@phdthesis{Bayer2024, author = {Bayer, Florian}, title = {Investigating electromagnetic properties of topological surface states in mercury telluride}, doi = {10.25972/OPUS-35212}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-352127}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2024}, abstract = {This doctoral thesis investigates magneto-optical properties of mercury telluride layers grown tensile strained on cadmium telluride substrates. Here, layer thicknesses start above the usual quantum well thickness of about 20 nm and have a upper boundary around 100 nm due to lattice relaxation effects. This kind of layer system has been attributed to the material class of three-dimensional topological insulators in numerous publications. This class stands out due to intrinsic boundary states which cross the energetic band gap of the layer's bulk. In order to investigate the band structure properties in a narrow region around the Fermi edge, including possible boundary states, the method of highly precise time-domain Terahertz polarimetry is used. In the beginning, the state of the art of Teraherz technology at the start of this project is discussed, moving on to a detailed description and characterization of the self-built measurement setup. Typical standard deviation of a polarization rotation or ellipticity measurement are on the order of 10 to 100 millidegrees, according to the transmission strength through investigated samples. A range of polarization spectra, depending on external magnetic fields up to 10 Tesla, can be extracted from the time-domain signal via Fourier transformation. The identification of the actual band structure is done by modeling possible band structures by means of the envelope function approximation within the framework of the k·p method. First the bands are calculated based on well-established model parameters and from them the possible optical transitions and expected ellipticity spectra, all depending on external magnetic fields and the layer's charge carrier concentration. By comparing expected with measured spectra, the validity of k·p models with varying depths of detail is analyzed throughout this thesis. The rich information encoded in the ellipitcity spectra delivers key information for the attribution of single optical transitions, which are not part of pure absorption spectroscopy. For example, the sign of the ellipticity signals is linked to the mix of Landau levels which contribute to an optical transition, which shows direct evidence for bulk inversion asymmetry effects in the measured spectra. Throughout the thesis, the results are compared repeatedly with existing publications on the topic. It is shown that the models used there are often insufficient or, in worst case, plainly incorrect. Wherever meaningful and possible without greater detours, the differences to the conclusions that can be drawn from the k·p model are discussed. The analysis ends with a detailed look on remaining differences between model and measurement. It contains the quality of model parameters as well as different approaches to integrate electrostatic potentials that exist in the structures into the model. An outlook on possible future developments of the mercury cadmium telluride layer systems, as well as the application of the methods shown here onto further research questions concludes the thesis.}, subject = {Quecksilbertellurid}, language = {en} } @phdthesis{Hajer2022, author = {Hajer, Jan}, title = {Mercury Telluride Nanowires for Topological Quantum Transport}, doi = {10.25972/OPUS-29322}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-293222}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2022}, abstract = {Novel appraches to the molecular beam epitaxy of core-shell nanowires in the group II telluride material system were explored in this work. Significant advances in growth spurred the development of a flexible and reliable platform for a charge transport characterization of the topological insulator HgTe in a tubular nanowire geometry. The transport results presented provide an important basis for the design of future studies that strive for the experimental realization of topological charge transport in the quantum wire limit.}, subject = {Quecksilbertellurid}, language = {en} } @phdthesis{Schmitt2022, author = {Schmitt, Fabian Bernhard}, title = {Transport properties of the three-dimensional topological insulator mercury telluride}, doi = {10.25972/OPUS-29173}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-291731}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2022}, abstract = {The subject of this thesis is the investigation of the transport properties of topological and massive surface states in the three-dimensional topological insulator Hg(Mn)Te. These surface states give rise to a variety of extraordinary transport phenomena, making this material system of great interest for research and technological applications. In this connection, many physical properties of the topological insulator Hg(Mn)Te still require in-depth exploration. The overall aim of this thesis is to analyze the quantum transport of HgTe-based devices ranging from hundreds of micrometers (macroscopic) down to a few micrometers in size (microscopic) in order to extend the overall understanding of surface states and the possibilities of their manipulation. In order to exploit the full potential of our high-quality heterostructures, it was necessary to revise and improve the existing lithographic fabrication process of macroscopic three-dimensional Hg(Mn)Te samples. A novel lithographic standard recipe for the fabrication of the HgTe-based macrostructures was developed. This recipe includes the use of an optimized Hall bar design and wet etching instead of etching with high-energy \(\mathrm{{Ar^{+}}}\)-ions, which can damage the samples. Further, a hafnium oxide insulator is applied replacing the SiO\(_{2}\)/Si\(_{3}\)N\(_{4}\) dielectric in order to reduce thermal load. Moreover, the devices are metallized under an alternating angle to avoid discontinuities of the metal layers over the mesa edges. It was revealed that the application of gate-dielectric and top-gate metals results in n-type doping of the devices. This phenomenon could be attributed to quasi-free electrons tunneling from the trap states, which form at the interface cap layer/insulator, through the cap into the active layer. This finding led to the development of a new procedure to characterize wafer materials. It was found that the optimized lithographic processing steps do not unintentionally react chemically with our heterostructures, thus avoiding a degradation of the quality of the Hg(Mn)Te layer. The implementation of new contact structures Ti/Au, In/Ti/Au, and Al/Ti/Au did not result in any improvement compared to the standard structure AuGe/Au. However, a novel sample recipe could be developed, resulting in an intermixing of the contact metals (AuGe and Au) and fingering of metal into the mesa. The extent of the quality of the ohmic contacts obtained through this process has yet to be fully established. This thesis further deals with the lithographic realization of three-dimensional HgTe-based microstructures measuring only a few micrometer in size. Thus, these structures are in the order of the mean free path and the spin relaxation length of topological surface state electrons. A lithographic process was developed enabling the fabrication of nearly any desired microscopic device structure. In this context, two techniques suitable for etching microscopic samples were realized, namely wet etching and the newly established inductively coupled plasma etching. While wet etching was found to preserve the crystal quality of the active layer best, inductively coupled plasma etching is characterized by high reproducibility and excellent structural fidelity. Hence, the etching technique employed depends on the envisaged type of experiment. Magneto-transport measurements were carried out on the macroscopic HgTe-based devices fabricated by means of improved lithographic processing with respect to the transport properties of topological and massive surface states. It was revealed that due to the low charge carrier density present in the leads to the ohmic contacts, these regions can exhibit an insulating behavior at high magnetic fields and extremely low temperatures. As soon as the filling factor of the lowest Landau levels dropped below a critical value (\(\nu_{\mathrm{{c}}}\approx0.8\)), the conductance of the leads decreased significantly. It was demonstrated that the carrier density in the leads can be increased by the growth of modulation doping layers, a