMnSb-Schichten zus{\"a}tzlich auf magnetische Eigenschaften untersucht. F{\"u}r die strukturellen Untersuchungen wurde die in-situ Technik RHEED und das ex-situ Werkzeug HRXRD verwendet. Auf beiden Orientierungen zeigten die RHEED-Beobachtungen eine gute Qualit{\"a}t der gewachsenen Puffer- und halb-metallischen Ferromagnetschichten. Dieses Ergebnis wurde durch die HRXRD-Messung best{\"a}rkt. Es konnte die vertikale Gitterkonstante bestimmt werden. Der erhaltene Wert von NiMnSb auf InP(001) a(NiMnSb_vertikal) = 5.925 {\AA} ist in guter {\"U}bereinstimmung mit dem Literaturwert a(NiMnSb_Lit) = 5.903 {\AA}[Cas55]. F{\"u}r NiMnSb auf InP(111)B wurde eine vertikale Gitterkonstante von a(NiMnSb_vertikal) = 6.017 {\AA} bestimmt. Die horizontale Gitterkonstante des Puffers und des halb-metallischen Ferromagneten konnte in guter {\"U}bereinstimmung mit der Substratgitterkonstante bestimmt werden. Allerdings ist dieses Ergebnis ausschließlich bis zu einer Schichtdicke von ≈40nm f{\"u}r NiMnSb g{\"u}ltig. Um diese maximale Schichtdicke zu erh{\"o}hen, wurden NiMnSb auf InP(001) Substrate gewachsen und mit einer Ti/Au-Schicht als Schutz versehen. Mit diesen Proben wurden reziproke Gitterkarten des (533) Reflex mit GIXRD am Synchrotron BW2 des HASYLAB gemessen [Kum07]. Es hat sich gezeigt, dass sich die kritische Schichtdicke mehr als verdopppeln l{\"a}sst, wenn eine Ti/Au- Schicht direkt nach dem Wachstum von NiMnSb abgeschieden wird, ohne das Ultrahochvakuum (UHV) zu verlassen. Die magnetischen Eigenschaften wurden mit FMR Experimenten und SQUID bestimmt. Der gemessene magnetische D{\"a}mpfungsparameter α einer 40nm dicken NiMnSb Schicht auf InP(001) wurde zu 3.19e-3 entlang [1-10] bestimmt. Die resultierende Linienbreite von unseren Schichten auf InP(001) ist mehr als 4.88 mal kleiner als bei [Hei04] gemessen. Ein weiteres Ergebnis ist die Richtungsabh{\"a}ngigkeit der D{\"a}mpfung. Es wurde gemessen, dass die D{\"a}mpfung sich um mehr als 42\% {\"a}ndert, wenn das angelegte Feld um 45° von [1-10] nach [100] gedreht wird. Mit SQUID messten wir die S{\"a}ttigungsmagnetisierung von einer 40nm dicken NiMnSb-Schicht zu 4µB. NiMnSb-Schichten auf InP(111)B Substrate wurden ebenfalls mit FMR untersucht, mit einem {\"u}berraschenden Ergebnis. Diese Schichten zeigten nicht nur eine Abnahme im Anisotropiefeld mit ansteigender Schichtdicke, sondern auch ein uniaxiales Anisotropieverhalten. Dieses Verhalten kann mit Defekten in diesen Proben erkl{\"a}rt werden. Mit einem Rasterkraftmikroskop (AFM) wurden dreieckige Defekte gemessen. Diese Defekte haben ihren Ursprung in der Pufferschicht und beeinflussen die magnetischen Eigenschaften. Ein weiterer Teil dieser Arbeit widmete sich dem Verhalten von NiMnSb bei Temperaturen um die 80K. In unserer Probe konnte ein Phasen{\"u}bergang in den Messdaten des normalen Hall Koeffizienten, anomalen Hall-Term und Leitungswiderstand nicht beobachtet werden. Der letzte Teil dieser Arbeit behandelt verschiedene Spintronikanwendungen, welche aus unseren NiMnSb-Schichten gebaut wurden. In einer ersten Anwendung agiert die Magnetisierung auf einen Strom I. Die so genannte GMR-Anwendung besteht aus InP:S(001)- 180nm undotierten (In,Ga)As - 40nm NiMnSb - 10nm Cu - 6nm NiFe - 10nm Ru in CPP Geomtrie . Wir erhielten ein MR-Verh{\"a}ltnis von 3.4\%. In einer zweiten Anwendung agiert der Strom I auf die Magnetisierung und nutzt dabei das Ph{\"a}nomen des Spin-Drehmomentes aus. Dieser so genannte Spin Torque Oscillator (STO) emittiert Frequenzen im GHz Bereich (13.94GHz - 14.1GHz). Die letzte hergestellte Anwendung basiert auf dem magnetischen Wirbelph{\"a}nomen. F{\"u}r das Umschalten der Kernpolarit{\"a}t sind die gyrotropischen Frequenzen f + = 254MHz, f - = 217MHz und ein totales, statisches magnetisches Feld von nur mµ0H = 65mT n{\"o}tig. Die Umkehreffizienz wurde besser als 99\% bestimmt.},
  subject      = {Nickelverbindungen},
  language  = {en}
}
@phdthesis{Mahapatra2007,
  author    = {Mahapatra, Suddhasatta},
  title     = {Formation and Properties of Epitaxial CdSe/ZnSe Quantum Dots : Conventional Molecular Beam Epitaxy and Related Techniques},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-32831},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2007},
