@phdthesis{Schnells2019,
  author    = {Schnells, Vera},
  title     = {Fractional Insulators and their Parent Hamiltonians},
  doi       = {10.25972/OPUS-18561},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-185616},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2019},
  abstract  = {In the past few years, two-dimensional quantum liquids with fractional excitations have been a topic of high interest due to their possible application in the emerging field of quantum computation and cryptography. This thesis is devoted to a deeper understanding of known and new fractional quantum Hall states and their stabilization in local models. We pursue two different paths, namely chiral spin liquids and fractionally quantized, topological phases. The chiral spin liquid is one of the few examples of spin liquids with fractional statistics. Despite its numerous promising properties, the microscopic models for this state proposed so far are all based on non-local interactions, making the experimental realization challenging. In the first part of this thesis, we present the first local parent Hamiltonians, for which the Abelian and non-Abelian chiral spin liquids are the exact and, modulo a topological degeneracy, unique ground states. We have developed a systematic approach to find an annihilation operator of the chiral spin liquid and construct from it a many-body interaction which establishes locality. For various system sizes and lattice geometries, we numerically find largely gapped eigenspectra and confirm to an accuracy of machine precision the uniqueness of the chiral spin liquid as ground state of the respective system. Our results provide an exact spin model in which fractional quantization can be studied. Topological insulators are one of the most actively studied topics in current condensed matter physics research. With the discovery of the topological insulator, one question emerged: Is there an interaction-driven set of fractionalized phases with time reversal symmetry? One intuitive approach to the theoretical construction of such a fractional topological insulator is to take the direct product of a fractional quantum Hall state and its time reversal conjugate. However, such states are well studied conceptually and do not lead to new physics, as the idea of taking a state and its mirror image together without any entanglement between the states has been well understood in the context of topological insulators. Therefore, the community has been looking for ways to implement some topological interlocking between different spin species. Yet, for all practical purposes so far, time reversal symmetry has appeared to limit the set of possible fractional states to those with no interlocking between the two spin species. In the second part of this thesis, we propose a new universality class of fractionally quantized, topologically ordered insulators, which we name "fractional insulator". Inspired by the fractional quantum Hall effect, spin liquids, and fractional Chern insulators, we develop a wave function approach to a new class of topological order in a two-dimensional crystal of spin-orbit coupled electrons. The idea is simply to allow the topological order to violate time reversal symmetry, while all locally observable quantities remain time reversal invariant. We refer to this situation as "topological time reversal symmetry breaking". Our state is based on the Halperin double layer states and can be viewed as a two-layer system of an ↑-spin and a ↓-spin sphere. The construction starts off with Laughlin states for the ↑-spin and ↓-spin electrons and an interflavor term, which creates correlations between the two layers. With a careful parameter choice, we obtain a state preserving time reversal symmetry locally, and label it the "311-state". For systems of up to six ↑-spin and six ↓-spin electrons, we manage to construct an approximate parent Hamiltonian with a physically realistic, local interaction.},
  subject      = {Spinfl{\"u}ssigkeit},
  language  = {en}
}
@phdthesis{Bendias2018,
  author    = {Bendias, Michel Kalle},
  title     = {Quantum Spin Hall Effect - A new generation of microstructures},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-168214},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2018},
  abstract  = {The presented thesis summarizes the results from four and a half years of intense lithography development on (Cd,Hg)Te/HgTe/(Cd,Hg)Te quantum well structures. The effort was motivated by the unique properties of this topological insulator. Previous work from Molenkamp at al.