back-gate-electrode, light-emitting diode illumination, and by the application of an overlapping top-gate layout. This overlapping top-gate and a back-gate made it possible to manipulate the carrier density of the surface states on both sides of the Hg(Mn)Te layer independently. With this setup, it was identified that topological and massive surface states contribute to transport simultaneously in 3D Hg(Mn)Te. A model could be developed allowing the charge carrier systems populated in the sample to be determined unambiguously. Based on this model, the process of the re-entrant quantum Hall effect observed for the first time in three-dimensional topological insulators could be explained by an interplay of n-type topological and p-type massive surface states. A well-pronounced \(\nu=-1\rightarrow\nu=-2\rightarrow\nu=-1\) sequence of quantum Hall plateaus was found in manganese-doped HgTe-based samples. It is postulated that this is the condensed-matter realization of the parity anomaly in three-dimensional topological insulators. The actual nature of this phenomenon can be the subject of further research. In addition, the measurements have shown that inter-scattering occurs between counter-propagating quantum Hall edge states. The good quantization of the Hall conductance despite this inter-scattering indicates that only the unpaired edge states determine the transport properties of the system as a whole. The underlying inter-scattering mechanism is the topic of a publication in preparation. Furthermore, three-dimensional HgTe-based microstructures shaped like the capital letter "H" were investigated regarding spin transport phenomena. The non-local voltage signals occurring in the measurements could be attributed to a current-induced spin polarization of the topological surface states due to electrons obeying spin-momentum locking. It was shown that the strength of this non-local signal is directly connected to the magnitude of the spin polarization and can be manipulated by the applied top-gate voltage. It was found that in these microstructures, the massive surface and bulk states, unlike the topological surface states, cannot contribute to this spin-associated phenomenon. On the contrary, it was demonstrated that the population of massive states results in a reduction of the spin polarization, either due to the possible inter-scattering of massive and topological surface states or due to the addition of an unpolarized electron background. The evidence of spin transport controllable by a top-gate-electrode makes the three-dimensional material system mercury telluride a promising candidate for further research in the field of spintronics.}, subject = {Topologischer Isolator}, language = {en} } @phdthesis{Strunz2022, author = {Strunz, Jonas}, title = {Quantum point contacts in HgTe quantum wells}, doi = {10.25972/OPUS-27459}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-274594}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2022}, abstract = {Quantenpunktkontakte (englisch: quantum point contacts, QPCs) sind eindimensionale Engstellen in einem ansonsten zweidimensionalen Elektronen- oder Lochsystem. Seit der erstmaligen Realisierung in GaAs-basierten zweidimensionalen Elektronengasen sind QPCs sukzessive zu einem Grundbestandteil mesoskopischer Physik geworden und erfahren in einer Vielzahl von Experimenten Anwendung. Jedoch ist es bis zur Anfertigung der vorliegenden Arbeit nicht gelungen, QPCs in der neuen Materialklasse der zweidimensionalen topologischen Isolatoren zu realisieren. In diesen Materialien tritt der sogenannte Quanten-Spin-Hall-Effekt (QSH-Effekt) auf, welcher sich durch die Ausbildung von leitf{\"a}higen, eindimensionalen sowie gleichermaßen spinpolarisierten Zust{\"a}nden an der Bauteilkante auszeichnet, w{\"a}hrend die restlichen Bereiche der Probe isolierend sind. Ein in einem zweidimensionalen topologischen Isolator realisierter QPC kann demgem{\"a}ß daf{\"u}r benutzt werden, die sich stets an der Bauteilkante befindlichen QSH-Randkan{\"a}le einander r{\"a}umlich anzun{\"a}hern, was beispielsweise die Untersuchung potentieller Wechselwirkungseffekte zwischen ebenjenen Randkan{\"a}len erm{\"o}glicht. Die vorliegende Arbeit beschreibt die erstmalig erfolgreich durchgef{\"u}hrte Implementierung einer QPC-Technologie in einem QSH-System. {\"U}berdies werden die neuartigen Bauteile experimentell charakterisiert sowie analysiert. Nach einer in Kapitel 1 erfolgten Einleitung der Arbeit besch{\"a}ftigt sich das nachfolgende Kapitel 2 zun{\"a}chst mit der besonderen Bandstruktur von HgTe. In diesem Kontext wird die Ausbildung der QSH-Phase f{\"u}r HgTe-Quantentr{\"o}ge mit einer invertierten Bandstruktur erl{\"a}utert, welche f{\"u}r deren Auftreten eine Mindesttrogdicke von d_QW > d_c = 6.3 nm aufweisen m{\"u}ssen. Im Anschluss wird das Konzept eines QPCs allgemein eingef{\"u}hrt sowie das zugeh{\"o}rige Transportverhalten analytisch beschrieben. {\"U}berdies werden die Einschr{\"a}nkungen und Randbedingungen diskutiert, welche bei der Realisierung eines QPCs in einem QSH-System Ber{\"u}cksichtigung finden m{\"u}ssen. Darauf folgt die Pr{\"a}sentation des eigens zur QPC-Herstellung entwickelten Lithographieprozesses, welcher auf einer mehrstufigen Anwendung eines f{\"u}r HgTe-Quantentrogstrukturen geeigneten nasschemischen {\"A}tzverfahrens beruht. Die im Nachgang diskutierten Transportmessungen exemplarischer Proben zeigen die erwartete Leitwertquantisierung in Schritten von ΔG ≈ 2e^2/h im Bereich des Leitungsbandes -- sowohl f{\"u}r eine topologische als auch f{\"u}r eine triviale (d_QW < d_c) QPC-Probe. Mit dem Erreichen der Bandl{\"u}cke saturiert der Leitwert f{\"u}r den topologischen QPC um G_QSH ≈ 2e^2/h, wohingegen ebenjener f{\"u}r den Fall des trivialen Bauteils auf G ≈ 0 abf{\"a}llt. Dar{\"u}ber hinaus belegen durchgef{\"u}hrte Messungen des differentiellen Leitwertes einer invertierten QPC-Probe in Abh{\"a}ngigkeit einer Biasspannung die stabile Koexistenz von topologischen und trivialen Transportmoden. Gegenstand von Kapitel 3 ist die Beschreibung der Ausbildung eines QSH-Interferometers in QPCs mit geringer Weite, welche unter Verwendung von Quantentr{\"o}gen mit einer Trogdicke von d_QW = 7 nm hergestellt werden. Die Diskussion von Bandstrukturrechnungen legt dar, dass die r{\"a}umliche Ausdehnung der Randkan{\"a}le von der jeweiligen Position der Fermi-Energie im Bereich der Bandl{\"u}cke abh{\"a}ngt. Hieraus resultiert eine Transportsituation, in welcher -- unter bestimmten Voraussetzungen -- Reservoir-Elektronen mit randomisiertem Spin an beide QSH-Randkan{\"a}le mit gleicher Wahrscheinlichkeit koppeln, was in der Ausbildung eines QSH-Rings resultiert. Diese Ringbildung wird im Rahmen eines durch Plausibilit{\"a}ts{\"u}berpr{\"u}fung getesteten Modells erkl{\"a}rt und spezifiziert. Danach erfolgt eine theoretische Einf{\"u}hrung von drei relevanten Quantenphasen, deren Akkumulation in der Folge f{\"u}r mehrere geeignete QPC-Proben nachgewiesen wird. Es handelt sich hierbei um die Aharonov-Bohm-Phase, um die dynamische Aharonov-Casher-Phase sowie um eine Spin-Bahn-Berry-Phase mit einem Wert von π. Diese experimentellen Ergebnisse stehen dar{\"u}ber hinaus im Einklang mit analytischen Modellbetrachtungen. Das anschließende Kapitel 4 stellt den letzten Teil der Arbeit dar und besch{\"a}ftigt sich mit der Beobachtung einer anomalen Leitwertsignatur, welche f{\"u}r QPC-Proben basierend auf einer Quantentrogdicke von d_QW = 10.5 nm auftritt. Diese Proben zeigen neben der durch die QSH-Phase bedingten Leitwertquantisierung von G_QSH ≈ 2e^2/h ein weiteres Leitwertplateau mit einem Wert von G ≈ e^2/h = 0.5 x G_QSH. Diese sogenannte 0.5-Anomalie ist nur f{\"u}r ein kleines Intervall von QPC-Weiten beobachtbar und wird mit zunehmender Bauteilweite abgeschw{\"a}cht. Weiterf{\"u}hrende Untersuchungen in Abh{\"a}ngigkeit der Temperatur sowie einer angelegten Biasspannung deuten dar{\"u}ber hinaus darauf hin, dass das Auftreten der 0.5-Anomalie mit einem modifizierten topologischen Zustand einhergeht. {\"U}berdies wird eine zus{\"a}tzliche sowie vervollst{\"a}ndigende Charakterisierung dieses Transportregimes durch die Realisierung eines neuartigen Bauteilkonzeptes m{\"o}glich, welches einen QPC in eine standardisierte Hall-Bar-Geometrie integriert. Das Ergebnis der experimentellen Analyse einer solchen Probe verkn{\"u}pft das Auftreten der 0.5-Anomalie mit der R{\"u}ckstreuung eines QSH-Randkanals. Demgem{\"a}ß wird aus Sicht des Einteilchenbildes geschlussfolgert, dass im Kontext der 0.5-Anomalie lediglich ein Randkanal transmittiert wird. Zudem werden zwei theoretische Modelle basierend auf Elektron-Elektron-Wechselwirkungen diskutiert, welche