@phdthesis{Constantino2013,
  author    = {Constantino, Jennifer Anne},
  title     = {Characterization of Novel Magnetic Materials: Ultra-Thin (Ga,Mn)As and Epitaxial-Growth MnSi Thin Films},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-90578},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2013},
  abstract  = {The study of magnetic phases in spintronic materials is crucial to both our fundamental understanding of magnetic interactions and for finding new effects for future applications. In this thesis, we study the basic electrical and magnetic transport properties of both epitaxially-grown MnSi thin films, a helimagnetic metal only starting to be developed within our group, and parabolic-doped ultra-thin (Ga,Mn)As layers for future studies and applications.},
  subject      = {Galliumarsenid},
  language  = {en}
}
@phdthesis{Ruff2013,
  author    = {Ruff, Andreas},
  title     = {On the importance of electronic correlations in potassium-doped organic semiconductors},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-83635},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2013},
  abstract  = {The present thesis is concerned with the impact of alkali metal-doping on the electronic structure of semiconducting organic thin films. The organic molecular systems which have been studied are the polycyclic aromatic hydrocarbons picene, pentacene, and coronene. Motivated by reports about exceptional behavior like superconductivity and electronic correlations of their alkali metal-doped compounds, high quality films fabricated from the above named molecules have been studied. The electronic structure of the pristine materials and their doped compounds has been investigated using photoelectron spectroscopy. Core level and valence band studies of undoped films yield excellent photoemission spectra agreeing with or even outperforming previously reported data from the literature. Alkali metal-doping manifests itself in a uniform manner in the electronic structure for all probed samples: Opposed to reports from the literature about metallicity and even superconductivity in alkali metal-doped picene, pentacene, and coronene, all films exhibit insulating nature with an energy gap of the order of one electron-volt. Remarkably, this is independent of the doping concentration and the type of dopant, i.e., potassium, cesium, or sodium. Based on the interplay between narrow bandwidths in organic semiconductors and sufficiently high on-molecule Coulomb repulsion, the non-metallicity is attributed to the strong influence of electronic correlations leading to the formation of a Mott insulator. In the case of picene, this is consolidated by calculations using a combination of density functional theory and dynamical mean-field theory. Beyond the extensive considerations regarding electronic correlations, further intriguing aspects have been observed. The deposition of thin picene films leads to the formation of a non-equilibrium situation between substrate and film surface. Here, the establishment of a homogeneous chemical potential is hampered due to the only weak van der Waals-interactions between the molecular layers in the films. Consequently, spectral weight is measurable above the reference chemical potential in photoemission. Furthermore, it has been found that the acceptance of additional electrons in pentacene is limited. While picene and coronene are able to host up to three extra electrons, in pentacene the limit is already reached for one electron. Finally, further extrinsic effects, coming along with alkali metal-doping, have been scrutinized. The oxidation of potassium atoms induced by the reaction with molecular oxygen in the residual gas of the ultra-high vacuum system turned out to significantly influence the electronic structure of alkali metal-doped picene and coronene. Moreover, also the applied X-ray and UV irradiation caused a certain impact on the photoemission spectra. Surprisingly, both effects did not play a role in the studies of potassium-doped pentacene.},
  subject      = {Organischer Halbleiter},
  language  = {en}
}
@phdthesis{Pohl2013,
  author    = {Pohl, Christoph},
  title     = {Silicon Based MBE of Manganese-Silicide and Silicon-Suboxide},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-83757},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2013},
  abstract  = {The present thesis deals with the fabrication, optimization of growth process and characterization of silicon based materials with molecular beam epitaxy. Two material systems are investigated in the course of this work: silicon/silicon suboxide multilayer structures and mono manganese silicide thin films. Mono manganese silicide (MnSi) is grown on Si(111) substrates with an hydrogen passivated surface, that is prepared by wet chemical processes. The growth start is performed by deposition of an amorphous Mn wetting layer that is subsequently annealed to form a MnSi seed layer on which the MnSi molecular beam epitaxy (MBE) is achieved. An amorphous or a crystalline Si cap layer is deposited onto the MnSi film to finalize the growth process and protect the sample from oxidation. With Raman spectroscopy it is shown that the crystalline cap layer is in fact single crystalline silicon. Results of x-ray diffraction and Raman spectroscopy confirm the growth of mono manganese silicide in contrast to other existing manganese silicide phases. In addition, in-plane and out-of-plane residual strain, and twinning of the MnSi thin film is detected with x-ray diffraction of symmetric and asymmetric reflections. Orientation between the Si substrate and the MnSi film is determined with the parallel lattice planes MnSi(210) and Si(511). Transport measurements show a T^2 dependence of the resistivity below 30K and metallic behavior above, a magneto resistance of 0.9\% and an unusual memory like effect of the resistance for an in-plane magnetic field sweep measurement. Silicon/Silicon suboxide (SiOx) multilayer structures are grown on Si(100) by interrupting the Si growth and oxidizing the surface with molecular oxygen. During oxidation the RHEED pattern changes from the Si(2x1) reconstruction to an amorphous pattern. When silicon growth is resumed a spotty RHEED pattern emerges, indicating a rough, three dimensional surface. The rough surface can be smoothed out with Si growth at substrate temperatures between 600°C and 700°C. Measurements with transmission electron microscopy show that a silicon suboxide layer of about 1nm embedded in single crystalline silicon is formed with the procedure. Multilayer structures are achieved by repeating the oxidation procedure when the Si spacer layer has a smooth and flat surface. The oxygen content of the suboxide layers can be varied between 7.6\% and 26.8\%, as determined with secondary ion mass spectrometry and custom-built simulations models for the x-ray diffraction. Structural stability of the multilayer structures is investigated by x-ray diffraction before and after rapid thermal annealing. For temperatures up to 1000°C the multilayer structures show no modification of the SiOx layer in x-ray diffraction.},
  subject      = {Molekularstrahlepitaxie},
  language  = {en}
}