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N‐Heterocyclic Silylene Main Group Element Chemistry: Adduct Formation, Insertion into E−X Bonds and Cyclization of Organoazides

Zitieren Sie bitte immer diese URN: urn:nbn:de:bvb:20-opus-224507
  • Investigations concerning the reactivity of the N‐heterocyclic silylene Dipp\(_{2}\)NHSi (1, 1,3‐bis(2,6‐diisopropylphenyl)‐1,3‐diaza‐2‐silacyclopent‐4‐en‐2‐ylidene) towards selected alanes and boranes, elemental halides X\(_{2}\) (X=Br, I), selected halide containing substrates such as tin chlorides and halocarbons, as well as organoazides are presented. The NHSi adducts Dipp\(_{2}\)NHSi⋅AlI\(_{3}\) (2), Dipp\(_{2}\)NHSi⋅Al(C\(_{6}\)F\(_{5}\))\(_{3}\) (3), and Dipp\(_{2}\)NHSi⋅B(C\(_{6}\)F\(_{5}\))\(_{3}\) (4) were formed by the reaction ofInvestigations concerning the reactivity of the N‐heterocyclic silylene Dipp\(_{2}\)NHSi (1, 1,3‐bis(2,6‐diisopropylphenyl)‐1,3‐diaza‐2‐silacyclopent‐4‐en‐2‐ylidene) towards selected alanes and boranes, elemental halides X\(_{2}\) (X=Br, I), selected halide containing substrates such as tin chlorides and halocarbons, as well as organoazides are presented. The NHSi adducts Dipp\(_{2}\)NHSi⋅AlI\(_{3}\) (2), Dipp\(_{2}\)NHSi⋅Al(C\(_{6}\)F\(_{5}\))\(_{3}\) (3), and Dipp\(_{2}\)NHSi⋅B(C\(_{6}\)F\(_{5}\))\(_{3}\) (4) were formed by the reaction of Dipp\(_{2}\)NHSi with the corresponding Lewis acids AlI\(_{3}\), Al(C\(_{6}\)F\(_{6}\))\(_{3}\) and B(C\(_{6}\)F\(_{5}\))\(_{3}\). Adducts 3 and 4 were tested with respect to their ability to activate small organic molecules, but no frustrated Lewis pair reactivity was observed. Reactions of Dipp\(_{2}\)NHSi with Br\(_{2}\), I\(_{2}\), Ph\(_{2}\)SnCl\(_{2}\) and Me\(_{3}\)SnCl led to formation of Dipp\(_{2}\)NHSiBr\(_{2}\) (5), Dipp\(_{2}\)NHSiI\(_{2}\) (6), Dipp\(_{2}\)NHSiCl\(_{2}\) (7) and {(Me\(_{3}\)Sn)N(Dipp)CH}\(_{2}\) (8), respectively. The reaction with the halocarbons methyl iodide, benzyl chloride, and benzyl bromide afforded the insertion products Dipp\(_{2}\)NHSi(I)(CH\(_{3}\)) (9), Dipp\(_{2}\)NHSi(Cl)(CH\(_{2}\)Ph) (10) and Dipp\(_{2}\)NHSi(Br)(CH\(_{2}\)Ph) (11). Reaction of Dipp\(_{2}\)NHSi with the organoazides Ad‐N\(_{3}\) (Ad=adamantyl) and TMS‐N\(_{3}\) (TMS=trimethylsilyl) led to the formation of 1‐Dipp\(_{2}\)NHSi‐2,5‐bis(adamantyl)‐tetrazoline (12) and bis(trimethylsilyl)amido azido silane (13), respectively. For 2,6‐(diphenyl)phenyl‐N\(_{3}\) C−H activation occurs and a cyclosilamine 14 was isolated.zeige mehrzeige weniger

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Metadaten
Autor(en): Mirjam J. Krahfuss, Udo Radius
URN:urn:nbn:de:bvb:20-opus-224507
Dokumentart:Artikel / Aufsatz in einer Zeitschrift
Institute der Universität:Fakultät für Chemie und Pharmazie / Institut für Anorganische Chemie
Sprache der Veröffentlichung:Englisch
Titel des übergeordneten Werkes / der Zeitschrift (Englisch):European Journal of Inorganic Chemistry
Erscheinungsjahr:2021
Band / Jahrgang:2021
Heft / Ausgabe:6
Erste Seite:548
Letzte Seite:561
Originalveröffentlichung / Quelle:European Journal of Inorganic Chemistry 2021, 6, 548-561. DOI: 10.1002/ejic.202000942
DOI:https://doi.org/10.1002/ejic.202000942
Allgemeine fachliche Zuordnung (DDC-Klassifikation):5 Naturwissenschaften und Mathematik / 54 Chemie / 546 Anorganische Chemie
Freie Schlagwort(e):E−X bond activation; Organoazides; Silylenes; acid/base adducts; arbenes
Datum der Freischaltung:17.11.2021
Lizenz (Deutsch):License LogoCC BY: Creative-Commons-Lizenz: Namensnennung 4.0 International