beide jeweils als urs{\"a}chlicher Mechanismus f{\"u}r das Auftreten der 0.5-Anomalie in Frage kommen. Abschließend ist zu deduzieren, dass die Implementierung einer QPC-Technologie in einem QSH-System eine bedeutende Entwicklung im Bereich der Erforschung von zweidimensionalen topologischen Isolatoren darstellt, welche eine Vielzahl zuk{\"u}nftiger Experimente erm{\"o}glicht. So existieren beispielsweise theoretische Vorhersagen, dass QPCs in einem QSH-System die Detektion von Majorana- sowie Para-Fermionen erm{\"o}glichen. {\"U}berdies ist die nachgewiesene Ausbildung eines QSH-Interferometers in geeigneten QPC-Proben eine Beobachtung von großer Folgewirkung. So erm{\"o}glicht die beobachtete dynamische Aharonov-Casher-Phase im QSH-Regime die kontrollierbare Modulation des topologischen Leitwertes, was die konzeptionelle Grundlage eines topologischen Transistors darstellt. Eine weitere Anwendungsm{\"o}glichkeit wird durch die Widerstandsf{\"a}higkeit geometrischer Phasen gegen{\"u}ber Dephasierung er{\"o}ffnet, wodurch die nachgewiesene Spin-Bahn-Berry-Phase mit einem Wert von π im Kontext potentieller Quantencomputerkonzepte von Interesse ist. Dar{\"u}ber hinaus ist die Transmission von nur einem QSH-Randkanal im Zuge des Auftretens der 0.5-Anomalie {\"a}quivalent zu 100 \% Spinpolarisierung, was einen Faktor essentieller Relevanz f{\"u}r die Realisierung spintronischer Anwendungen darstellt. Demgem{\"a}ß beinhaltet die vorliegende Arbeit den experimentellen Nachweis von drei unterschiedlichen Effekten, von welchen jedem einzelnen eine fundamentale Rolle im Rahmen der Entwicklung neuer Generationen logischer Bauelemente zukommen kann -- erm{\"o}glicht durch die Realisierung von QPCs in topologischen HgTe-Quantentr{\"o}gen.}, subject = {Topologischer Isolator}, language = {en} } @phdthesis{Mueller2022, author = {M{\"u}ller, Valentin Leander}, title = {Transport signatures of topological and trivial states in the three-dimensional topological insulator HgTe}, doi = {10.25972/OPUS-25952}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-259521}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2022}, abstract = {The thesis at hand is concerned with improving our understanding of and our control over transport properties of the three-dimensional topological insulator HgTe. Topological insulators are characterized by an insulating bulk and symmetry-protected metallic surface states. These topological surface states hold great promise for research and technology; at the same time, many properties of experimentally accessible topological insulator materials still need to be explored thoroughly. The overall aim of this thesis was to experimentally investigate micrometer-sized HgTe transport devices to observe the ballistic transport regime as well as intercarrier scattering and possibly identify special properties of the topological surface states. Part I of the thesis presents lithographic developments concerned with etching small HgTe devices. The aim was to replace existing processes which relied on dry etching with high-energy \(\text{Ar}^+\) ions and an organic etch mask. This etching method is known to degrade the HgTe crystal quality. In addition, the etch mask turned out to be not durable for long etching processes and difficult to remove completely after etching. First, \(\text{BaF}_2\) was introduced as a new etch mask for dry etching to replace the organic etch mask. With common surface characterization techniques like SEM and XPS it was shown that \(\text{BaF}_2\) etch masks are easy to deposit, highly durable in common dry etching processes for \(\text{Hg}_{1-x}\text{Cd}_x\text{Te}\), and easy to remove in deionized water. Transport results of HgTe devices fabricated with the new etch mask are comparable to results obtained with the old process. At the same time, the new etch mask can withstand longer etching times and does not cause problems due to incomplete removal. Second, a new inductively coupled plasma dry etching process based on \(\text{CH}_4\) and Ar was introduced. This etching process is compatible with \(\text{BaF}_2\) etch masks and yields highly reproducible results. Transport results indicate that the new etching process does not degrade the crystal quality and is suitable to produce high-quality transport devices even in the micrometer range. A comparison with wet-etched samples shows that inductively coupled plasma etching introduces a pronounced edge roughness. This - usually undesirable - property is actually beneficial for some of the experiments in this study and mostly irrelevant for others. Therefore, most samples appearing in this thesis were fabricated with the new process. Part II of the thesis details the advancements made in identifying topological and trivial states which contribute to transport in HgTe three-dimensional topological insulators. To this end, macroscopic Hall bar samples were fabricated from high-quality tensilely strained HgTe layers by means of the improved lithographic processes. All samples were equipped with a top gate electrode, and some also with a modulation doping layer or a back gate electrode to modify the carrier density of the surface states on both sides of the HgTe layer. Due to the high sample quality, Landau levels could be well-resolved in standard transport measurements down to magnetic fields of less than 0.5T. High-resolution measurements of the Landau level dispersion with gate voltage and magnetic field allowed disentangling different transport channels. The main result here is that the upper (electron) branches of the two topological surface states contribute to transport in all experimentally relevant density regimes, while the hole branch is not accessible. Far in n-regime bulk conduction band states give a minor contribution to transport. More importantly, trivial bulk valence band holes come into play close to the charge neutrality point. Further in p-regime, the strong applied gate voltage leads to the formation of two-dimensional, massive hole states at the HgTe surface. The interplay of different states gives rise to rich physics: Top gate-back gate maps revealed that an anticrossing of Landau levels from the two topological surface states occurs at equal filling. A possible explanation for this effect is a weak hybridization of the surface states; however, future studies need to further clarify this point. Furthermore, the superposition of n-type topological and p-type trivial surface states leads to an intriguing Landau level dispersion. The good quantization of the Hall conductance in this situation indicates that the counterpropagating edge states interact with each other. The nature of this interaction will be the topic of further research. Part III of the thesis is focused on HgTe microstructures. These "channel samples" have a typical width of 0.5 to 4µm and a typical length of 5 to 80µm. The quality of these devices benefits particularly from the improved lithographic processes. As a result, the impurity mean free path of the topological surface state electrons is on the order of the device width and transport becomes semiballistic. This was verified by measuring the channel resistance in small magnetic fields in n-regime. The deflection of carriers towards the dissipative channel walls results in a pronounced peak in the magnetoresistance, which scales in a predictable manner with the channel width. To investigate transport effects due to mutual scattering of charge carriers, the differential resistance of channel samples was measured as a function of carrier temperature. Selective heating of the charge carriers - but not the lattice - was achieved by passing a heating current through the channel. Increasing the carrier temperature has two pronounced effects when the Fermi level is situated in proximity to the bulk valence band maximum where the density of states is large. First, when both topological surface state electrons and bulk holes are present, electron-hole scattering leads to a pronounced increase in resistance with increasing carrier temperature. Second, a thermally induced increase of the electron and hole carrier densities reduces the resistance again at higher temperatures. A model considering these two effects was developed, which can well reproduce the experimental results. Current heating experiments in zero-gap HgTe quantum wells and compressively strained HgTe layers are consistent with this model. These observations raise the question as to how electron-hole scattering may affect other transport properties of HgTe-based three-dimensional topological insulators, which is briefly discussed in the outlook.