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Institute
In this thesis, a model system of a magnetic topological heterostructure is studied, namely a heterosystem consisting of a single ferromagnetic septuple-layer (SL) of \(MnBi_2Te_4\) on the surface of the three-dimensional topological insulator \(Bi_2Te_3\).
Using MBE and developing a specialized experimental setup, the first part of this thesis deals with the growth of \(Bi_2Te_3\) and thin films of \(MnBi_2Te_4\) on \(BaF_2\)-substrates by the co-evaporation of its binary constituents. The structural analysis is conducted along several suitable probes such as X-ray diffraction (XRD, XRR), AFM and scanning tunnelling electron microscopy (STEM). It is furthermore found that the growth of a single septuple-layer of \(MnBi_2Te_4\) on the surface of \(Bi_2Te_3\) can be facilitated.
By using X-ray absorption and circular magnetic dichroism (XAS, XMCD), the magnetic properties of \(MnBi_2Te_4\) are explored down to the monolayer limit. The layered nature of the vdW crystal and a strong uniaxial magnetocrystalline anisotropy establish stable out-of plane magnetic order at the surface of \(MnBi_2Te_4\), which is stable even down to the 2D limit. Pushing the material system to there, i.e. a single SL \(MnBi_2Te_4\) further allows to study the phase transition of this 2D ferromagnet and extract its critical behaviour with \(T_c \, = \, 14.89~k\) and \(\beta \, = \, 0.484\).
Utilizing bulk crystals of the ferromagnetic \(Fe_3GeTe_2\) as substrate allows to influence, enhance and bias the magnetism in the single SL of \(MnBi_2Te_4\). By growing heterostructures of the type \(MnBi_2Te_4\) -- n layer \(Bi_2Te_3\) -- \(Fe_3GeTe_2\)for n between 0 and 2, it is shown, that a considerable magnetic coupling can be introduced between the \(MnBi_2Te_4\) top-layer and the substrate.
Finally the interplay between topology and magnetism in the ferromagnetic extension is studied directly by angle-resolved photoemission spectroscopy. The heterostructure is found to host a linearly dispersing TSS at the centre of the Brillouin zone. Using low temperature and high-resolution ARPES a large magnetic gap opening of \(\sim\) 35 meV is found at the Dirac point of the TSS. By following its temperature evolution, it is apparent that the scaling behaviour coincides with the magnetic order parameter of the modified surface.
This work presents a newly developed method for the epitaxial growth of the half-Heusler antiferromagnet CuMnSb. All necessary process steps, from buffer growth to the deposition of a protective layer, are presented in detail. Using structural, electrical, and magnetic characterization, the material parameters of the epitaxial CuMnSb layers are investigated.
The successful growth of CuMnSb by molecular beam epitaxy is demonstrated on InAs (001), GaSb (001), and InP (001) substrates. While CuMnSb can be grown pseudomorphically on InAs and GaSb, the significant lattice mismatch for growth on InP leads to relaxation already at low film thicknesses. Due to the lower conductivity of GaSb compared to InAs, GaSb substrates are particularly suitable for the fabrication of CuMnSb layers for lateral electrical transport experiments. However, by growing a high-resistive ZnTe interlayer below the CuMnSb layer, lateral transport experiments on CuMnSb layers grown on InAs can also be realized. Protective layers of Ru and Al2O3 have proven to be suitable for protecting the CuMnSb layers from the environment.
Structural characterization by high resolution X-ray diffraction (full width at half maximum of 7.7 ′′ of the rocking curve) and atomic force microscopy (root mean square surface roughness of 0.14 nm) reveals an outstanding crystal quality of the epitaxial CuMnSb layers. The half-Heusler crystal structure is confirmed by scanning transmission electron microscopy and the stoichiometric material composition by Rutherford backscattering spectrometry. In line with the high crystal quality, a new minimum value of the residual resistance of CuMnSb (𝜌0 = 35 μΩ ⋅ cm) could be measured utilizing basic electrical transport experiments.
An elaborate study of epitaxial CuMnSb grown on GaSb reveals a dependence of the vertical lattice parameter on the Mn/Sb flux ratio. This characteristic enables the growth of tensile, unstrained, and compressive strained CuMnSb layers on a single substrate material. Additionally, it is shown that the Néel temperature has a maximum of 62 K at stoichiometric material composition and thus can be utilized as a selection tool for stoichiometric CuMnSb samples. Mn-related defects are believed to be the driving force for these observations.
The magnetic characterization of the epitaxial CuMnSb films is performed by superconducting quantum interference device magnetometry. Magnetic behavior comparable to the bulk material is found, however, an additional complex magnetic phase appears in thin CuMnSb films and/or at low magnetic fields, which has not been previously reported for CuMnSb. This magnetic phase is believed to be localized at the CuMnSb surface and exhibits both superparamagnetic and spin-glass-like behavior. The exchange bias effect of CuMnSb is investigated in combination with different in- and out-of-plane ferromagnets. It is shown that the exchange bias effect can only be observed in combination with in-plane ferromagnets.
Finally, the first attempts at the growth of fully epitaxial CuMnSb/NiMnSb heterostructures are presented. Both magnetic and structural studies by secondary-ion mass spectrometry indicate the interdiffusion of Cu and Ni atoms between the two half-Heusler layers, however, an exchange bias effect can be observed for the CuMnSb/NiMnSb heterostructures. Whether this exchange bias effect originates from exchange interaction between the CuMnSb and NiMnSb layers, or from ferromagnetic inclusions in the antiferromagnetic layer can not be conclusively identified.
The subject of this thesis is the fabrication and characterization of magnetic topological
insulator layers of (V,Bi,Sb)\(_2\)Te\(_3\) exhibiting the quantum anomalous Hall
effect. A major task was the experimental realization of the quantum anomalous
Hall effect, which is only observed in layers with very specific structural,
electronic and magnetic properties. These properties and their influence on the
quantum anomalous Hall effect are analyzed in detail.
First, the optimal conditions for the growth of pure Bi\(_2\)Te\(_3\) and Sb\(_2\)Te\(_3\) crystal
layers and the resulting structural quality are studied. The crystalline quality of
Bi\(_2\)Te\(_3\) improves significantly at higher growth temperatures resulting in a small
mosaicity-tilt and reduced twinning defects. The optimal growth temperature is
determined as 260\(^{\circ}\)C, low enough to avoid desorption while maintaining a high
crystalline quality.
The crystalline quality of Sb\(_2\)Te\(_3\) is less dependent on the growth temperature.
Temperatures below 230\(^{\circ}\)C are necessary to avoid significant material desorption,
though. Especially for the nucleation on Si(111)-H, a low sticking coefficient is
observed preventing the coalescence of islands into a homogeneous layer.
The influence of the substrate type, miscut and annealing sequence on the growth
of Bi\(_2\)Te\(_3\) layers is investigated. The alignment of the layer changes depending on
the miscut angle and annealing sequence: Typically, layer planes align parallel to
the Si(111) planes. This can enhance the twin suppression due to transfer of the
stacking order from the substrate to the layer at step edges, but results in a step
bunched layer morphology. For specific substrate preparations, however, the layer
planes are observed to align parallel to the surface plane. This alignment avoids
displacement at the step edges, which would cause anti-phase domains. This results
in narrow Bragg peaks in XRD rocking curve scans due to long-range order in
the absence of anti-phase domains. Furthermore, the use of rough Fe:InP(111):B
substrates leads to a strong reduction of twinning defects and a significantly reduced
mosaicity-twist due to the smaller lattice mismatch.
