@phdthesis{Kessel2016, author = {Kessel, Maximilian}, title = {HgTe shells on CdTe nanowires: A low-dimensional topological insulator from crystal growth to quantum transport}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-149069}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2016}, abstract = {A novel growth method has been developed, allowing for the growth of strained HgTe shells on CdTe nanowires (NWs). The growth of CdTe-HgTe core-shell NWs required high attention in controlling basic parameters like substrate temperature and the intensity of supplied material fluxes. The difficulties in finding optimized growth conditions have been successfully overcome in this work. We found the lateral redistribution of liquid growth seeds with a ZnTe growth start to be crucial to trigger vertical CdTe NW growth. Single crystalline zinc blende CdTe NWs grew, oriented along [111]B. The substrate temperature was the most critical parameter to achieve straight and long wires. In order to adjust it, the growth was monitored by reflection high-energy electron diffraction, which was used for fine tuning of the temperature over time in each growth run individually. For optimized growth conditions, a periodic diffraction pattern allowed for the detailed analysis of atomic arrangement on the surfaces and in the bulk. The ability to do so reflected the high crystal quality and ensemble uniformity of our CdTe NWs. The NW sides were formed by twelve stable, low-index crystalline facets. We observed two types stepped and polar sides, separated by in total six flat and non-polar facets. The high crystalline quality of the cores allowed to grow epitaxial HgTe shells around. We reported on two different heterostructure geometries. In the first one, the CdTe NWs exhibit a closed HgTe shell, while for the second one, the CdTe NWs are overgrown mainly on one side. Scanning electron microscopy and scanning transmission electron microscopy confirmed, that many of the core-shell NWs are single crystalline zinc blende and have a high uniformity. The symmetry of the zinc blende unit cell was reduced by residual lattice strain. We used high-resolution X-ray diffraction to reveal the strain level caused by the small lattice mismatch in the heterostructures. Shear strain has been induced by the stepped hetero-interface, thereby stretching the lattice of the HgTe shell by 0.06 \% along a direction oriented with an angle of 35 ° to the interface. The different heterostructures obtained, were the base for further investigation of quasi-one-dimensional crystallites of HgTe. We therefore developed methods to reliably manipulate, align, localize and contact individual NWs, in order to characterize the charge transport in our samples. Bare CdTe cores were insulating, while the HgTe shells were conducting. At low temperature we found the mean free path of charge carriers to be smaller, but the phase coherence length to be larger than the sample size of several hundred nanometers. We observed universal conductance fluctuations and therefore drew the conclusion, that the trajectories of charge carriers are defined by elastic backscattering at randomly distributed scattering sites. When contacted with superconducting leads, we saw induced superconductivity, multiple Andreev reflections and the associated excess current. Thus, we achieved HgTe/superconductor interfaces with high interfacial transparency. In addition, we reported on the appearance of peaks in differential resistance at Delta/e for HgTe-NW/superconductor and 2*Delta/e for superconductor/HgTe-NW/superconductor junctions, which is possibly related to unconventional pairing at the HgTe/superconductor interface. We noticed that the great advantage of our self-organized growth is the possibility to employ the metallic droplet, formerly seeding the NW growth, as a superconducting contact. The insulating wire cores with a metallic droplet at the tip have been overgrown with HgTe in a fully in-situ process. A very high interface quality was achieved in this case.}, subject = {Quecksilbertellurid}, language = {en} } @phdthesis{Trabel2019, author = {Trabel, Mirko}, title = {Growth and Characterization of Epitaxial Manganese Silicide Thin Films}, doi = {10.25972/OPUS-18472}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-184720}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2019}, abstract = {This thesis describes the growth and characterization of epitaxial MnSi thin films on Si substrates. The interest in this material system stems from the rich magnetic phase diagram resulting from the noncentrosymmetric B20 crystal structure. Here neighboring spins prefer a tilted relative arrangement in contrast to ferro- and antiferromagnets, which leads to a helical ground state where crystal and spin helix chirality are linked [IEM+85]. This link makes the characterization and control of the crystal chirality the main goal of this thesis. After a brief description of the material properties and applied methods, the thesis itself is divided into four main parts. In the first part the advancement of the MBE growth process of MnSi on Si\((111)\) substrate as well as the fundamental structural characterization are described. Here the improvement of the substrate interface by an adjusted substrate preparation process is demonstrated, which is the basis for well ordered flat MnSi layers. On this foundation the influence of Mn/Si