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Preservation of pristine Bi\(_2\)Te\(_3\) thin film topological insulator surface after ex situ mechanical removal of Te capping layer
Please always quote using this URN: urn:nbn:de:bvb:20-opus-164468
- Ex situ analyses on topological insulator films require protection against surface contamination during air exposure. This work reports on a technique that combines deposition of protective capping just after epitaxial growth and its mechanical removal inside ultra-high vacuum systems. This method was applied to Bi2Te3 films with thickness varying from 8 to 170 nm. Contrarily to other methods, this technique does not require any sputtering or thermal annealing setups installed inside the analyzing system and preserves both film thickness andEx situ analyses on topological insulator films require protection against surface contamination during air exposure. This work reports on a technique that combines deposition of protective capping just after epitaxial growth and its mechanical removal inside ultra-high vacuum systems. This method was applied to Bi2Te3 films with thickness varying from 8 to 170 nm. Contrarily to other methods, this technique does not require any sputtering or thermal annealing setups installed inside the analyzing system and preserves both film thickness and surface characteristics. These results suggest that the technique presented here can be expanded to other topological insulator materials.…
Author: | C. I. Fornari, P. H. O. Rappl, S. L. Morelhao, T. R. F. Peixoto, H. Bentmann, F. Reinert, E. Abramof |
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URN: | urn:nbn:de:bvb:20-opus-164468 |
Document Type: | Journal article |
Faculties: | Fakultät für Physik und Astronomie / Physikalisches Institut |
Language: | English |
Parent Title (English): | APL Materials |
Year of Completion: | 2016 |
Volume: | 4 |
Pagenumber: | 106107 |
Source: | APL Materials 4, 106107 (2016) |
DOI: | https://doi.org/10.1063/1.4964610 |
Dewey Decimal Classification: | 6 Technik, Medizin, angewandte Wissenschaften / 61 Medizin und Gesundheit / 610 Medizin und Gesundheit |
Tag: | Atomic force microscopy; Epitaxy; Insulating thin films; Insulator surfaces; Molecular beam epitaxy; Sputter deposition; Surface states; Thin film growth; Vacuum chambers |
Release Date: | 2019/12/18 |
Licence (German): | CC BY: Creative-Commons-Lizenz: Namensnennung 4.0 International |