  abstract  = {Albeit of high technological import, epitaxial self-assembly of CdSe/ZnSe QDs is non-trivial and still not clearly understood. The origin and attributes of these QDs are significantly different from those of their III-V and group-IV counterparts. For III-V and group-IV heterosystems, QD-formation is assigned to the Stranski Krastanow (SK) transition, wherein elastic relaxation of misfit strain leads to the formation of coherent three-dimensional (3D) islands, from a supercritically strained two-dimensional (2D) epilayer. Unfortunately, this phenomenon is inconspicuous for the CdSe/ZnSe heterosystem. Well-defined 3D islands are not readily formed in conventional molecular beam epitaxial (MBE) growth of CdSe on ZnSe. Consequently, several alternative approaches have been adopted to induce/enhance formation of QDs. This thesis systematically investigates three such alternative approaches, along with conventional MBE, with emphasis on the formation-mechanism of QDs, and optimization of their morphological and optical attributes. It is shown here that no distinct 3D islands are formed in MBE growth of CdSe on ZnSe. The surface of the CdSe layer represents a rough 2D layer, characterized by a dense array of shallow (<1nm) abutting mounds. In capped samples, the CdSe deposit forms an inhomogeneous CdZnSe quantum well (QW)-like structure. This ternary QW consists of local Cd-rich inclusions, which confine excitons three-dimensionally, and act as QDs. The density of such QDs is very high (~ 1012 cm-2). The QDs defined by the composition inhomogeneities of the CdZnSe QW presumably originate from the shallow mounds of the uncapped CdSe surface. By a technique wherein a CdSe layer is grown at a low temperature (TG = 230 °C) and subsequently annealed at a significantly higher temperature (TA =310 °C), tiny but distinct 3D islands are formed. In this work, the mechanism underlying the formation of these islands is reported. While the CdSe deposit forms a quasi-two-dimensional (quasi-2D) layer at TG = 230 °C, subsequent annealing at TA = 310 °C results in a thermally activated "up-climb" of adatoms onto two-dimensional clusters (or precursors) and concomitant nucleation of 3D islands. The areal density of QDs, achieved by this technique, is at least a decade lower than that typical for conventional MBE growth. It is demonstrated that further reduction is possible by delaying the temperature ramp-up to TA. In the second technique, formation of distinct islands is demonstrated by deposition of amorphous selenium (a-Se) onto a 2D CdSe epilayer at room temperature and its subsequent desorption at a higher temperature (TD = 230 °C). Albeit the self-assembled islands are large, they are severely truncated during subsequent capping with ZnSe, presumably due to segregation of Cd and Zn-alloying of the islands. The segregation phenomenon is analyzed in this work and correlated to the optical properties of the QDs. Additionally, very distinct vertical correlation of QDs in QD-superlattices, wherein the first QD-layer is grown by this technique and the subsequent ones by migration enhanced epitaxy (MEE), is reported. The process steps of the third variant technique, developed in course of this work, are very similar to those of the previous one-the only alteration being the substitution of selenium with tellurium as the cap-forming-material. This leads not only to large alteration of the morphological and optical attributes of the QDs, but also to formation of unique self-assembled island-patterns. Oriented dashes, straight and buckled chains of islands, and aligned island-pairs are formed, depending on the thickness of the Te-cap layer. The islands are partially alloyed with Te and emit luminescence at very low energies (down to 1.7 eV at room temperature). The Te cap layer undergoes (poly)crystallization during temperature ramp-up (from room temperature to TD) for desorption. Here, it is shown that the self-assembled patterns of the island-ensembles are determined by the pattern of the grain boundaries of the polycrystalline Te layer. Based on an understanding of the mechanism of pattern formation, a simple and "clean" method for controlled positioning of