}, subject = {Topologischer Isolator}, language = {en} } @phdthesis{Mahler2022, author = {Mahler, David}, title = {Surface states in the topological material HgTe}, doi = {10.25972/OPUS-25398}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-253982}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2022}, abstract = {The motivation for this work has been contributing a step to the advancement of technology. A next leap in technology would be the realization of a scalable quantum computer. One potential route is via topological quantum computing. A profound understanding of topological materials is thus essential. My work contributes by the investigation of the exemplary topological material HgTe. The focus lies on the understanding of the topological surface states (TSS) and new possibilities to manipulate them appropriately. Traditionally top gate electrodes are used to adjust the carrier density in such semi-conductor materials. We found that the electric field of the top gate can further alter the properties of the HgTe layer. The formation of additional massive Volkov-Pankratov states limits the accessibility of the TSS. The understanding of these states and their interplay with the TSS is necessary to appropriately design devices and to ensure their desired properties. Similarly, I observed the existence and stability of TSSs even without a bandgap in the bulk band structure in the inversion induced Dirac semi-metal phase of compressively strained HgTe. The finding of topological surface states in inversion-induced Dirac semi-metals provides a consistent and simple explanation for the observation reported for \(\text{Cd}_3\text{As}_2\). These observations have only been possible due to the high quality of the MBE grown HgTe layers and the access of different phases of HgTe via strain engineering. As a starting point I performed Magneto-transport measurements on 67 nm thick tensilely strained HgTe layers grown on a CdTe substrate. We observed multiple transport channels in this three-dimensional topological insulator and successfully identified them. Not only do the expected topological surface states exist, but also additional massive surface states have been observed. These additional massive surface states are formed due to the electrical field applied at the top gate, which is routinely used to vary the carrier density in the HgTe layer. The additional massive surface states are called Volkov-Pankratov states after B. A. Volkov and O. A. Pankratov. They predicted the existence of similar massive surface states at the interface of materials with mutually inverted bands. We first found indications for such massive Volkov-Pankratov states in high-frequency compressibility measurements for very high electron densities in a fruitful collaboration with LPA in Paris. Magneto-transport measurements and \(k \cdot p\) calculations revealed that such Volkov-Pankratov states are also responsible for the observed whole transport. We also found indications for similar massive VPS in the electron regime, which coexist with the topological surface states. The topological surface states exist over the full investigated gate range including a regime of pure topological insulator transport. To increase the variability of the topological surface states we introduced a modulation doping layer in the buffer layer. This modulation doping layer also enabled us to separate and identify the top and bottom topological surface states. We used the variability of the bulk band structure of HgTe with strain to engineer the band structure of choice using virtual substrates. The virtual substrates enable us to grow compressively strained HgTe layers that do not possess a bandgap, but instead linear crossing points. These layers are predicted to beDirac semi-metals. Indeed I observed also topological surface states and massive Volkov-Pankratov states in the compressively strained Dirac semi-metal phase. The observation of topological surfaces states also in the Dirac semi-metal phase has two consequences: First, it highlights that no bulk bandgap is necessary to observe topological surface states. Second, the observation of TSS also in the Dirac semi-metal phase emphasizes the importance of the underlying band inversion in this phase. I could not find any clear signatures of the predicted disjoint topological surface states, which are typically called Fermi-arcs. The presence of topological surface states and massive Volkov-Pankratov states offer a simple explanation for the observed quantum Hall effect and other two-dimensional transport phenomena in the class of inversion induced Dirac semi-metals, as \(\text{Cd}_3\text{As}_2\). This emphasizes the importance of the inherent bulk band inversion of different topological materials and provides a consistent and elegant explanation for the observed phenomena in these materials. Additionally, it offers a route to design further experiments, devices, and thus the foundation for the induction of superconductivity and thus topological quantum computing. Another possible path towards quantum computing has been proposed based on the chiral anomaly. The chiral anomaly is an apparent transport anomaly that manifests itself as an additional magnetic field-driven current in three-dimensional topological semimetals with a linear crossing point in their bulk band structure. I observed the chiral anomaly in compressively strained HgTe samples and performed multiple control experiments to identify the observed reduction of the magnetoresistance with the chiral anomaly. First, the dependence of the so-called negative magnetoresistance on the angle and strength of the magnetic field has been shown to fit the expectation for the chiral anomaly. Second, extrinsic effects as scattering could be excluded as a source for the observed negative MR using samples with different mobilities and thus impurity concentrations. Third, the necessity of the linear crossing point has been shown by shifting the electrochemical potential away from the linear crossing points, which diminished the negative magnetoresistance. Fourth, I could not observe a negative magnetoresistance in the three-dimensional topological insulator phase of HgTe. These observations together prove the existence of the chiral anomaly and verify compressively strained HgTe as Dirac semi-metal. Surprisingly, the chiral anomaly is also present in unstrained HgTe samples, which constitute a semi-metal with a quadratic band touching point. This observation reveals the relevance of the Zeeman effect for the chiral anomaly due to the lifting of the spin-degeneracy in these samples. Additionally to the chiral anomaly, the Dirac semi-metal phase of compressively strained HgTe showed other interesting effects. For low magnetic fields, a strong weak-antilocalization has been observed. Such a strong weak-anti-localization correction in a three-dimensional layer is surprising and interesting. Additionally, non-trivial magnetic field strength and direction dependencies have been observed. These include a strong positive magnetoresistance for high magnetic fields, which could indicate a metal-insulator transition. On a more device-oriented note, the semi-metal phase of unstrained HgTe constitutes the lower limit of the by strain engineering adjustable minimal carrier density of the topological surface states and thus of very high mobility. To sum up, topological surface states have been observed in the three-dimensional topological insulator phase and the Dirac semi-metal phase of HgTe. The existence and accessibility of topological surface states are thus independent of the existence of a bandgap in the bulk band structure. The topological surface states can be accompanied by massive Volkov-Pankratov states. These VPS are created by electric fields, which are routinely applied to adjust the carrier density in semiconductor devices. The theoretical predicted chiral anomaly has been observed in the Dirac semi-metal phase of HgTe. In contrast to theoretical predictions, no indications for the Fermi-arc called disjoint surface states have been observed, but instead the topological and massive Volkov-Pankratov surface states have been found. These states are thus expected for all inversion-induced topological materials.}, subject = {Quecksilbertellurid}, language = {en} } @phdthesis{Bendias2018, author = {Bendias, Michel Kalle}, title = {Quantum Spin Hall Effect - A new generation of microstructures}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-168214}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2018}, abstract = {The presented thesis summarizes the results from four and a half years of intense lithography development on (Cd,Hg)Te/HgTe/(Cd,Hg)Te quantum well structures. The effort was motivated by the unique properties of this topological insulator. Previous work from Molenkamp at al.