Next, the magnetically doped mixed compound V\(_z\)(Bi\(_{1−x}\)Sb\(_x\))\(_{2−z}\)Te\(_3\) is studied in
order to realize the quantum anomalous Hall effect. The addition of V and Bi to
Sb\(_2\)Te\(_3\) leads to efficient nucleation on the Si(111)-H surface and a closed, homogeneous
layer. Magneto-transport measurements of layers reveal a finite anomalous
Hall resistivity significantly below the von Klitzing constant. The observation of
the quantum anomalous Hall effect requires the complete suppression of parasitic
bulklike conduction due to defect induced carriers. This can be achieved by optimizing
the thickness, composition and growth conditions of the layers.
The growth temperature is observed to strongly influence the structural quality.
Elevated temperatures result in bigger islands, improved crystallographic orientation
and reduced twinning. On the other hand, desorption of primarily Sb is
observed, affecting the thickness, composition and reproducibility of the layers.
At 190\(^{\circ}\)C, desorption is avoided enabling precise control of layer thickness and
composition of the quaternary compound while maintaining a high structural
quality.
It is especially important to optimize the Bi/Sb ratio in the (V,Bi,Sb)\(_2\)Te\(_3\) layers,
since by alloying n-type Bi\(_2\)Te\(_3\) and p-type Sb\(_2\)Te\(_3\) charge neutrality is achieved at
a specific mixing ratio. This is necessary to shift the Fermi level into the magnetic
exchange gap and fully suppress the bulk conduction. The Sb content x furthermore
influences the in-plane lattice constant a significantly. This is utilized to
accurately determine x even for thin films below 10 nm thickness required for the
quantum anomalous Hall effect. Furthermore, x strongly influences the surface
morphology: with increasing x the island size decreases and the RMS roughness
increases by up to a factor of 4 between x = 0 and x = 1.
A series of samples with x varied between 0.56-0.95 is grown, while carefully
maintaining a constant thickness of 9 nm and a doping concentration of 2 at.% V.
Magneto-transport measurements reveal the charge neutral point around x = 0.86
at 4.2 K. The maximum of the anomalous Hall resistivity of 0.44 h/e\(^2\) is observed
at x = 0.77 close to charge neutrality. Reducing the measurement temperature
to 50 mK significantly increases the anomalous Hall resistivity. Several samples
in a narrow range of x between 0.76-0.79 show the quantum anomalous Hall effect
with the Hall resistivity reaching the von Klitzing constant and a vanishing
longitudinal resistivity. Having realized the quantum anomalous Hall effect as the
first group in Europe, this breakthrough enabled us to study the electronic and
magnetic properties of the samples in close collaborations with other groups.
In collaboration with the Physikalisch-Technische Bundesanstalt high-precision
measurements were conducted with detailed error analysis yielding a relative de-
viation from the von Klitzing constant of (0.17 \(\pm\) 0.25) * 10\(^{−6}\). This is published
as the smallest, most precise value at that time, proving the high quality of the
provided samples. This result paves the way for the application of magnetic topological
insulators as zero-field resistance standards.
Non-local magneto-transport measurements were conducted at 15 mK in close
collaboration with the transport group in EP3. The results prove that transport
happens through chiral edge channels. The detailed analysis of small anomalies in
transport measurements reveals instabilities in the magnetic phase even at 15 mK.
Their time dependent nature indicates the presence of superparamagnetic contributions
in the nominally ferromagnetic phase.
Next, the influence of the capping layer and the substrate type on structural properties
and the impact on the quantum anomalous Hall effect is investigated. To
this end, a layer was grown on a semi-insulating Fe:InP(111)B substrate using the
previously optimized growth conditions. The crystalline quality is improved significantly
with the mosaicity twist reduced from 5.4\(^{\circ}\) to 1.0\(^{\circ}\). Furthermore, a layer
without protective capping layer was grown on Si and studied after providing sufficient
time for degradation. The uncapped layer on Si shows perfect quantization,
while the layer on InP deviates by about 5%. This may be caused by the higher
crystalline quality, but variations in e.g. Sb content cannot be ruled out as the
cause. Overall, the quantum anomalous Hall effect seems robust against changes
in substrate and capping layer with only little deviations.
Furthermore, the dependence of the quantum anomalous Hall effect on the thickness
of the layers is investigated. Between 5-8 nm thickness the material typically
transitions from a 2D topological insulator with hybridized top and bottom surface
states to a 3D topological insulator. A set of samples with 6 nm, 8 nm, and
9 nm thickness exhibits the quantum anomalous Hall effect, while 5 nm and 15 nm
thick layers show significant bulk contributions. The analysis of the longitudinal
and Hall conductivity during the reversal of magnetization reveals distinct differences
between different thicknesses. The 6 nm thick layer shows scaling consistent
with the integer quantum Hall effect, while the 9 nm thick layer shows scaling expected
for the topological surface states of a 3D topological insulator. The unique
scaling of the 9 nm thick layer is of particular interest as it may be a result of
axion electrodynamics in a 3D topological insulator.
Subsequently, the influence of V doping on the structural and magnetic properties
of the host material is studied systematically. Similarly to Bi alloying, increased
V doping seems to flatten the layer surface significantly. With increasing V content,
Te bonding partners are observed to increase simultaneously in a 2:3 ratio
as expected for V incorporation on group-V sites. The linear contraction of the
in-plane and out-of-plane lattice constants with increasing V doping is quantitatively
consistent with the incorporation of V\(^{3+}\) ions, possibly mixed with V\(^{4+}\)
ions, at the group-V sites. This is consistent with SQUID measurements showing
a magnetization of 1.3 \(\mu_B\) per V ion.
Finally, magnetically doped topological insulator heterostructures are fabricated
and studied in magneto-transport. Trilayer heterostructures with a non-magnetic
(Bi,Sb)\(_2\)Te\(_3\) layer sandwiched between two magnetically doped layers are predicted
to host the axion insulator state if the two magnetic layers are decoupled and in
antiparallel configuration. Magneto-transport measurements of such a trilayer heterostructure
with 7 nm undoped (Bi,Sb)\(_2\)Te\(_3\) between 2 nm thick layers doped with
1.5 at.% V exhibit a zero Hall plateau representing an insulating state. Similar results
in the literature were interpreted as axion insulator state, but in the absence
of a measurement showing the antiparallel magnetic orientation other explanations
for the insulating state cannot be ruled out.
Furthermore, heterostructures including a 2 nm thin, highly V doped layer region
show an anomalous Hall effect of opposite sign compared to previous samples. A
dependency on the thickness and position of the doped layer region is observed,
which indicates that scattering at the interfaces causes contributions to the anomalous
Hall effect of opposite sign compared to bulk scattering effects.
Many interesting phenomena in quantum anomalous Hall insulators as well as axion
insulators are still not unambiguously observed. This includes Majorana bound
states in quantum anomalous Hall insulator/superconductor hybrid systems and
the topological magneto-electric effect in axion insulators. The limited observation
temperature of the quantum anomalous Hall effect of below 1 K could be increased
in 3D topological insulator/magnetic insulator heterostructures which utilize the
magnetic proximity effect.
