TY - JOUR A1 - Dittmann, Jonas A1 - Balles, Andreas A1 - Zabler, Simon T1 - Optimization based evaluation of grating interferometric phase stepping series and analysis of mechanical setup instabilities JF - Journal of Imaging N2 - The diffraction contrast modalities accessible by X-ray grating interferometers are not imaged directly but have to be inferred from sine-like signal variations occurring in a series of images acquired at varying relative positions of the interferometer’s gratings. The absolute spatial translations involved in the acquisition of these phase stepping series usually lie in the range of only a few hundred nanometers, wherefore positioning errors as small as 10 nm will already translate into signal uncertainties of 1–10% in the final images if not accounted for. Classically, the relative grating positions in the phase stepping series are considered input parameters to the analysis and are, for the Fast Fourier Transform that is typically employed, required to be equidistantly distributed over multiples of the gratings’ period. In the following, a fast converging optimization scheme is presented simultaneously determining the phase stepping curves’ parameters as well as the actually performed motions of the stepped grating, including also erroneous rotational motions which are commonly neglected. While the correction of solely the translational errors along the stepping direction is found to be sufficient with regard to the reduction of image artifacts, the possibility to also detect minute rotations about all axes proves to be a valuable tool for system calibration and monitoring. The simplicity of the provided algorithm, in particular when only considering translational errors, makes it well suitable as a standard evaluation procedure also for large image series. KW - X-ray imaging KW - Talbot–Lau interferometer KW - grating interferometer KW - phase contrast imaging KW - darkfield imaging KW - phase stepping KW - optimization Y1 - 2018 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:20-opus-197723 SN - 2313-433X VL - 4 IS - 6 ER - TY - JOUR A1 - Opolka, Alexander A1 - Müller, Dominik A1 - Fella, Christian A1 - Balles, Andreas A1 - Mohr, Jürgen A1 - Last, Arndt T1 - Multi-lens array full-field X-ray microscopy JF - Applied Sciences N2 - X-ray full-field microscopy at laboratory sources for photon energies above 10 keV suffers from either long exposure times or low resolution. The photon flux is mainly limited by the objectives used, having a limited numerical aperture NA. We show that this can be overcome by making use of the cone-beam illumination of laboratory sources by imaging the same field of view (FoV) several times under slightly different angles using an array of X-ray lenses. Using this technique, the exposure time can be reduced drastically without any loss in terms of resolution. A proof-of-principle is given using an existing laboratory metal-jet source at the 9.25 keV Ga K\(_α\)-line and compared to a ray-tracing simulation of the setup. KW - X-ray microscopy KW - full-field microscopy KW - compound refractive X-ray lenses KW - CRLs Y1 - 2021 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:20-opus-244974 SN - 2076-3417 VL - 11 IS - 16 ER - TY - JOUR A1 - Müller, Dominik A1 - Graetz, Jonas A1 - Balles, Andreas A1 - Stier, Simon A1 - Hanke, Randolf A1 - Fella, Christian T1 - Laboratory-Based Nano-Computed Tomography and Examples of Its Application in the Field of Materials Research JF - Crystals N2 - In a comprehensive study, we demonstrate the performance and typical application scenarios for laboratory-based nano-computed tomography in materials research on various samples. Specifically, we focus on a projection magnification system with a nano focus source. The imaging resolution is quantified with common 2D test structures and validated in 3D applications by means of the Fourier Shell Correlation. As representative application examples from nowadays material research, we show metallization processes in multilayer integrated circuits, aging in lithium battery electrodes, and volumetric of metallic sub-micrometer fillers of composites. Thus, the laboratory system provides the unique possibility to image non-destructively structures in the range of 170–190 nanometers, even for high-density materials. KW - nano CT KW - laboratory KW - X-ray KW - 3D reconstruction KW - instrumentation KW - integrated circuits KW - nondestructive testing KW - 3D X-ray microscopy Y1 - 2021 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:20-opus-241048 SN - 2073-4352 VL - 11 IS - 6 ER -