\ has proven that the transport through such a 2D TI is carried by electrons with opposite spin, counter-propagating in 1D channels along the sample edge. However, up to this thesis, the length of quantized spin Hall channels has never been reported to exceed 4 µm. Therefore, the main focus was put on a reproducible and easy-to-handle fabrication process that reveals the intrinsic material parameters. Every single lithography step in macro as well as microscopic sample fabrication has been re-evaluated. In the Development, the process changes have been presented along SEM pictures, microgaphs and, whenever possible, measurement responses. We have proven the conventional ion milling etch method to damage the remaining mesa and result in drastically lower electron mobilities in samples of microscopic size. The novel KI:I2:HBr wet etch method for macro and microstructure mesa fabrication has been shown to leave the crystalline structure intact and result in unprecedented mobilities, as high as in macroscopic characterization Hall bars. Difficulties, such as an irregular etch start and slower etching of the conductive QW have been overcome by concentration, design and etch flow adaptations. In consideration of the diffusive regime, a frame around the EBL write field electrically decouples the structure mesa from the outside wafer. As the smallest structure, the frame is etched first and guarantees a non-different etching of the conductive layer during the redox reaction. A tube-pump method assures reproducible etch results with mesa heights below 300 nm. The PMMA etch mask is easy to strip and leaves a clean mesa with no redeposition. From the very first attempts, to the final etch process, the reader has been provided with the characteristics and design requirements necessary to enable the fabrication of nearly any mesa shape within an EBL write field of 200 µm. Magneto resistance measurement of feed-back samples have been presented along the development chronology of wet etch method and subsequent lithography steps. With increasing feature quality, more and more physics has been revealed enabling detailed evaluation of smallest disturbances. The following lithography improvements have been implemented. They represent a tool-box for high quality macro and microstructure fabrication on (CdHg)Te/HgTe of almost any kind. The optical positive resist ECI 3027 can be used as wet and as dry etch mask for structure sizes larger than 1 µm. It serves to etch mesa structures larger than the EBL write field. The double layer PMMA is used for ohmic contact fabrication within the EBL write field. Its thickness allows to first dry etch the (Cd,Hg)Te cap layer and then evaporate the AuGe contact, in situ and self-aligned. Because of an undercut, up to 300 nm can be metalized without any sidewalls after the lift-off. An edge channel mismatch within the contact leads can be avoided, if the ohmic contacts are designed to reach close to the sample and beneath the later gate electrode. The MIBK cleaning step prior to the gate application removes PMMA residuals and thereby improves gate and potential homogeneity. The novel low HfO2-ALD process enables insulator growth into optical and EBL lift-off masks of any resolvable shape. Directly metalized after the insulator growth, the self-aligned method results in thin and homogeneous gate electrode reproducibly withholding gate voltages to +-10 V. The optical negative resist ARN 4340 exhibits an undercut when developed. Usable as dry etch mask and lift-off resist, it enables an in-situ application of ohmic contacts first etching close to the QW, then metalizing AuGe. Up to 500 nm thickness, the undercut guarantees an a clean lift-off with no sidewalls. The undertaken efforts have led to micro Hall bar measurements with Hall plateaus and SdH-oszillations in up to now unseen levels of detail. The gap resistance of several micro Hall bars with a clear QSH signal have been presented in Quantum Spin Hall. The first to exhibit longitudinal resistances close to the expected h/2e2 since years, they reveal unprecedented details in features and characteristics. It has been shown that their protection against backscattering through time reversal symmetry is not as rigid as previously claimed. Values below and above 12.9 kΩ been explained, introducing backscattering within the Landauer-B{\"u}ttiker formalism of edge channel transport. Possible reasons have been discussed. Kondo, interaction and Rashba-backscattering arising from density inhomogeneities close to the edge are most plausible to explain features on and deviations from a quantized value. Interaction, tunneling and dephasing mechanisms as well as puddle size, density of states and Rashba Fields are gate voltage dependent. Therefore, features in the QSH signal are fingerprints of the characteristic potential landscape. Stable up to 11 K, two distinct but clear power laws have been found in the higher temperature dependence of the QSH in two samples. However, with ΔR = Tα, α = ¼ in one (QC0285) and α = 2 in the other (Q2745), none of the predicted dependencies could be confirmed. Whereas, the gap resistances of QC0285 remains QSH channel dominated up to 3.9 T and thereby confirmed the calculated lifting of the band inversion in magnetic field. The gate-dependent oscillating features in the QSH signal of Q2745 immediately increase in magnetic field. The distinct field dependencies allowed the assumption of two different dominant backscattering mechanisms. Resulting in undisturbed magneto transport and unprecedented QSH measurements The Novel Micro Hall Bar Process has proven to enable the fabrication of a new generation of microstructures.}, subject = {Quecksilbertellurid}, language = {en} } @phdthesis{Wiedenmann2018, author = {Wiedenmann, Jonas}, title = {Induced topological superconductivity in HgTe based nanostructures}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-162782}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2018}, abstract = {This thesis describes the studies of topological superconductivity, which is predicted to emerge when pair correlations are induced into the surface states of 2D and 3D topolog- ical insulators (TIs). In this regard, experiments have been designed to investigate the theoretical ideas first pioneered by Fu and Kane that in such system Majorana bound states occur at vortices or edges of the system [Phys. Rev. Lett. 100, 096407 (2008), Phys. Rev. B 79, 161408 (2009)]. These states are of great interest as they constitute a new quasiparticle which is its own antiparticle and can be used as building blocks for fault tolerant topological quantum computing. After an introduction in chapter 1, chapter 2 of the thesis lays the foundation for the understanding of the field of topology in the context of condensed matter physics with a focus on topological band insulators and topological superconductors. Starting from a Chern insulator, the concepts of topological band theory and the bulk boundary corre- spondence are explained. It is then shown that the low energy Hamiltonian of mercury telluride (HgTe) quantum wells of an appropriate thickness can be written as two time reversal symmetric copies of a Chern insulator. This leads to the quantum spin Hall effect. In such a system, spin-polarized one dimensional conducting states form at the edges of the material, while the bulk is insulating. This concept is extended to 3D topological insulators with conducting 2D surface states. As a preliminary step to treating topological superconductivity, a short review of the microscopic theory of superconductivity, i.e. the theory of Bardeen, Cooper, and Shrieffer (BCS theory) is presented. The presence of Majorana end modes in a one dimensional superconducting chain is explained using the Kitaev model. Finally, topological band insulators and conventional superconductivity are combined to effectively engineer p-wave superconductivity. One way to investigate these states is by measuring the periodicity of the phase of the Josephson supercurrent in a topological Josephson junction. The signature is a 4π-periodicity compared to the 2π-periodicity in conventional Josephson junctions. The proof of the presence of this effect in HgTe based Josephson junction is the main goal of this thesis and is discussed in chapters 3 to 6. Chapter 3 describes in detail the transport of a 3D topological insulator based weak link under radio-frequency radiation. The chapter starts with a review of the state of research of (i) strained HgTe as 3D topological insulator and (ii) the progress of induc- ing superconducting correlations into the topological surface states and the theoretical predictions of 3D TI based Josephson junctions. Josephson junctions based on strained HgTe are successfully fabricated. Before studying the ac driven Josephson junctions, the dc transport of the devices is analysed. The critical current as a function of temperature is measured and it is possible to determine the induced superconducting gap. Under rf illumination Shapiro steps form in the current voltage characteristic. A missing first step at low frequencies and low powers is found in our devices. This is a signature of a 4π-periodic supercurrent. By studying the device in a wide parameter range - as a 147148 SUMMARY function of frequency, power, device geometry and magnetic field - it is shown that the results are in agreement with the presence of a single gapless Andreev doublet and several conventional modes. Chapter 4 gives results of the numerical modelling of the I -V dynamics in a Josephson junction where both a 2π- and a 4π-periodic supercurrents are present. This is done in the framework of an equivalent circuit representation, namely the resistively shunted Josephson junction model (RSJ-model). The numerical modelling is in agreement with the experimental results in chapter 3. First, the missing of odd Shapiro steps can be understood by a small 4π-periodic supercurrent contribution and a large number of modes which have a conventional 2π-periodicity. Second, the missing of odd Shapiro steps occurs at low frequency and low rf power. Third, it is shown that stochastic processes like Landau Zener tunnelling are most probably not responsible for the 4π contribution. In a next step the periodicity of Josephson junctions based on quantum spin Hall insulators using are investigated in chapter 5. A fabrication process of Josephson junctions based on inverted HgTe quantum wells was successfully developed. In order to achieve a good proximity effect the barrier material was removed and the superconductor deposited without exposing the structure to air. In a next step a gate electrode was fabricated which allows the chemical potential of the quantum well to be tuned. The measurement of the diffraction pattern of the critical current Ic due to a magnetic field applied perpendicular to the sample plane was conducted. In the vicinity to the expected quantum spin Hall phase, the pattern resembles that of a superconducting quantum interference device (SQUID). This shows that the current flows predominantly on the edges of the mesa. This observation is taken as a proof of the presence of edge currents. By irradiating the sample with rf, missing odd Shapiro steps up to step index n = 9 have been observed. This evidences the presence of a 4π-periodic contribution to the supercurrent. The experiment is repeated using a weak link based on a non-inverted HgTe quantum well. This material is expected to be a normal band insulator without helical edge channels. In this device, all the expected Shapiro steps are observed even at low frequencies and over the whole gate voltage range. This shows that the observed phenomena are directly connected to the topological band structure. Both features, namely the missing of odd Shapiro steps and the SQUID like diffraction pattern, appear strongest towards the quantum spin Hall regime, and thus provide evidence for induced topological superconductivity in the helical edge states. A more direct way to probe the periodicity of the Josephson supercurrent than using Shapiro steps is the measurement of the emitted radiation of a weak link. This experiment is presented in chapter 6. A conventional Josephson junction converts a dc bias V to an ac current with a characteristic Josephson frequency fJ = eV /h. In a topological Josephson junction a frequency at half the Josephson frequency fJ /2 is expected. A new measurement setup was developed in order to measure the emitted spectrum of a single Josephson junction. With this setup the spectrum of a HgTe quantum well based Josephson junction was measured and the emission at half the Josephson frequency fJ /2 was detected. In addition, fJ emission is also detected depending on the gate voltage and detection frequency. The spectrum is again dominated by half the Josephson emission at low voltages while the conventional emission is determines the spectrum at high voltages. A non-inverted quantum well shows only conventional emission over the whole gateSUMMARY 149 voltage and frequency range. The linewidth of the detected frequencies gives a measure on the lifetime of the bound states: From there, a coherence time of 0.3-4ns for the fJ /2 line has been deduced. This is generally shorter than for the fJ line (3-4ns). The last part of the thesis, chapter 7, reports on the induced superconducting state in a strained HgTe layer investigated by point-contact Andreev reflection spectroscopy. For the experiment, a HgTe mesa was fabricated with a small constriction. The diameter of the orifice was chosen to be smaller than the mean free path estimated from magne- totransport measurements. Thus one gets a ballistic point-contact which allows energy resolved spectroscopy. One part of the mesa is covered with a superconductor which induces superconducting correlations into the surface states of the topological insulator. This experiment therefore probes a single superconductor normal interface. In contrast to the Josephson junctions studied previously, the geometry allows the acquisition of energy resolved information of the induced superconducting state through the measurement of the differential conductance dI/dV as a function of applied dc bias for various gate voltages, temperatures and magnetic fields. An induced superconducting order parame- ter of about 70µeV was extracted but also signatures of the niobium gap at the expected value around Δ Nb ≈ 1.1meV have been found. Simulations using the theory developed by Blonder, Tinkham and Klapwijk and an extended model taking the topological surface states into account were used to fit the data. The simulations are in agreement with a small barrier at the topological insulator-induced topological superconductor interface and a high barrier at the Nb to topological insulator interface. To understand the full con- ductance curve as a function of applied voltage, a non-equilibrium driven transformation is suggested. The induced superconductivity is suppressed at a certain bias value due to local electron population. In accordance with this suppression, the relevant scattering regions change spatially as a function of applied bias. To conclude, it is emphasized that the experiments conducted in this thesis found clear signatures of induced topological superconductivity in HgTe based quantum well and bulk devices and opens up the avenue to many experiments. It would be interesting to apply the developed concepts to other topological matter-superconductor hybrid systems. The direct spectroscopy and manipulation of the Andreev bound states using circuit quantum electrodynamic techniques should be the next steps for HgTe based samples. This was already achieved in superconducting atomic break junctions by the group in Saclay [Science 2015, 349, 1199-1202 (2015)]. Another possible development would be the on-chip detection of the emitted spectrum as a function of the phase φ through the junction. In this connection, the topological junction needs to be shunted by a parallel ancillary junction. Such a setup would allow the current phase relation I(φ) directly and the lifetime of the bound states to be measured directly. By coupling this system to a spectrometer, which can be another Josephson junction, the energy dependence of the Andreev bound states E(φ) could be obtained. The experiments on the Andreev reflection spectroscopy described in this thesis could easily be extended to two dimensional topological insulators and to more complex geometries, like a phase bias loop or a tunable barrier at the point-contact. This work might also be useful for answering the question how and why Majorana bound states can be localized in quantum spin Hall systems.