The main achievement of this thesis is the reproducible growth and characterization
of (V,Bi,Sb)2Te3 layers exhibiting the quantum anomalous Hall effect. The
detailed study of the structural requirements of the quantum anomalous Hall effect
and the observation of the unique axionic scaling behavior in 3D magnetic
topological insulator layers leads to a better understanding of the nature of this
new quantum state. The high-precision measurements of the quantum anomalous
Hall effect reporting the smallest deviation from the von Klitzing constant
are an important step towards the realization of a zero-field quantum resistance
standard.
The subject of this thesis is the growth of Hg\(_{1-x}\)Cd\(_2\)Te layers via molecular beam epitaxy (MBE).
This material system gives rise to a number of extraordinary physical phenomena related to its electronic band structure and therefore is of fundamental interest in research.
The main results can be divided into three main areas, the implementation of a temperature measurement system based on band edge thermometry (BET), improvements of CdTe virtual substrate growth and the investigation of Hg\(_{1-x}\)Cd\(_2\)Te for different compositions.
Im Rahmen dieser Arbeit wurden GaInP/GaAs/GaInNAs 3J-Mehrfachsolarzellen in einem MBE/MOVPE-Hybridprozess hergestellt und untersucht. Der verwendete Hybridprozess, bei dem nur die GaInNAs-Teilsolarzelle mittels MBE hergestellt wird, kombiniert diese beiden Technologien und setzt sie entsprechend ihrer jeweiligen Vorteile ein. Die gezeigten Ergebnisse bestätigen grundsätzlich die Machbarkeit des Hybridprozesses, denn eine Degradation des mittels MBE hergestellten GaInNAs-Materials durch die Atmosphäre im MOVPE-Reaktor konnte nicht festgestellt werden. Dieses Resultat wurde von im Hybridprozess hergestellten 3J-Mehrfachsolarzellen, die GaInNAs-Teilsolarzellen enthalten, bekräftigt. Die offene Klemmspannung einer gezeigten Solarzelle erreichte bereits 2,59 V (AM1.5d) bzw. 2,48 V (AM0) und liegt damit jeweils über einer als Referenz hergestellten 2J-Mehrfachsolarzelle ohne GaInNAs. Die mittlere interne Quanteneffizienz der enthaltenen GaInNAs-Teilsolarzelle liegt bei 79 %. Die Berechnungen auf Grundlage dieser Effizienz unter Beleuchtung mit AM1.5d und unter Beleuchtung mit AM0 zeigten, dass nicht die enthaltene GaInNAs-Teilsolarzelle Strom limitierend wirkt, sondern die mittels MOVPE gewachsene GaInP-Teilsolarzelle. Die experimentell bestimmte Kurzschlussstromdichte der hergestellten Mehrfachsolarzelle ist wegen dieser Limitierung etwas geringer als die der 2J-Referenzsolarzelle. Der MOVPE-Überwachsvorgang bietet zwar noch weiteres Verbesserungspotential, aber es ist naheliegend, dass der Anwachsvorgang auf dem MBE-Material soweit optimiert werden kann, dass die aufgewachsenen GaInP- und GaAs-Schichten frei von Degradation bleiben. Damit bietet der Hybridprozess perspektivisch das Potential günstigere Produktionskosten in der Epitaxie von Mehrfachsolarzellen mit verdünnten Nitriden zu erreichen als es ausschließlich mittels MBE möglich ist.
Im Vorfeld zur Herstellung der 3J-Mehrfachsolarzellen wurden umfassende Optimierungsarbeiten des MBE-Prozesses zur Herstellung der GaInNAs-Teilsolarzelle durchgeführt. So wurde insbesondere festgestellt, dass das As/III-Verhältnis während dem Wachstum einen entscheidenden Einfluss auf die elektrisch aktive Dotierung des GaInNAs-Materials besitzt. Die elektrisch aktive Dotierung wiederum beeinflusst sehr stark die Ausdehnung der Raumladungszone in den als p-i-n-Struktur hergestellten GaInNAs-Solarzellen und hat damit einen direkten Einfluss auf deren Stromerzeugung. In der Tendenz zeigte sich eine Zunahme der Stromerzeugung der GaInNAs-Teilsolarzellen bei einer gleichzeitigen Abnahme ihrer offenen Klemmspannung, sobald das As/III-Verhältnis während des Wachstums reduziert wurde. Durch eine sehr exakte Kalibration des As/III-Verhältnisses konnte ein bestmöglicher Kompromiss zwischen offener Klemmspannung und Stromerzeugung gefunden werden. Eine gezeigte GaInNAs-Einfachsolarzelle erreichte eine mittlere interne Quanteneffizienz von 88 % und eine offene Klemmspannung von 341 mV (AM1.5d) bzw. 351 mV (AM0). Berechnungen auf Grundlage der Quanteneffizienz ergaben, dass diese Solarzelle integriert in eine 3J-Mehrfachsolarzelle unter dem Beleuchtungsspektrum AM1.5g eine Stromdichte von 14,2 mA/cm^2 und unter AM0 von 17,6 mA/cm^2 erzeugen würde. Diese Stromdichten sind so hoch, dass diese GaInNAs-Solarzelle die Stromproduktion der GaInP- und GaAs-Teilsolarzellen in einer gängigen Mehrfachsolarzelle erreicht und keine Ladungsträgerverluste auftreten würden. Aufgrund ihrer höheren offenen Klemmspannung gegenüber einer Ge-Teilsolarzelle bietet diese GaInNAs-Teilsolarzelle das Potential die Effizienz der Mehrfachsolarzelle zu steigern. Messungen der Dotierkonzentration in der GaInNAs-Schicht dieser Solarzelle ergaben extrem geringe Werte im Bereich von 1x10^14 1/cm^3 bis 1x10^15 1/cm^3 (p-Leitung). In Ergänzung zu den Optimierungen des As/III-Verhältnisses konnte gezeigt werden, dass sich ein Übergang von p- zu n-Leitung im GaInNAs mit der Verringerung des As/III-Verhältnisses erzeugen lässt. Nahe des Übergangsbereiches wurden sehr geringe Dotierungen erreicht, die sich durch eine hohe Stromproduktion aufgrund der Ausbildung einer extrem breiten Verarmungszone gezeigt haben. Durch eine reduzierte offene Klemmspannung der bei relativ geringen As/III-Verhältnissen hergestellten Solarzellen mit n-leitendem GaInNAs konnte auf das Vorhandensein von elektrisch aktiven Defekten geschlossen werden. Generell konnten die gemessenen elektrisch aktiven Dotierkonzentrationen im Bereich von üblicherweise 10^16 1/cm^3 mit hoher Wahrscheinlichkeit auf elektrisch aktive Kristalldefekte im GaInNAs zurückgeführt werden. Eine Kontamination des Materials mit Kohlenstoffatomen in dieser Größenordnung wurde ausgeschlossen.
Topologische Isolatoren gehören zu einer Klasse von Materialien, an deren Realisation im Rahmen der zweiten quantenmechanischen Revolution gearbeitet wird. Einerseits sind zahlreiche Fragestellungen zu diesen Materialen und deren Nutzbarmachung noch nicht beantwortet, andererseits treiben vielversprechende Anwendungen im Feld der Quantencomputer und Spintronik die Lösung dieser Fragen voran. Topologische Rand- bzw. Oberflächenzustände wurden für unterschiedlichste Materialien und Strukturen theoretisch vorhergesagt, so auch für GaSb/InAs Doppelquantenfilme und Bi2Se3. Trotz intensiver Forschungsarbeiten und großer Fortschritte bedürfen viele Prozesse v. a. im Bereich der Probenherstellung und Verarbeitung noch der Optimierung. Die vorliegende Arbeit präsentiert Ergebnisse zur Molekularstahlepitaxie, zur Probenfertigung sowie zu elektro-optisch modulierter Transportuntersuchung von GaSb/InAs Doppelquantenfilmen und der epitaktischen Fertigung von Bi2Se3 Nanostrukturen.