flux ratio and substrate temperature on the MnSi layer growth is investigated via XRD and clear boundaries to identify the optimal growth conditions are determined. The nonstoichiometric phases outside of this optimal growth window are identified as HMS and Mn\(_5\)Si\(_3\). Additionally, a regime at high substrate temperatures and low Mn flux is discovered, where MnSi islands are growing incorporated in a Si layer, which could be interesting for further investigations as a size confinement can change the magnetic phase diagram [DBS+18]. XRD measurements demonstrate the homogeneity of the grown MnSi layers over most of the 3 inch wafer diameter and a small \(\omega\)-FWHM of about 0.02° demonstrates the high quality of the layers. XRD and TEM measurements also show that relaxation of the layers happens via misfit dislocations at the interface to the substrate. The second part of the thesis is concerned with the crystal chirality. Here azimuthal \(\phi\)-scans of asymmetric XRD reflections reveal twin domains with a \(\pm\)30° rotation to the substrate. These twin domains seem to consist of left and right-handed MnSi, which are connected by a mirror operation at the \((\bar{1}10)\) plane. For some of the asymmetric XRD reflections this results in different intensities for the different twin domains, which reveals that one of the domains is rotated +30° and the other is rotated -30°. From XRD and TEM measurements an equal volume fraction of both domains is deduced. Different mechanisms to suppress these twin domains are investigated and successfully achieved with the growth on chiral Si surfaces, namely Si\((321)\) and Si\((531)\). Azimuthal \(\phi\)-scans of asymmetric XRD reflections demonstrate a suppression of up to 92\%. The successful twin suppression is an important step in the use of MnSi for the proposed spintronics applications with skyrmions as information carriers, as discussed in the introduction. Because of this achievement, the third part of the thesis on the magnetic properties of the MnSi thin films is not only concerned with the principal behavior, but also with the difference between twinned and twin suppressed layers. Magnetometry measurements are used to demonstrate, that the MnSi layers behave principally as expected from the literature. The analysis of saturation and residual magnetization hints to the twin suppression on Si\((321)\) and Si\((531)\) substrates and further investigations with more samples can complete this picture. For comparable layers on Si\((111)\), Si\((321)\) and Si\((531)\) the Curie-Weiss temperature is identical within 1 K and the critical field within 0.1 T. Temperature dependent magnetoresistivity measurements also demonstrate the expected \(T^2\) behavior not only on Si\((111)\) but also on Si\((321)\) substrates. This demonstrates the successful growth of MnSi on Si\((321)\) and Si\((531)\) substrates. The latter measurements also reveal a residual resistivity of less then half for MnSi on Si\((321)\) in comparison to Si\((111)\). This can be explained with the reduced number of domain boundaries demonstrating the successful suppression of one of the twin domains. The homogeneity of the residual resistivity as well as the charge carrier density over a wide area of the Si\((111)\) wafer is also demonstrated with these measurements as well as Hall effect measurements. The fourth part shows the AMR and PHE of MnSi depending on the angle between in plane current and magnetic field direction with respect to the crystal direction. This was proposed as a tool to identify skyrmions [YKT+15]. The influence of the higher C\(_{3\mathrm{v}}\) symmetry of the twinned system instead of the C\(_3\) symmetry of a B20 single crystal is demonstrated. The difference could serve as a useful additional tool to prove the twin suppression on the chiral substrates. But this is only possible for rotations with specific symmetry surfaces and not for the studied unsymmetrical Si\((321)\) surface. Measurements for MnSi layers on Si\((111)\) above the critical magnetic field demonstrate the attenuation of AMR and PHE parameters for increasing resistivity, as expected from literature [WC67]. Even if a direct comparison to the parameters on Si\((321)\) is not possible, the higher values of the parameters on Si\((321)\) can be explained considering the reduced charge carrier scattering from domain boundaries. Below the critical magnetic field, which would be the region where a skyrmion lattice could be expected, magnetic hysteresis complicates the analysis. Only one phase transition at the critical magnetic field can be clearly observed, which leaves the existence of a skyrmion lattice in thin epitaxial MnSi layers open. The best method to solve this question seems to be a more direct approach in the form of Lorentz-TEM, which was also successfully used to visualize the skyrmion lattice for thin plates of bulk MnSi [TYY+12]. For the detection of in plane skyrmions, lamellas would have to be prepared for a side view, which seems in principle possible. The demonstrated successful twin suppression for MnSi on Si\((321)\) and Si\((531)\) substrates may also be applied to other material systems. Suppressing the twinning in FeGe on Si\((111)\) would lead to a single chirality skyrmion lattice near room temperature [HC12]. This could bring the application of skyrmions as information carriers in spintronics within reach. Glossary: MBE Molecular Beam Epitaxy XRD X-Ray Diffraction HMS Higher Manganese Silicide FWHM Full Width Half Maximum TEM Tunneling Electron Microscopy AMR Anisotropic MagnetoResistance PHE Planar Hall Effect Bibliography: [IEM+85] M. Ishida, Y. Endoh, S. Mitsuda, Y. Ishikawa, and M. Tanaka. Crystal Chirality and Helicity of the Helical Spin Density Wave in MnSi. II. Polarized Neutron Diffraction. Journal of the Physical Society of Japan, 54(8):2975, 1985. [DBS+18] B. Das, B. Balasubramanian, R. Skomski, P. Mukherjee, S. R. Valloppilly, G. C. Hadjipanayis, and D. J. Sellmyer. Effect of size confinement on skyrmionic properties of MnSi nanomagnets. Nanoscale, 10(20):9504, 2018. [YKT+15] T. Yokouchi, N. Kanazawa, A. Tsukazaki, Y. Kozuka, A. Kikkawa, Y. Taguchi, M. Kawasaki, M. Ichikawa, F. Kagawa, and Y. Tokura. Formation of In-plane Skyrmions in Epitaxial MnSi Thin Films as Revealed by Planar Hall Effect. Journal of the Physical Society of Japan, 84(10):104708, 2015. [WC67] R. H. Walden and R. F. Cotellessa. Magnetoresistance of Nickel-Copper Single-Crystal Thin Films. Journal of Applied Physics, 38(3):1335, 1967. [TYY+12] A. Tonomura, X. Yu, K. Yanagisawa, T. Matsuda, Y. Onose, N. Kanazawa, H. S. Park, and Y. Tokura. Real-Space Observation of Skyrmion Lattice in Helimagnet MnSi Thin Samples. Nano Letters, 12(3):1673, 2012. [HC12] S. X. Huang and C. L. Chien. Extended Skyrmion Phase in Epitaxial FeGe(111) Thin Films. Physical Review Letters, 108(26):267201, 2012.}, subject = {Molekularstrahlepitaxie}, language = {en} } @phdthesis{Scheffler2023, author = {Scheffler, Lukas}, title = {Molecular beam epitaxy of the half-Heusler antiferromagnet CuMnSb}, doi = {10.25972/OPUS-32283}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:20-opus-322839}, school = {Universit{\"a}t W{\"u}rzburg}, year = {2023}, abstract = {This work presents a newly developed method for the epitaxial growth of the half-Heusler antiferromagnet CuMnSb. All necessary process steps, from buffer growth to the deposition of a protective layer, are presented in detail. Using structural, electrical, and magnetic characterization, the material parameters of the epitaxial CuMnSb layers are investigated. The successful growth of CuMnSb by molecular beam epitaxy is demonstrated on InAs (001), GaSb (001), and InP (001) substrates. While CuMnSb can be grown pseudomorphically on InAs and GaSb, the significant lattice mismatch for growth on InP leads to relaxation already at low film thicknesses. Due to the lower conductivity of GaSb compared to InAs, GaSb substrates are particularly suitable for the fabrication of CuMnSb layers for lateral electrical transport experiments. However, by growing a high-resistive ZnTe interlayer below the CuMnSb layer, lateral transport experiments on CuMnSb layers grown on InAs can also be realized. Protective layers of Ru and Al2O3 have proven to be suitable for protecting the CuMnSb layers from the environment. Structural characterization by high resolution X-ray diffraction (full width at half maximum of 7.7 ′′ of the rocking curve) and atomic force microscopy (root mean square surface roughness of 0.14 nm) reveals an outstanding crystal quality of the epitaxial CuMnSb layers. The half-Heusler crystal structure is confirmed by scanning transmission electron microscopy and the stoichiometric material composition by Rutherford backscattering spectrometry. In line with the high crystal quality, a new minimum value of the residual resistance of CuMnSb (𝜌0 = 35 μΩ ⋅ cm) could be measured utilizing basic electrical transport experiments. An elaborate study of epitaxial CuMnSb grown on GaSb reveals a dependence of the vertical lattice parameter on the Mn/Sb flux ratio. This characteristic enables the growth of tensile, unstrained, and compressive strained CuMnSb layers on a single substrate material. Additionally, it is shown that the N{\´e}el temperature has a maximum of 62 K at stoichiometric material composition and thus can be utilized as a selection tool for stoichiometric CuMnSb samples. Mn-related defects are believed to be the driving force for these observations. The magnetic characterization of the epitaxial CuMnSb films is performed by superconducting quantum interference device magnetometry. Magnetic behavior comparable to the bulk material is found, however, an additional complex magnetic phase appears in thin CuMnSb films and/or at low magnetic fields, which has not been previously reported for CuMnSb. This magnetic phase is believed to be localized at the CuMnSb surface and exhibits both superparamagnetic and spin-glass-like behavior. The exchange bias effect of CuMnSb is investigated in combination with different in- and out-of-plane ferromagnets. It is shown that the exchange bias effect can only be observed in combination with in-plane ferromagnets. Finally, the first attempts at the growth of fully epitaxial CuMnSb/NiMnSb heterostructures are presented. Both magnetic and structural studies by secondary-ion mass spectrometry indicate the interdiffusion of Cu and Ni atoms between the two half-Heusler layers, however, an exchange bias effect can be observed for the CuMnSb/NiMnSb heterostructures. Whether this exchange bias effect originates from exchange interaction between the CuMnSb and NiMnSb layers, or from ferromagnetic inclusions in the antiferromagnetic layer can not be conclusively identified.}, subject = {Molekularstrahlepitaxie}, language = {en} }