\ has proven that the transport through such a 2D TI is carried by electrons with opposite spin, counter-propagating in 1D channels along the sample edge. However, up to this thesis, the length of quantized spin Hall channels has never been reported to exceed 4 µm. Therefore, the main focus was put on a reproducible and easy-to-handle fabrication process that reveals the intrinsic material parameters. Every single lithography step in macro as well as microscopic sample fabrication has been re-evaluated. In the Development, the process changes have been presented along SEM pictures, microgaphs and, whenever possible, measurement responses. We have proven the conventional ion milling etch method to damage the remaining mesa and result in drastically lower electron mobilities in samples of microscopic size. The novel KI:I2:HBr wet etch method for macro and microstructure mesa fabrication has been shown to leave the crystalline structure intact and result in unprecedented mobilities, as high as in macroscopic characterization Hall bars. Difficulties, such as an irregular etch start and slower etching of the conductive QW have been overcome by concentration, design and etch flow adaptations. In consideration of the diffusive regime, a frame around the EBL write field electrically decouples the structure mesa from the outside wafer. As the smallest structure, the frame is etched first and guarantees a non-different etching of the conductive layer during the redox reaction. A tube-pump method assures reproducible etch results with mesa heights below 300 nm. The PMMA etch mask is easy to strip and leaves a clean mesa with no redeposition. From the very first attempts, to the final etch process, the reader has been provided with the characteristics and design requirements necessary to enable the fabrication of nearly any mesa shape within an EBL write field of 200 µm. Magneto resistance measurement of feed-back samples have been presented along the development chronology of wet etch method and subsequent lithography steps. With increasing feature quality, more and more physics has been revealed enabling detailed evaluation of smallest disturbances. The following lithography improvements have been implemented. They represent a tool-box for high quality macro and microstructure fabrication on (CdHg)Te/HgTe of almost any kind. The optical positive resist ECI 3027 can be used as wet and as dry etch mask for structure sizes larger than 1 µm. It serves to etch mesa structures larger than the EBL write field. The double layer PMMA is used for ohmic contact fabrication within the EBL write field. Its thickness allows to first dry etch the (Cd,Hg)Te cap layer and then evaporate the AuGe contact, in situ and self-aligned. Because of an undercut, up to 300 nm can be metalized without any sidewalls after the lift-off. An edge channel mismatch within the contact leads can be avoided, if the ohmic contacts are designed to reach close to the sample and beneath the later gate electrode. The MIBK cleaning step prior to the gate application removes PMMA residuals and thereby improves gate and potential homogeneity. The novel low HfO2-ALD process enables insulator growth into optical and EBL lift-off masks of any resolvable shape. Directly metalized after the insulator growth, the self-aligned method results in thin and homogeneous gate electrode reproducibly withholding gate voltages to +-10 V. The optical negative resist ARN 4340 exhibits an undercut when developed. Usable as dry etch mask and lift-off resist, it enables an in-situ application of ohmic contacts first etching close to the QW, then metalizing AuGe. Up to 500 nm thickness, the undercut guarantees an a clean lift-off with no sidewalls. The undertaken efforts have led to micro Hall bar measurements with Hall plateaus and SdH-oszillations in up to now unseen levels of detail. The gap resistance of several micro Hall bars with a clear QSH signal have been presented in Quantum Spin Hall. The first to exhibit longitudinal resistances close to the expected h/2e2 since years, they reveal unprecedented details in features and characteristics. It has been shown that their protection against backscattering through time reversal symmetry is not as rigid as previously claimed. Values below and above 12.9 kΩ been explained, introducing backscattering within the Landauer-B{\"u}ttiker formalism of edge channel transport. Possible reasons have been discussed. Kondo, interaction and Rashba-backscattering arising from density inhomogeneities close to the edge are most plausible to explain features on and deviations from a quantized value. Interaction, tunneling and dephasing mechanisms as well as puddle size, density of states and Rashba Fields are gate voltage dependent. Therefore, features in the QSH signal are fingerprints of the characteristic potential landscape. Stable up to 11 K, two distinct but clear power laws have been found in the higher temperature dependence of the QSH in two samples. However, with ΔR = Tα, α = ¼ in one (QC0285) and α = 2 in the other (Q2745), none of the predicted dependencies could be confirmed. Whereas, the gap resistances of QC0285 remains QSH channel dominated up to 3.9 T and thereby confirmed the calculated lifting of the band inversion in magnetic field. The gate-dependent oscillating features in the QSH signal of Q2745 immediately increase in magnetic field. The distinct field dependencies allowed the assumption of two different dominant backscattering mechanisms. Resulting in undisturbed magneto transport and unprecedented QSH measurements The Novel Micro Hall Bar Process has proven to enable the fabrication of a new generation of microstructures.},