Im ersten Teil dieser Arbeit werden die Parameter zur Molekularstrahlepitaxie sowie die Anpassung der Probenfertigung von GaSb/InAs Doppelquantenfilmen an material- und untersuchungsbedingte Notwendigkeiten beschrieben. Dieser verbesserte Prozess ermöglicht die Fertigung quantitativ vergleichbarer Probenserien. Anschließend werden Ergebnisse für Strukturen mit variabler InAs Schichtdicke unter elektrostatischer Kontrolle mit einem Frontgate präsentiert. Auch mit verbessertem Prozess zeigten sich Leckströme zum Substrat. Diese erschweren eine elektrostatische Kontrolle über Backgates. Die erstmals durch optische Anregung präsentierte Manipulation der Ladungsträgerart sowie des Phasenzustandes in GaSb/InAs Doppelquantenfilmen bietet eine Alternative zu problembehafteten elektrostatisch betriebenen Gates.
Im zweiten Teil wird die epitaktische Herstellung von Bi2Se3 Nanostrukturen gezeigt. Mit dem Ziel, Vorteile aus dem erhöhten Oberfläche-zu-Volumen Verhältnis zu ziehen, wurden im Rahmen dieser Arbeit erstmals Bi2Se3 Nanodrähte und -flocken mittels Molekularstrahlepitaxie für die Verwendung als topologischer Isolator hergestellt.
Ein Quantensprung – Kapitel 1 führt über die umgangssprachliche Wortbedeutung des Quantensprungs und des damit verbundenen Modells der Quantenmechanik in das Thema. Die Anwendung dieses Modells auf Quanten-Ensembles und dessen technische Realisation wird heute als erste Quantenmechanische Revolution bezeichnet und ist aus unserem Alltag nicht mehr wegzudenken. Im Rahmen der zweiten Quantenmechanischen Revolution soll nun die Anwendung auf einzelne Zustände realisiert und technisch nutzbar gemacht werden. Hierbei sind topologische Isolatoren ein vielversprechender Baustein. Es werden das Konzept des topologischen Isolators sowie die Eigenschaften der beiden in dieser Arbeit betrachteten Systeme beschrieben: GaSb/InAs Doppelquantenfilme und Bi2Se3 Nanostrukturen.
GaSb/InAs Doppelquantenfilme
Kapitel 2 beschreibt die notwendigen physikalischen und technischen Grundlagen. Ausgehend von der Entdeckung des Hall-Effekts 1879 werden die Quanten-Hall-Effekte eingeführt. Quanten-Spin-Hall-Isolatoren oder allgemeiner topologische Isolatoren sind Materialien mit einem isolierenden Inneren, weisen an der Oberfläche aber topologisch geschützte Zustände auf. Doppelquantenfilme aus GaSb/InAs, die in AlSb gebettet werden, weisen – abhängig vom Aufbau der Heterostruktur – eine typische invertierte Bandstruktur auf und sind ein vielversprechender Kandidat für die Nutzbarmachung der topologischen Isolatoren. GaSb, InAs und AlSb gehören zur 6,1 Ångström-Familie, welche für ihre opto-elektronischen Eigenschaften bekannt ist und häufig verwendet wird. Die Eigenschaften sowie die technologischen Grundlagen der epitaktischen Fertigung von Heterostrukturen aus den Materialien der 6,1 Ångström-Familie mittels Molekularstrahlepitaxie werden besprochen. Abschließend folgen die Charakterisierungs- und Messmethoden. Ein Überblick über die Literatur zu GaSb/InAs Doppelquantenfilmen in Bezug auf topologische Isolatoren rundet dieses Kapitel ab.
Zu Beginn dieser Arbeit stellten Kurzschlusskanäle eine Herausforderung für die Detektion der topologischen Randkanäle dar. Kapitel 3 behandelt Lösungsansätze hierfür und beschreibt die Verbesserung der Herstellung von GaSb/InAs Doppelquantenfilm-Strukturen mit Blick auf die zukünftige Realisation topologischer Randkanäle. In Abschnitt 3.1 werden numerische Simulationen präsentiert, die sich mit der Inversion der elektronischen Niveaus in Abhängigkeit der GaSb und InAs Schichtdicken dGaSb und dInAs beschäftigen. Ein geeigneter Schichtaufbau für Strukturen mit invertierter Bandordnung liegt im Parameterraum von 8 nm ≾ dInAs ≾ 12 nm und 8 nm ≾ dGaSb ≾ 10 nm. Abschnitt 3.2 beschreibt die epitaktische Herstellung von GaSb/InAs Doppelquantenfilmen mittels Molekularstrahlepitaxie. Die Fertigung eines GaSb Quasisubstrats auf ein GaAs Substrat wird präsentiert und anschließend der Wechsel auf native GaSb Substrate mit einer reduzierten Defektdichte sowie reproduzierbar hoher Probenqualität begründet. Ein Wechseln von binärem AlSb auf gitterangepasstes AlAsSb erlaubt die Verwendung dickerer Barrieren. Versuche, eine hinlängliche Isolation des Backgates durch das Einbringen einer dickeren unteren Barriere zu erreichen, werden in diesem Abschnitt diskutiert. In Abschnitt 3.3 wird die Optimierung der Probenprozessierung gezeigt. Die Kombination zweier angepasster Ätzprozesse – eines trockenchemischen und eines sukzessive folgenden nasschemischen Schrittes – liefert zusammen mit der Entfernung von Oberflächenoxiden reproduzierbar gute Ergebnisse. Ein materialselektiver Ätzprozess mit darauffolgender direkter Kontaktierung des InAs Quantenfilmes liefert gute Kontaktwiderstände, ohne Kurzschlusskanäle zu erzeugen. Abschnitt 3.4 gibt einen kompakten Überblick, über den im weiteren Verlauf der Arbeit verwendeten „best practice“ Prozess.
Mit diesem verbesserten Prozess wurden Proben mit variabler InAs Schichtdicke gefertigt und bei 4,2 K auf ihre Transporteigenschaften hin untersucht. Dies ist in Kapitel 4 präsentiert und diskutiert. Abschnitt 4.1 beschreibt die Serie aus drei Proben mit GaSb/InAs Doppelquantenfilm in AlSb Matrix mit einer variablen InAs Schichtdicke. Die InAs Schichtdicke wurde über numerische Simulationen so gewählt, dass je eine Probe im trivialen Regime, eine im invertierten Regime und eine am Übergang liegt. Gezeigt werden in Kapitel 4.2 Magnetotransportmessungen für konstante Frontgatespannungen sowie Messungen mit konstantem Magnetfeld gegen die Frontgatespannung. Die Messungen bestätigen eine Fertigung quantitativ vergleichbarer Proben, zeigen aber auch, dass keine der Proben im topologischen Regime liegt. Hierfür kommen mehrere Ursachen in Betracht: Eine Überschätzung der Hybridisierung durch die numerische Simulation, zu geringe InAs Schichtdicken in der Fertigung oder ein asymmetrisches Verschieben mit nur einem Gate (Kapitel 4.3). Zur Reduktion der Volumenleitfähigkeit wurden Al-haltigen Schichten am GaSb/InAs Übergang eingebracht. Die erwartete Widerstandssteigerung konnte in ersten Versuchen nicht gezeigt werde.