}, subject = {Quecksilbertellurid}, language = {en} } @phdthesis{Leubner2017, author = {Leubner, Philipp}, title = {Strain-engineering of the Topological Insulator HgTe}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-152446}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2017}, abstract = {The subject of this thesis is the control of strain in HgTe thin-film crystals. Such systems are members of the new class of topological insulator materials and therefore of special research interest. A major task was the experimental control of the strain in the HgTe films. This was achieved by a new epitaxial approach and confirmed by cristallographic analysis and magneto-transport measurements. In this work, strain was induced in thin films by means of coherent epitaxy on substrate crystals. This means that the film adopts the lattice constant of the substrate in the plane of the substrate-epilayer interface. The level of strain is determined by the difference between the strain-free lattice constants of the substrate and epilayer material (the so-called lattice mismatch). The film responds to an in-plane strain with a change of its lattice constant perpendicular to the interface. This relationship is crucial for both the correct interpretation of high resolution X-ray diffraction (HRXRD) measurements, and the precise determination of the band dispersion. The lattice constant of HgTe is smaller than the lattice constant of CdTe. Therefore, strain in HgTe is tensile if it is grown on a CdTe substrate. In principle, compressive strain can be achieved by using an appropriate \(\text{Cd}_{1-x}\text{Zn}_{x}\text{Te}\) substrate. This concept was modified and applied in this work. Epilayers have been fabricated by molecular-beam epitaxy (MBE). The growth of thick buffer layers of CdTe on GaAs:Si was established as an alternative to commercial CdTe and \(text{Cd}_{0.96}\text{Zn}_{0.04}\text{Te}\) substrates. The growth conditions have been optimized by an analysis of atomic force microscopy and HRXRD studies. HRXRD measurements reveal a power-law increase of the crystal quality with increasing thickness. Residual strain was found in the buffer layers, and was attributed to a combination of finite layer thickness and mismatch of the thermal expansion coefficients of CdTe and GaAs. In order to control the strain in HgTe epilayers, we have developed a new type of substrate with freely adjustable lattice constant. CdTe-\(\text{Cd}_{0.5}\text{Zn}_{0.5}\text{Te}\) strained-layer-superlattices have been grown by a combination of MBE and atomic-layer epitaxy (ALE), and have been analyzed by HRXRD. ALE of the \(\text{Cd}_{0.5}\text{Zn}_{0.5}\text{Te}\) layer is self-limiting to one monolayer, and the effective lattice constant can be controlled reproducibly and straightforward by adjusting the CdTe layer thickness. The crystal quality has been found to degrade with increasing Zn-fraction. However, the effect is less drastic compared to single layer \(\text{Cd}_{1-x}\text{Zn}_{x}\text{Te}\) solid solutions. HgTe quantum wells (QWs) sandwiched in between CdHgTe barriers have been fabricated in a similar fashion on superlattices and conventional CdTe and \(\text{Cd}_{0.96}\text{Zn}_{0.04}\text{Te}\) substrates. The lower critical thickness of the CdHgTe barrier material grown on superlattice substrates had to be considered regarding the sample design. The electronic properties of the QWs depend on the strain and thickness of the QW. We have determined the QW thickness with an accuracy of \(\pm\)0.5 nm by an analysis of the beating patterns in the thickness fringes of HRXRD measurements and X-ray reflectometry measurements. We have, for the first time, induced compressive strain in HgTe QWs by an epitaxial technique (i.e. the effective lattice constant of the superlattice is lower compared to the lattice constant of HgTe). The problem of the lattice mismatch between superlattice and barriers has been circumvented by using CdHgTe-ZnHgTe superlattices instead of CdHgTe as a barrier material. Furthermore, the growth of compressively strained HgTe bulk layers (with a thickness of at least 50 nm) was demonstrated as well. The control of the state of strain adds a new degree of freedom to the design of HgTe epilayers, which has a major influence on the band structure of QWs and bulk layers. Strain in bulk layers lifts the degeneracy of the \(\Gamma_8\) bands at \(\mathbf{k}=0\). Tensile strain opens an energy gap, compressive strain shifts the touching points of the valence- and conduction band to positions in the Brillouin zone with finite \(\mathbf{k}\). Such a situation has been realized for the first time in the course of this work. For QWs in the inverted regime, it is demonstrated that compressive strain can be used to significantly enhance the thermal energy gap of the two-dimensional electron gas (2DEG). In addition, semi-metallic and semiconducting behavior is expected in wide QWs, depending on the state of strain. An examination of the temperature dependence of the subband ordering in QWs revealed that the band gap is only temperature-stable for appropriate sample parameters and temperature regimes. The band inversion is always lifted for sufficiently high temperatures. A large number of models investigate the influence of the band gap on the stability of the quantum-spin-Hall (QSH) effect. An enhancement of the stability of QSH edge state conductance is expected for enlarged band gaps. Furthermore, experimental studies on the temperature dependence of the QSH conductance are in contradiction to theoretical predictions. Systematic studies of these aspects have become feasible based on the new flexibility of the sample design. Detailed low-temperature magnetotransport studies have been carried out on QWs and bulk layers. For this purpose, devices have been fabricated lithographically, which consist of two Hall-bar geometries with different dimensions. This allows to discriminate between conductance at the plane of the 2DEG and the edge of the sample. The Fermi energy in the 2DEG has been adjusted by means of a top gate electrode. The strain-induced transition from semi-metallic to semiconducting characteristics in wide QWs was shown. The magnitude of the semi-metallic overlap of valence- and conduction band was determined by an analysis of the two-carrier conductance and is in agreement with band structure calculations. The band gap of the semiconducting sample was determined by measurements of the temperature dependence of the conductance at the charge-neutrality point. Agreement with the value expected from theory has been achieved for the first time in this work. The influence of the band gap on the stability of QSH edge state conductance has been investigated on a set of six samples. The band gap of the set spans a range of 10 to 55 meV. The latter value has been achieved in a highly compressively strained QW, has been confirmed by temperature-dependent conductance measurements, and is the highest ever reported in the inverted regime. Studies of the carrier mobility reveal a degradation of the sample quality with increasing Zn-fraction in the superlattice, in agreement with HRXRD observations. The enhanced band gap does not suppress scattering mechanisms in QSH edge channels, but lowers the conductance in the plane of the 2DEG. Hence, edge state conductance is the dominant conducting process even at elevated temperatures. An increase in conductance with increasing temperature has been found, in agreement with reports from other groups. The increase follows a power-law dependency, the underlying physical mechanism remains open. A cause for the lack of an increase of the QSH edge state conductance with increasing energy gap has been discussed. Possibly, the sample remains insulating even at finite carrier densities, due to localization effects. The measurement does not probe the QSH edge state conductance at the situation where the Fermi energy is located in the center of the energy gap, but in the regime of maximized puddle-driven scattering. In a first set of measurements, it has been shown that the QSH edge state conductance can be influenced by hysteretic charging effects of trapped states in the insulating dielectric. A maximized conductance of \(1.6\ \text{e}^2/\text{h}\) was obtained in a \(58\ \mu\text{m}\) edge channel. Finally, measurements on three dimensional samples have been discussed. Recent theoretical works assign compressively strained HgTe bulk layers to the Weyl semi-metal class of materials. Such layers have been synthesized and studied in magnetotransport experiments for the first time. Pronounced quantum-Hall- and Shubnikov-de-Haas features in the Hall- and longitudinal resistance indicate two-dimensional conductance on the sample surface. However, this conductance cannot be assigned definitely to Weyl surface states, due to the inversion of \(\Gamma_6\) and \(\Gamma_8\) bands. If a magnetic field is aligned parallel to the current in the device, a decrease in the longitudinal resistance is observed with increasing magnetic field. This is a signature of the chiral anomaly, which is expected in Weyl semi-metals.