  subject      = {Quecksilbertellurid},
  language  = {en}
}
@phdthesis{Juergens2017,
  author    = {J{\"u}rgens, Stefan},
  title     = {Correlated Topological Materials},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-152202},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2017},
  abstract  = {The topic of this PhD thesis is the combination of topologically non-trivial phases with correlation effects stemming from Coulomb interaction between the electrons in a condensed matter system. Emphasis is put on both emerging benefits as well as hindrances, e.g. concerning the topological protection in the presence of strong interactions. The physics related to topological effects is established in Sec. 2. Based on the topological band theory, we introduce topological materials including Chern insulators, topological insulators in two and three dimensions as well as Weyl semimetals. Formalisms for a controlled treatment of Coulomb correlations are presented in Sec. 3, starting with the topological field theory. The Random Phase Approximation is introduced as a perturbative approach, while in the strongly interacting limit the theory of quantum Hall ferromagnetism applies. Interactions in one dimension are special, and are treated through the Luttinger liquid description. The section ends with an overview of the expected benefits offered by the combination of topology and interactions, see Sec. 3.3. These ideas are then elaborated in the research part. In Chap. II, we consider weakly interacting 2D topological insulators, described by the Bernevig-Hughes-Zhang model. This is applicable, e.g., to quantum well structures made of HgTe/CdTe or InAs/GaSb. The bulk band structure is here a mixture stemming from linear Dirac and quadratic Schr{\"o}dinger fermions. We study the low-energy excitations in Random Phase Approximation, where a new interband plasmon emerges due to the combined Dirac and Schr{\"o}dinger physics, which is absent in the separate limits. Already present in the undoped limit, one finds it also at finite doping, where it competes with the usual intraband plasmon. The broken particle-hole symmetry in HgTe quantum wells allows for an effective separation of the two in the excitation spectrum for experimentally accessible parameters, in the right range for Raman or electron loss spectroscopy. The interacting bulk excitation spectrum shows here clear differences between the topologically trivial and topologically non-trivial regime. An even stronger signal in experiments is expected from the optical conductivity of the system. It thus offers a quantitative way to identify the topological phase of 2D topological insulators from a bulk measurement. In Chap. III, we study a strongly interacting system, forming an ordered, quantum Hall ferromagnetic state. The latter can arise also in weakly interacting materials with an applied strong magnetic field. Here, electrons form flat Landau levels, quenching the kinetic energy such that Coulomb interaction can be dominant. These systems define the class of quantum Hall topological insulators: topologically non-trivial states at finite magnetic field, where the counter-propagating edge states are protected by a symmetry (spatial or spin) other than time-reversal. Possible material realizations are 2D topological insulators like HgTe heterostructures and graphene. In our analysis, we focus on the vicinity of the topological phase transition, where the system is in a strongly interacting quantum Hall ferromagnetic state. The bulk and edge physics can be described by a nonlinear \sigma-model for the collective order parameter of the ordered state. We find that an emerging, continuous U(1) symmetry offers topological protection. If this U(1) symmetry is preserved, the topologically non-trivial phase persists in the presence of interactions, and we find a helical Luttinger liquid at the edge. The latter is highly tunable by the magnetic field, where the effective interaction strength varies from weakly interacting at zero field, K \approx 1, to diverging interaction strength at the phase transition, K -> 0. In the last Chap. IV, we investigate whether a Weyl semimetal and a 3D topological insulator phase can exist together at the same time, with a combined, hybrid surface state at the joint boundaries. An overlap between the two can be realized by Coulomb interaction or a spatial band overlap of the two systems. A tunnel coupling approach allows us to derive the hybrid surface state Hamiltonian analytically, enabling a detailed study of its dispersion relation. For spin-symmetric coupling, new Dirac nodes emerge out of the combination of a single Dirac node and a Fermi arc. Breaking the spin symmetry through the coupling, the dispersion relation is gapped and the former Dirac node gets spin-polarized. We propose experimental realizations of the hybrid physics, including compressively strained HgTe as well as heterostructures of topological insulator and Weyl semimetal materials, connected to each other, e.g., by Coulomb interaction.},
  subject      = {Topologie},
  language  = {en}
}