Die in Kapitel 5 gezeigte optische Manipulation des dominanten Ladungsträgertyps der InAs/GaSb-Doppelquantentöpfe gibt eine zusätzliche Kontrollmöglichkeit im Phasendiagramm. Optische Anregung ermöglicht den Wechsel der Majoritätsladungsträger von Elektronen zu Löchern. Dabei wird ein Regime durchlaufen, in dem beide Ladungsträger koexistieren. Dies weist stark auf eine Elektron-Loch-Hybridisierung mit nichttrivialer topologischer Phase hin. Dabei spielen zwei unterschiedliche physikalische Prozesse eine Rolle, die analog eines Frontgates bzw. eines Backgates wirken. Der Frontgate Effekt beruht auf der negativ persistenten Photoleitfähigkeit, der Backgate Effekt fußt auf der Akkumulation von Elektronen auf der Substratseite. Das hier gezeigte optisch kontrollierte Verschieben der Zustände belegt die Realisation von opto-elektronischem Schalten zwischen unterschiedlichen topologischen Phasen. Dies zeigt die Möglichkeit einer optischen Kontrolle des Phasendiagramms der topologischen Zustände in GaSb/InAs Doppelquantenfilmen. In Abschnitt 5.1 wird die optische Verstimmung von GaSb/InAs Quantenfilmen gezeigt und erklärt. Sie wird in Abhängigkeit von der Temperatur, der Anregungswellenlänge sowie der Anregungsintensität untersucht. Kontrollversuche an Proben mit einem unterschiedlichen Strukturaufbau zeigen, dass das Vorhandensein eines Übergitters auf der Substratseite der Quantenfilmstruktur essentiell für die Entstehung der Backgate-Wirkung ist (Abschnitt 5.2). Abschließend werden in Abschnitt 5.3 die Erkenntnisse zur optischen Kontrolle zusammengefasst und deren Möglichkeiten, wie optisch definierte topologischen Phasen-Grenzflächen, diskutiert.
Bi2Se3 Nanostrukturen
Mit Blick auf die Vorteile eines erhöhten Oberfläche-zu-Volumen Verhältnisses ist die Verwendung von Nanostrukturen für das Anwendungsgebiet der dreidimensionalen topologischen Isolatoren effizient. Mit dem Ziel, diesen Effekt für die Realisation des topologischen Isolators in Bi2Se3 auszunutzen, wurde im Rahmen dieser Arbeit erstmalig das Wachstum von Bi2Se3 Nanodrähten und -flocken mit Molekularstrahlepitaxie realisiert. In Kapitel 6 werden technische und physikalische Grundlagen hierzu erläutert (Abschnitt 6.1). Ausgehend von einer Einführung in dreidimensionale topologische Isolatoren werden die Eigenschaften des topologischen Zustandes in Bi2Se3 gezeigt. Darauf folgen die Kristalleigenschaften von Bi2Se3 sowie die Erklärung des epitaktischen Wachstums von Nanostrukturen mit Molekularstrahlepitaxie. In Abschnitt 6.2 schließt sich die Beschreibung der epitaktischen Herstellung an. Die Kristallstruktur wurde mittels hochauflösender Röntgendiffraktometrie und Transmissionselektronenmikroskopie als Bi2Se3 identifiziert. Rasterelektronenmikroskopie-Aufnahmen zeigen Nanodrähte und Nanoflocken auf mit Gold vorbehandelten bzw. nicht mit Gold vorbehandelten Proben. Der Wachstumsmechanismus für Nanodrähte kann nicht zweifelsfrei definiert werden. Das Fehlen von Goldtröpfchen an der Drahtspitze legt einen wurzelbasierten Wachstumsmechanismus nahe (Abschnitt 6.3).
This thesis describes the growth and characterization of epitaxial MnSi thin films on Si substrates. The interest in this material system stems from the rich magnetic phase diagram resulting from the noncentrosymmetric B20 crystal structure. Here neighboring spins prefer a tilted relative arrangement in contrast to ferro- and antiferromagnets, which leads to a helical ground state where crystal and spin helix chirality are linked [IEM+85]. This link makes the characterization and control of the crystal chirality the main goal of this thesis.
After a brief description of the material properties and applied methods, the thesis itself is divided into four main parts. In the first part the advancement of the MBE growth process of MnSi on Si\((111)\) substrate as well as the fundamental structural characterization are described. Here the improvement of the substrate interface by an adjusted substrate preparation process is demonstrated, which is the basis for well ordered flat MnSi layers. On this foundation the influence of Mn/Si flux ratio and substrate temperature on the MnSi layer growth is investigated via XRD and clear boundaries to identify the optimal growth conditions are determined. The nonstoichiometric phases outside of this optimal growth window are identified as HMS and Mn\(_5\)Si\(_3\).
Additionally, a regime at high substrate temperatures and low Mn flux is discovered, where MnSi islands are growing incorporated in a Si layer, which could be interesting for further investigations as a size confinement can change the magnetic phase diagram [DBS+18]. XRD measurements demonstrate the homogeneity of the grown MnSi layers over most of the 3 inch wafer diameter and a small \(\omega\)-FWHM of about 0.02° demonstrates the high quality of the layers. XRD and TEM measurements also show that relaxation of the layers happens via misfit dislocations at the interface to the substrate.
The second part of the thesis is concerned with the crystal chirality. Here azimuthal \(\phi\)-scans of asymmetric XRD reflections reveal twin domains with a \(\pm\)30° rotation to the substrate. These twin domains seem to consist of left and right-handed MnSi, which are connected by a mirror operation at the \((\bar{1}10)\) plane. For some of the asymmetric XRD reflections this results in different intensities for the different twin domains, which reveals that one of the domains is rotated +30° and the other is rotated -30°. From XRD and TEM measurements an equal volume fraction of both domains is deduced. Different mechanisms to suppress these twin domains are investigated and successfully achieved with the growth on chiral Si surfaces, namely Si\((321)\) and Si\((531)\). Azimuthal \(\phi\)-scans of asymmetric XRD reflections demonstrate a suppression of up to 92%. The successful twin suppression is an important step in the use of MnSi for the proposed spintronics applications with skyrmions as information carriers, as discussed in the introduction.
Because of this achievement, the third part of the thesis on the magnetic properties of the MnSi thin films is not only concerned with the principal behavior, but also with the difference between twinned and twin suppressed layers. Magnetometry measurements are used to demonstrate, that the MnSi layers behave principally as expected from the literature. The analysis of saturation and residual magnetization hints to the twin suppression on Si\((321)\) and Si\((531)\) substrates and further investigations with more samples can complete this picture. For comparable layers on Si\((111)\), Si\((321)\) and Si\((531)\) the Curie-Weiss temperature is identical within 1 K and the critical field within 0.1 T.