}, subject = {Quecksilbertellurid}, language = {en} } @phdthesis{Ames2015, author = {Ames, Christopher}, title = {Molecular Beam Epitaxy of 2D and 3D HgTe, a Topological Insulator}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-151136}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2015}, abstract = {In the present thesis the MBE growth and sample characterization of HgTe structures is investigated and discussed. Due to the first experimental discovery of the quantum Spin Hall effect (QSHE) in HgTe quantum wells, this material system attains a huge interest in the spintronics society. Because of the long history of growing Hg-based heterostructures here at the Experimentelle Physik III in W{\"u}rzburg, there are very good requirements to analyze this material system more precisely and in new directions. Since in former days only doped HgTe quantum wells were grown, this thesis deals with the MBE growth in the (001) direction of undoped HgTe quantum wells, surface located quantum wells and three dimensional bulk layers. All Hg-based layers were grown on CdTe substrates which generate strain in the layer stack and provide therefore new physical effects. In the same time, the (001) CdTe growth was investigated on n-doped (001) GaAs:Si because the Japanese supplier of CdTe substrates had a supply bottleneck due to the Tohoku earthquake and its aftermath in 2011. After a short introduction of the material system, the experimental techniques were demonstrated and explained explicitly. After that, the experimental part of this thesis is displayed. So, the investigation of the (001) CdTe growth on (001) GaAs:Si is discussed in chapter 4. Firstly, the surface preparation of GaAs:Si by oxide desorption is explored and analyzed. Here, rapid thermal desorption of the GaAs oxide with following cool down in Zn atmosphere provides the best results for the CdTe due to small holes at the surface, while e.g. an atomic flat GaAs buffer deteriorates the CdTe growth quality. The following ZnTe layer supplies the (001) growth direction of the CdTe and exhibits best end results of the CdTe for 30 seconds growth time at a flux ratio of Zn/Te ~ 1/1.2. Without this ZnTe layer, CdTe will grow in the (111) direction. However, the main investigation is here the optimization of the MBE growth of CdTe. The substrate temperature, Cd/Te flux ratio and the growth time has to be adjusted systematically. Therefore, a complex growth process is developed and established. This optimized CdTe growth process results in a RMS roughness of around 2.5 nm and a FWHM value of the HRXRD w-scan of 150 arcsec. Compared to the literature, there is no lower FWHM value traceable for this growth direction. Furthermore, etch pit density measurements show that the surface crystallinity is matchable with the commercial CdTe substrates (around 1x10^4 cm^(-2)). However, this whole process is not completely perfect and offers still room for improvements. The growth of undoped HgTe quantum wells was also a new direction in research in contrast to the previous n-doped grown HgTe quantum wells. Here in chapter 5, the goal of very low carrier densities was achieved and therefore it is now possible to do transport experiments in the n - and p - region by tuning the gate voltage. To achieve this high sample quality, very precise growth of symmetric HgTe QWs and their HRXRD characterization is examined. Here, the quantum well thickness can now determined accurate to under 0.3 nm. Furthermore, the transport analysis of different quantum well thicknesses shows that the carrier density and mobility increase with rising HgTe layer thickness. However, it is found out that the band gap of the HgTe QW closes indirectly at a thickness of 11.6 nm. This is caused by the tensile strained growth on CdTe substrates. Moreover, surface quantum wells are studied. These quantum wells exhibit no or a very thin HgCdTe cap. Though, oxidization and contamination of the surface reduces here the carrier mobility immensely and a HgCdTe layer of around 5 nm provides the pleasing results for transport experiments with superconductors connected to the topological insulator [119]. A completely new achievement is the realization of MBE growth of HgTe quantum wells on CdTe/GaAs:Si substrates. This is attended by the optimization of the CdTe growth on GaAs:Si. It exposes that HgTe quantum wells grown in-situ on optimized CdTe/GaAs:Si show very nice transport data with clear Hall plateaus, SdH oscillations, low carrier densities and carrier mobilities up to 500 000 cm^2/Vs. Furthermore, a new oxide etching process is developed and analyzed which should serve as an alternative to the standard HCl process which generates volcano defects at some time. However, during the testing time the result does not differ in Nomarski, HRXRD, AFM and transport measurements. Here, long-time tests or etching and mounting in nitrogen atmosphere may provide new elaborate results. The main focus of this thesis is on the MBE growth and standard characterization of HgTe bulk layers and is discussed in chapter 6. Due to the tensile strained growth on lattice mismatched CdTe, HgTe bulk opens up a band gap of around 22 meV at the G-point and exhibits therefore its topological surface states. The analysis of surface condition, roughness, crystalline quality, carrier density and mobility via Nomarski, AFM, XPS, HRXRD and transport measurements is therefore included in this work. Layer thickness dependence of carrier density and mobility is identified for bulk layer grown directly on CdTe substrates. So, there is no clear correlation visible between HgTe layer thickness and carrier density or mobility. So, the carrier density is almost constant around 1x10^11 cm^(-2) at 0 V gate voltage. The carrier mobility of these bulk samples however scatters between 5 000 and 60 000 cm^2/Vs almost randomly. Further experiments should be made for a clearer understanding and therefore the avoidance of unusable bad samples.But, other topological insulator materials show much higher carrier densities and lower mobility values. For example, Bi2Se3 exhibits just density values around 1019 cm^(-2) and mobility values clearly below 5000 cm2/Vs. The carrier density however depends much on lithography and surface treatment after growth. Furthermore, the relaxation behavior and critical thickness of HgTe grown on CdTe is determined and is in very good agreement with theoretical prediction (d_c = 155 nm). The embedding of the HgTe bulk layer between HgCdTe layers created a further huge improvement. Similar to the quantum well structures the carrier mobility increases immensely while the carrier density levels at around 1x10^11 cm^(-2) at 0 V gate voltage as well. Additionally, the relaxation behavior and critical thickness of these barrier layers has to be determined. HgCdTe grown on commercial CdTe shows a behavior as predicted except the critical thickness which is slightly higher than expected (d_c = 850 nm). Otherwise, the relaxation of HgCdTe grown on CdTe/GaAs:Si occurs in two parts. The layer is fully strained up to 250 nm. Between 250 nm and 725 nm the HgCdTe film starts to relax randomly up to 10 \%. The relaxation behavior for thicknesses larger than 725 nm occurs than linearly to the inverse layer thickness. A explanation is given due to rough interface conditions and crystalline defects of the CdTe/GaAs:Si compared to the commercial CdTe substrate. HRXRD and AFM data support this statement. Another point is that the HgCdTe barriers protect the active HgTe layer and because of the high carrier mobilities the Hall measurements provide new transport data which have to be interpreted more in detail in the future. In addition, HgTe bulk samples show very interesting transport data by gating the sample from the top and the back. It is now possible to manipulate the carrier densities of the top and bottom surface states almost separately. The back gate consisting of the n-doped GaAs substrate and the thick insulating CdTe buffer can tune the carrier density for Delta(n) ~ 3x10^11 cm^(-2). This is sufficient to tune the Fermi energy from the p-type into the n-type region [138]. In this thesis it is shown that strained HgTe bulk layers exhibit superior transport data by embedding between HgCdTe barrier layers. The n-doped GaAs can here serve as a back gate. Furthermore, MBE growth of high crystalline, undoped HgTe quantum wells shows also new and extended transport output. Finally, it is notable that due to the investigated CdTe growth on GaAs the Hg-based heterostructure MBE growth is partially independent from commercial suppliers.}, subject = {Quecksilbertellurid}, language = {en} }