@article{WuBeckerWaagetal.1993,
  author    = {Wu, Y. S. and Becker, Charles R. and Waag, A. and Schmiedl, R. and Einfeldt, S. and Landwehr, G.},
  title     = {Oxygen on the (100) CdTe surface},
  url       = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-37869},
  year      = {1993},
  abstract  = {We have investigated oxygen on CdTe substrates by means of x-ray photoelectron spectroscopy (XPS) and reflection high-energy electron diffraction (RHEED). A Te oxide layer that was at least 15 A thick was found on the surface of as-delivered CdTe substrates that were mechanically polished. This oxide is not easily evaporated at temperatures lower than 350°C. Furthermore, heating in air, which further oxidizes the CdTe layer, should be avoided. Etching with HCI acid (15\% HCl) for at least 20 s and then rinsing with de-ionized water reduces the Te oxide layer on the surface down to 4\% of a monoatomic layer. However, according to XPS measurements of the 0 Is peak, 20\%-30\% of a monoatomic layer of oxygen remains on the surface, which can be eliminated by heating at temperatures ranging between 300 and 340 cC. The RHEED patterns for a molecular beam epitaxially (MBE)-grown CdTe film on a (lOO) CdTe substrate with approximately one monoatomic layer of oxidized Te on the surface lose the characteristics of the normal RHEED pattems for a MBE-grown CdTe film on an oxygen-free CdTe substrate.},
  language  = {en}
}