Temperature dependent magnetoresistivity measurements also demonstrate the expected \(T^2\) behavior not only on Si\((111)\) but also on Si\((321)\) substrates. This demonstrates the successful growth of MnSi on Si\((321)\) and Si\((531)\) substrates. The latter measurements also reveal a residual resistivity of less then half for MnSi on Si\((321)\) in comparison to Si\((111)\). This can be explained with the reduced number of domain boundaries demonstrating the successful suppression of one of the twin domains. The homogeneity of the residual resistivity as well as the charge carrier density over a wide area of the Si\((111)\) wafer is also demonstrated with these measurements as well as Hall effect measurements.
The fourth part shows the AMR and PHE of MnSi depending on the angle between in plane current and magnetic field direction with respect to the crystal direction. This was proposed as a tool to identify skyrmions [YKT+15]. The influence of the higher C\(_{3\mathrm{v}}\) symmetry of the twinned system instead of the C\(_3\) symmetry of a B20 single crystal is demonstrated. The difference could serve as a useful additional tool to prove the twin suppression on the chiral substrates. But this is only possible for rotations with specific symmetry surfaces and not for the studied unsymmetrical Si\((321)\) surface. Measurements for MnSi layers on Si\((111)\) above the critical magnetic field demonstrate the attenuation of AMR and PHE parameters for increasing resistivity, as expected from literature [WC67]. Even if a direct comparison to the parameters on Si\((321)\) is not possible, the higher values of the parameters on Si\((321)\) can be explained considering the reduced charge carrier scattering from domain boundaries. Below the critical magnetic field, which would be the region where a skyrmion lattice could be expected, magnetic hysteresis complicates the analysis. Only one phase transition at the critical magnetic field can be clearly observed, which leaves the existence of a skyrmion lattice in thin epitaxial MnSi layers open.
The best method to solve this question seems to be a more direct approach in the form of Lorentz-TEM, which was also successfully used to visualize the skyrmion lattice for thin plates of bulk MnSi [TYY+12]. For the detection of in plane skyrmions, lamellas would have to be prepared for a side view, which seems in principle possible.
The demonstrated successful twin suppression for MnSi on Si\((321)\) and Si\((531)\) substrates may also be applied to other material systems.
Suppressing the twinning in FeGe on Si\((111)\) would lead to a single chirality skyrmion lattice near room temperature [HC12]. This could bring the application of skyrmions as information carriers in spintronics within reach.
Glossary:
MBE Molecular Beam Epitaxy
XRD X-Ray Diffraction
HMS Higher Manganese Silicide
FWHM Full Width Half Maximum
TEM Tunneling Electron Microscopy
AMR Anisotropic MagnetoResistance
PHE Planar Hall Effect
Bibliography:
[IEM+85] M. Ishida, Y. Endoh, S. Mitsuda, Y. Ishikawa, and M. Tanaka. Crystal Chirality and Helicity of the Helical Spin Density Wave in MnSi. II. Polarized Neutron Diffraction. Journal of the Physical Society of Japan, 54(8):2975, 1985.
[DBS+18] B. Das, B. Balasubramanian, R. Skomski, P. Mukherjee, S. R. Valloppilly, G. C. Hadjipanayis, and D. J. Sellmyer. Effect of size confinement on skyrmionic properties of MnSi nanomagnets. Nanoscale, 10(20):9504, 2018.
[YKT+15] T. Yokouchi, N. Kanazawa, A. Tsukazaki, Y. Kozuka, A. Kikkawa, Y. Taguchi, M. Kawasaki, M. Ichikawa, F. Kagawa, and Y. Tokura. Formation of In-plane Skyrmions in Epitaxial MnSi Thin Films as Revealed by Planar Hall Effect. Journal of the Physical Society of Japan, 84(10):104708, 2015.
[WC67] R. H. Walden and R. F. Cotellessa. Magnetoresistance of Nickel-Copper Single-Crystal Thin Films. Journal of Applied Physics, 38(3):1335, 1967.
[TYY+12] A. Tonomura, X. Yu, K. Yanagisawa, T. Matsuda, Y. Onose, N. Kanazawa, H. S. Park, and Y. Tokura. Real-Space Observation of Skyrmion Lattice in Helimagnet MnSi Thin Samples. Nano Letters, 12(3):1673, 2012.
[HC12] S. X. Huang and C. L. Chien. Extended Skyrmion Phase in Epitaxial FeGe(111) Thin Films. Physical Review Letters, 108(26):267201, 2012.
Molekularstrahlepitaxie von niederdimensionalen GaInAs(N) Systemen für AlGaAs Mikroresonatoren
(2018)
Die Erforschung von Quantenpunkten mit ihren quantisierten, atomähnlichen Zuständen, bietet eine Vielzahl von Möglichkeiten auf dem Weg zum Quantencomputer und für Anwendungen wie Einzelphotonenquellen und Quantenpunktlasern. Vorangegangene Studien haben grundlegend gezeigt, wie Quantenpunkte in Halbleiterresonatoren integriert und mit diesen gekoppelt werden können. Dazu war es zum einen notwendig, die Quantenpunkte und ihr epitaktisches Wachstum besser zu verstehen und zu optimieren. Zum anderen mussten die Bragg-Resonatoren optimiert werden, sodass Güten von bis zu 165.000 realisiert werden konnten. Eingehende Studien dieser Proben zeigten im Anschluss einen komplexeren Zusammenhang von Q-Faktor und Türmchendurchmesser. Man beobachtet eine quasi periodische Oszillation des Q-Faktors mit dem Pillar Durchmesser. Ein Faktor für diese Oszillation ist die Beschaffenheit der Seitenflanken des Resonatortürmchens, bedingt durch die unterschiedlichen Eigenschaften von AlAs und GaAs bei der Prozessierung der Türmchen. Darüber hinaus wurden in der Folge auf den Grundlagen dieser Strukturen sowohl optisch als auch elektrisch gepumpte Einzelphotonenquellen realisiert.
Da in diesen Bauteilen auch die Lage des Quantenpunkts innerhalb des Resonatortürmchens einen erheblichen Einfluss auf die Effizienz der Kopplung zwischen Resonator und Quantenpunkt hat, war das weitere Ziel, die Quantenpunkte kontrolliert zu positionieren. Mit einer gezielten Positionierung sollte es möglich sein, ein Resonatortürmchen direkt über dem Quantenpunkt zu plazieren und den Quantenpunkt somit in das Maximum der optischen Mode zu legen.