individual QDs and QD-based extended nanostructures, is proposed in this work. The studies carried out in the framework of this thesis provide not only a deeper insight into the microscopic processes governing the heteroepitaxial self-assembly of CdSe/ZnSe(001) QDs, but also concrete approaches to achieve, optimize, and control several technologically-important features of QD-ensembles. Reduction and control of QD-areal-density, pronounced vertical correlation of distinctly-defined QDs in QD-superlattices, and self-assembly of QD-based extended structures, as demonstrated in this work, might turn out to be beneficial for envisioned applications in information-, and communication-technologies.},
  subject      = {Nanostruktur},
  language  = {en}
}
@phdthesis{Mueller2012,
  author    = {M{\"u}ller, Andreas},
  title     = {Towards functional oxide heterostructures},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-72478},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2012},
  abstract  = {Oxide heterostructures attract a lot of attention as they display a vast range of physical phenomena like conductivity, magnetism, or even superconductivity. In most cases, these effects are caused by electron correlations and are therefore interesting for studying fundamental physics, but also in view of future applications. This thesis deals with the growth and characterization of several prototypical oxide heterostructures. Fe3O4 is highly ranked as a possible spin electrode in the field of spintronics. A suitable semiconductor for spin injection in combination with Fe3O4 is ZnO due to its oxide character and a sufficiently long spin coherence length. Fe3O4 has been grown successfully on ZnO using pulsed laser deposition and molecular beam epitaxy by choosing the oxygen partial pressure adequately. Here, a pressure variation during growth reduces an FeO-like interface layer. Fe3O4 films grow in an island-like growth mode and are structurally nearly fully relaxed, exhibiting the same lattice constants as the bulk materials. Despite the presence of a slight oxygen off-stoichiometry, indications of the Verwey transition hint at high-quality film properties. The overall magnetization of the films is reduced compared to bulk Fe3O4 and a slow magnetization behavior is observed, most probably due to defects like anti-phase boundaries originating from the initial island growth. LaAlO3/SrTiO3 heterostructures exhibit a conducting interface above a critical film thickness, which is most likely explained by an electronic reconstruction. In the corresponding model, the potential built-up owing to the polar LaAlO3 overlayer is compensated by a charge transfer from the film surface to the interface. The properties of these heterostructures strongly depend on the growth parameters. It is shown for the first time, that it is mainly the total pressure which determines the macroscopic sample properties, while it is the oxygen partial pressure which controls the amount of charge carriers near the interface. Oxygen-vacancy-mediated conductivity is found for too low oxygen pressures. A too high total pressure, however, destroys interface conductivity, most probably due to a change of the growth kinetics. Post-oxidation leads to a metastable state removing the arbitrariness in controlling the electronic interface properties by the oxygen pressure during growth. LaVO3/SrTiO3 heterostructures exhibit similar behavior compared to LaAlO3/SrTiO3 when it comes to a thickness-dependent metal-insulator transition. But in contrast to LaAlO3, LaVO3 is a Mott insulator exhibiting strong electron correlations. Films have been grown by pulsed laser deposition. Layer-by-layer growth and a phase-pure pervoskite lattice structure is observed, indicating good structural quality of the film and the interface. An electron-rich layer is found near the interface on the LaVO3 side for conducting LaVO3/SrTiO3. This could be explained by an electronic reconstruction within the film. The electrostatic doping results in a band-filling-controlled metal-insulator transition without suffering from chemical impurities, which is unavoidable in conventional doping experiments.},
  subject      = {Oxide},
  language  = {en}
}