@phdthesis{Muehlbauer2015,
  author    = {M{\"u}hlbauer, Mathias Josef},
  title     = {Nanolithography on Mercury Telluride},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-137152},
  school      = {Universit{\"a}t W{\"u}rzburg},
  year      = {2015},
  abstract  = {Topological insulators belong to a new quantum state of matter that is currently one of the most recognized research fields in condensed matter physics. Strained bulk HgTe and HgTe/HgCdTe quantum well structures are currently one of few topological insulator material systems suitable to be studied in transport experiments. In addition HgTe quantum wells provide excellent requirements for the conduction of spintronic experiments. A fundamental requirement for most experiments, however, is to reliably pattern these heterostructures into advanced nano-devices. Nano-lithography on this material system proves to be challenging because of inherent temperature limitations, its high reactivity with various metals and due to its properties as a topological insulator. The current work gives an insight into why many established semiconductor lithography processes cannot be easily transferred to HgTe while providing alternative solutions. The presented developments include novel ohmic contacts, the prevention of metal sidewalls and redeposition fences in combination with low temperature (80 °C) lithography and an adapted hardmask lithography process utilizing a sacrificial layer. In addition we demonstrate high resolution low energy (2.5 kV) electron beam lithography and present an alternative airbridge gating technique. The feasibility of nano-structures on HgTe quantum wells is exemplarily verified in two separate transport experiments. We are first to realize physically etched quantum point contacts in HgTe/HgCdTe high mobility 2DEGs and to prove their controllability via external top-gate electrodes. So far quantum point contacts have not been reported in TI materials. However, these constrictions are part of many proposals to probe the nature of the helical quantum spin Hall edge channels and are suggested as injector and detector devices for spin polarized currents. To confirm their functionality we performed four-terminal measurements of the point contact conductance as a function of external gate voltage. Our measurements clearly exhibit quantized conductance steps in 2e2/h, which is a fundamental characteristic of quantum point contacts. Furthermore we conducted measurements on the formation and control of collimated electron beams, a key feature to realize an all electrical spin-optic device. In a second study several of the newly developed lithography techniques were implemented to produce arrays of nano-wires on inverted and non-inverted HgTe quantum well samples. These devices were used in order to probe and compare the weak antilocalization (WAL) in these structures as a function of magnetic field and temperature. Our measurements reveal that the WAL is almost an order of magnitude larger in inverted samples. This observation is attributed to the Dirac-like dispersion of the energy bands in HgTe quantum wells. The described lithography has already been successfully implemented and adapted in several published studies. All processes have been optimized to guarantee a minimum effect on the heterostructure's properties and the sample surface, which is especially important for probing the topological surface states of strained HgTe bulk layers. Our developments therefore serve as a base for continuous progress to further establish HgTe as a topological insulator and give access to new experiments.},
  subject      = {Topologischer Isolator},
  language  = {en}
}