Besondere Herausforderung für die Aufgabenstellung war, Quantenpunkte in einem Abstand von mind. der Hälfte des angestrebten Türmchendurchmessers, d.h 0,5 μm bis 2 μm, zu positionieren. Die Positionierung musste so erfolgen, dass nach dem Wachstum eines AlAs/GaAs DBR Spiegel über den Quantenpunkten, Resonatortürmchen zielgenau auf die Quantenpunkte prozessiert werden können. Es wurden geeignete Prozesse zur Strukturierung eines Lochgitters in die epitaktisch gewaschene Probe mittels Elektronenstrahllithographie entwickelt. Für ein weiteres Wachstum mittels Molekularstrahlepitaxie, mussten die nasschemischen Reinigungsschritte sowie eine Reinigung mit aktivem Wasserstoff im Ultrahochvakuum optimiert werden, sodass die Probe möglichst defektfrei überwachsen werden konnte, die Struktur des Lochgitters aber nicht zerstört wurde. Es wurden erfolgreich InAs-Quantenpunkte auf die vorgegebene Struktur positioniert, erstmals in einem Abstand von mehreren Mikrometern zum nächsten Nachbarn. Eine besondere Herausforderung war die Vorbereitung für eine weitere Prozessierung der Proben nach Quantenpunktwachstum. Eine Analyse mittels prozessierten Goldkreuzen, dass 30 % der Quantenpunkte innerhalb von 50 nm und 60 % innerhalb von 100 nm prozessiert wurden. In der Folge wurde mit der hier erarbeiteten Methode Quantenpunkte erfolgreich in DBR-Resonatoren sowie photonische Kristalle eingebaut
Die gute Abstimmbarkeit von Quantenpunkten und die bereits gezeigte Möglichkeit, diese in Halbleiterresonatoren einbinden zu können, machen sie auch interessant für die Anwendung im Telekommunikationsbereich. Um für Glasfasernetze Anwendung zu finden, muss jedoch die Wellenlänge auf den Bereich von 1300 nm oder 1550 nm übertragen werden. Vorangegangene Ergebnisse kamen allerdings nur knapp an die Wellenlänge von 1300nm. Eine fu ̈r andere Bauteile sowie für Laserdioden bereits häufig eingesetzte Methode, InAs-Quantenpunkte in den Bereich von Telekommunikationswellenla ̈ngen zu verschieben, ist die Verwendung von Stickstoff als weiteres Gruppe-V-Element. Bisherige Untersuchungen fokussierten sich auf Anwendungen in Laserdioden, mit hoher Quantenpunktdichte und Stickstoff sowohl in den Quantenpunkten als in den umgebenen Strukturen. Da InAsN-Quantenpunkte in ihren optischen Eigenschaften durch verschiedene Verlustmechanismen leiden, wurde das Modell eines Quantenpunktes in einem Wall (Dot-in-Well) unter der Verwendung von Stickstoff weiterentwickelt. Durch gezielte Separierung der Quantenpunkte von den stickstoffhaltigen Schichten, konnte e eine Emission von einzelnen, MBE-gewachsenen InAs Quantenpunkten von über 1300 nm gezeigt werden. Anstatt den Stickstoff direkt in die Quantenpunkte oder unmittelbar danach in die Deckschicht ein zu binden, wurde eine Pufferschicht ohne Stickstoff so angepasst, dass die Quantenpunkte gezielt mit Wellenlängen größer 1300 nm emittieren. So ist es nun möglich, die Emission von einzelnen InAs Quantenpunkten jenseits dieser Wellenlänge zu realisieren.
Es ist nun daran, diese Quantenpunkte mit den beschriebenen Mikroresonatoren zu koppeln, um gezielt optisch und elektrisch gepumpte Einzelphotonenquellen für 1300nm zu realisieren.
The subject of this thesis is the control of strain in HgTe thin-film crystals. Such systems are members of the new class of topological insulator materials and therefore of special research interest. A major task was the experimental control of the strain in the HgTe films. This was achieved by a new epitaxial approach and confirmed by cristallographic analysis and magneto-transport measurements.
In this work, strain was induced in thin films by means of coherent epitaxy on substrate crystals. This means that the film adopts the lattice constant of the substrate in the plane of the substrate-epilayer interface. The level of strain is determined by the difference between the strain-free lattice constants of the substrate and epilayer material (the so-called lattice mismatch). The film responds to an in-plane strain with a change of its lattice constant perpendicular to the interface. This relationship is crucial for both the correct interpretation of high resolution X-ray diffraction (HRXRD) measurements, and the precise determination of the band dispersion. The lattice constant of HgTe is smaller than the lattice constant of CdTe. Therefore, strain in HgTe is tensile if it is grown on a CdTe substrate. In principle, compressive strain can be achieved by using an appropriate \(\text{Cd}_{1-x}\text{Zn}_{x}\text{Te}\) substrate. This concept was modified and applied in this work.
Epilayers have been fabricated by molecular-beam epitaxy (MBE). The growth of thick buffer layers of CdTe on GaAs:Si was established as an alternative to commercial CdTe and \(text{Cd}_{0.96}\text{Zn}_{0.04}\text{Te}\) substrates. The growth conditions have been optimized by an analysis of atomic force microscopy and HRXRD studies. HRXRD measurements reveal a power-law increase of the crystal quality with increasing thickness. Residual strain was found in the buffer layers, and was attributed to a combination of finite layer thickness and mismatch of the thermal expansion coefficients of CdTe and GaAs. In order to control the strain in HgTe epilayers, we have developed a new type of substrate with freely adjustable lattice constant.
CdTe-\(\text{Cd}_{0.5}\text{Zn}_{0.5}\text{Te}\) strained-layer-superlattices have been grown by a combination of MBE and atomic-layer epitaxy (ALE), and have been analyzed by HRXRD. ALE of the \(\text{Cd}_{0.5}\text{Zn}_{0.5}\text{Te}\) layer is self-limiting to one monolayer, and the effective lattice constant can be controlled reproducibly and straightforward by adjusting the CdTe layer thickness. The crystal quality has been found to degrade with increasing Zn-fraction. However, the effect is less drastic compared to single layer \(\text{Cd}_{1-x}\text{Zn}_{x}\text{Te}\) solid solutions. HgTe quantum wells (QWs) sandwiched in between CdHgTe barriers have been fabricated in a similar fashion on superlattices and conventional CdTe and \(\text{Cd}_{0.96}\text{Zn}_{0.04}\text{Te}\) substrates. The lower critical thickness of the CdHgTe barrier material grown on superlattice substrates had to be considered regarding the sample design. The electronic properties of the QWs depend on the strain and thickness of the QW. We have determined the QW thickness with an accuracy of \(\pm\)0.5 nm by an analysis of the beating patterns in the thickness fringes of HRXRD measurements and X-ray reflectometry measurements. We have, for the first time, induced compressive strain in HgTe QWs by an epitaxial technique (i.e. the effective lattice constant of the superlattice is lower compared to the lattice constant of HgTe). The problem of the lattice mismatch between superlattice and barriers has been circumvented by using CdHgTe-ZnHgTe superlattices instead of CdHgTe as a barrier material. Furthermore, the growth of compressively strained HgTe bulk layers (with a thickness of at least 50 nm) was demonstrated as well.
The control of the state of strain adds a new degree of freedom to the design of HgTe epilayers, which has a major influence on the band structure of QWs and bulk layers. Strain in bulk layers lifts the degeneracy of the \(\Gamma_8\) bands at \(\mathbf{k}=0\). Tensile strain opens an energy gap, compressive strain shifts the touching points of the valence- and conduction band to positions in the Brillouin zone with finite \(\mathbf{k}\). Such a situation has been realized for the first time in the course of this work. For QWs in the inverted regime, it is demonstrated that compressive strain can be used to significantly enhance the thermal energy gap of the two-dimensional electron gas (2DEG). In addition, semi-metallic and semiconducting behavior is expected in wide QWs, depending on the state of strain. An examination of the temperature dependence of the subband ordering in QWs revealed that the band gap is only temperature-stable for appropriate sample parameters and temperature regimes. The band inversion is always lifted for sufficiently high temperatures.
A large number of models investigate the influence of the band gap on the stability of the quantum-spin-Hall (QSH) effect. An enhancement of the stability of QSH edge state conductance is expected for enlarged band gaps. Furthermore, experimental studies on the temperature dependence of the QSH conductance are in contradiction to theoretical predictions. Systematic studies of these aspects have become feasible based on the new flexibility of the sample design.
