• Deutsch
  • Home
  • Search
  • Browse
  • Publish
  • Help
Schließen

Refine

Has Fulltext

  • yes (3)

Is part of the Bibliography

  • yes (3)

Year of publication

  • 1994 (3)

Document Type

  • Journal article (2)
  • Conference Proceeding (1)

Language

  • English (3)

Keywords

  • 1994> (1)
  • Kongreß (1)
  • Millimeterwelle (1)
  • San Diego <Calif. (1)

Author

  • Becker, Charles R. (3)
  • Hommel, D. (3)
  • Einfeldt, S. (2)
  • Landwehr, G. (2)
  • Bacher, G. (1)
  • Behringer, M. (1)
  • Boege, P. (1)
  • Forchel, Alfred (1)
  • Geick, R. (1)
  • Heinke, H. (1)
+ more

Institute

  • Physikalisches Institut (3)

3 search hits

  • 1 to 3
  • BibTeX
  • CSV
  • RIS
  • XML
  • 10
  • 20
  • 50
  • 100

Sort by

  • Year
  • Year
  • Title
  • Title
  • Author
  • Author
Optical study of interdiffusion in CdTe and ZnSe based quantum wells (1994)
Tönnies, D. ; Bacher, G. ; Forchel, Alfred ; Waag, A. ; Litz, Th. ; Hommel, D. ; Becker, Charles R. ; Landwehr, G. ; Heuken, M. ; Scholl, M.
No abstract available
The growth of HgSe by molecular beam epitaxy for ohmic contacts to p-ZnSe (1994)
Einfeldt, S. ; Heinke, H. ; Behringer, M. ; Becker, Charles R. ; Kurtz, E. ; Hommel, D. ; Landwehr, G.
The structural properties of HgSe grown by molecular beam epitaxy (MBE) are investigated for different lattice mismatches to the substrate and various growth conditions. The growth rate is shown to depend strongly on the growth temperature above lOO°C as well as on the Hg/Se flux ratio. It has been found that the crystalline perfection and the electrical properties are mainly determined by the layer thickness, especially for the growth on highly lattice mismatched substrates. Changes in the surface morphology are related to growth parameters. Differences between the electrical behavior of MBE-grown and bulk HgSe are discussed. The electrical properties of HgSe contacts on p-ZnSe are investigated as a function of different annealing procedures.
Improved conductivity-measurement of semiconductor epitaxial layers by means of the contactless microwave method (1994)
Boege, P. ; Schäfer, H. ; Shanjia, Xu ; Xinzhang, Wu ; Einfeldt, S. ; Becker, Charles R. ; Hommel, D. ; Geick, R.
Measurements and calculations of the scattering-characteristics of stratified lossy dielectric blocks completely filling a waveguide cross section are presented. The method is used for contactless conductivity measurements of MBE-grown II-VI semiconductor layers.
  • 1 to 3

DINI-Zertifikat     OPUS4 Logo

  • Contact
  • |
  • Imprint
  • |
  • Sitemap