Detailed low-temperature magnetotransport studies have been carried out on QWs and bulk layers. For this purpose, devices have been fabricated lithographically, which consist of two Hall-bar geometries with different dimensions. This allows to discriminate between conductance at the plane of the 2DEG and the edge of the sample. The Fermi energy in the 2DEG has been adjusted by means of a top gate electrode. The strain-induced transition from semi-metallic to semiconducting characteristics in wide QWs was shown. The magnitude of the semi-metallic overlap of valence- and conduction band was determined by an analysis of the two-carrier conductance and is in agreement with band structure calculations. The band gap of the semiconducting sample was determined by measurements of the temperature dependence of the conductance at the charge-neutrality point. Agreement with the value expected from theory has been achieved for the first time in this work. The influence of the band gap on the stability of QSH edge state conductance has been investigated on a set of six samples. The band gap of the set spans a range of 10 to 55 meV. The latter value has been achieved in a highly compressively strained QW, has been confirmed by temperature-dependent conductance measurements, and is the highest ever reported in the inverted regime. Studies of the carrier mobility reveal a degradation of the sample quality with increasing Zn-fraction in the superlattice, in agreement with HRXRD observations. The enhanced band gap does not suppress scattering mechanisms in QSH edge channels, but lowers the conductance in the plane of the 2DEG. Hence, edge state conductance is the dominant conducting process even at elevated temperatures. An increase in conductance with increasing temperature has been found, in agreement with reports from other groups. The increase follows a power-law dependency, the underlying physical mechanism remains open. A cause for the lack of an increase of the QSH edge state conductance with increasing energy gap has been discussed. Possibly, the sample remains insulating even at finite carrier densities, due to localization effects. The measurement does not probe the QSH edge state conductance at the situation where the Fermi energy is located in the center of the energy gap, but in the regime of maximized puddle-driven scattering. In a first set of measurements, it has been shown that the QSH edge state conductance can be influenced by hysteretic charging effects of trapped states in the insulating dielectric. A maximized conductance of \(1.6\ \text{e}^2/\text{h}\) was obtained in a \(58\ \mu\text{m}\) edge channel. Finally, measurements on three dimensional samples have been discussed. Recent theoretical works assign compressively strained HgTe bulk layers to the Weyl semi-metal class of materials. Such layers have been synthesized and studied in magnetotransport experiments for the first time. Pronounced quantum-Hall- and Shubnikov-de-Haas features in the Hall- and longitudinal resistance indicate two-dimensional conductance on the sample surface. However, this conductance cannot be assigned definitely to Weyl surface states, due to the inversion of \(\Gamma_6\) and \(\Gamma_8\) bands. If a magnetic field is aligned parallel to the current in the device, a decrease in the longitudinal resistance is observed with increasing magnetic field. This is a signature of the chiral anomaly, which is expected in Weyl semi-metals.
In the present thesis the MBE growth and sample characterization of HgTe structures is investigated
and discussed. Due to the first experimental discovery of the quantum Spin Hall effect
(QSHE) in HgTe quantum wells, this material system attains a huge interest in the spintronics
society. Because of the long history of growing Hg-based heterostructures here at the Experimentelle
Physik III in Würzburg, there are very good requirements to analyze this material
system more precisely and in new directions. Since in former days only doped HgTe quantum
wells were grown, this thesis deals with the MBE growth in the (001) direction of undoped
HgTe quantum wells, surface located quantum wells and three dimensional bulk layers. All
Hg-based layers were grown on CdTe substrates which generate strain in the layer stack and
provide therefore new physical effects. In the same time, the (001) CdTe growth was investigated
on n-doped (001) GaAs:Si because the Japanese supplier of CdTe substrates had a
supply bottleneck due to the Tohoku earthquake and its aftermath in 2011.
After a short introduction of the material system, the experimental techniques were demonstrated
and explained explicitly. After that, the experimental part of this thesis is displayed.
So, the investigation of the (001) CdTe growth on (001) GaAs:Si is discussed in chapter 4.
Firstly, the surface preparation of GaAs:Si by oxide desorption is explored and analyzed.
Here, rapid thermal desorption of the GaAs oxide with following cool down in Zn atmosphere
provides the best results for the CdTe due to small holes at the surface, while e.g. an atomic
flat GaAs buffer deteriorates the CdTe growth quality. The following ZnTe layer supplies the
(001) growth direction of the CdTe and exhibits best end results of the CdTe for 30 seconds
growth time at a flux ratio of Zn/Te ~ 1/1.2. Without this ZnTe layer, CdTe will grow in the
(111) direction. However, the main investigation is here the optimization of the MBE growth
of CdTe. The substrate temperature, Cd/Te flux ratio and the growth time has to be adjusted
systematically. Therefore, a complex growth process is developed and established. This optimized
CdTe growth process results in a RMS roughness of around 2.5 nm and a FWHM value
of the HRXRD w-scan of 150 arcsec. Compared to the literature, there is no lower FWHM
value traceable for this growth direction. Furthermore, etch pit density measurements show
that the surface crystallinity is matchable with the commercial CdTe substrates (around 1x10^4
cm^(-2)). However, this whole process is not completely perfect and offers still room for improvements.
The growth of undoped HgTe quantum wells was also a new direction in research in contrast
to the previous n-doped grown HgTe quantum wells. Here in chapter 5, the goal of very low
carrier densities was achieved and therefore it is now possible to do transport experiments in
the n - and p - region by tuning the gate voltage. To achieve this high sample quality, very precise
growth of symmetric HgTe QWs and their HRXRD characterization is examined. Here,
the quantum well thickness can now determined accurate to under 0.3 nm. Furthermore, the transport analysis of different quantum well thicknesses shows that the carrier density and
mobility increase with rising HgTe layer thickness. However, it is found out that the band
gap of the HgTe QW closes indirectly at a thickness of 11.6 nm. This is caused by the tensile
strained growth on CdTe substrates. Moreover, surface quantum wells are studied. These
quantum wells exhibit no or a very thin HgCdTe cap. Though, oxidization and contamination
of the surface reduces here the carrier mobility immensely and a HgCdTe layer of around 5 nm
provides the pleasing results for transport experiments with superconductors connected to the
topological insulator [119]. A completely new achievement is the realization of MBE growth
of HgTe quantum wells on CdTe/GaAs:Si substrates. This is attended by the optimization of
the CdTe growth on GaAs:Si. It exposes that HgTe quantum wells grown in-situ on optimized
CdTe/GaAs:Si show very nice transport data with clear Hall plateaus, SdH oscillations, low
carrier densities and carrier mobilities up to 500 000 cm^2/Vs. Furthermore, a new oxide etching
process is developed and analyzed which should serve as an alternative to the standard
HCl process which generates volcano defects at some time. However, during the testing time
the result does not differ in Nomarski, HRXRD, AFM and transport measurements. Here,
long-time tests or etching and mounting in nitrogen atmosphere may provide new elaborate
results.
The main focus of this thesis is on the MBE growth and standard characterization of HgTe bulk
layers and is discussed in chapter 6. Due to the tensile strained growth on lattice mismatched
CdTe, HgTe bulk opens up a band gap of around 22 meV at the G-point and exhibits therefore
its topological surface states. The analysis of surface condition, roughness, crystalline quality,
carrier density and mobility via Nomarski, AFM, XPS, HRXRD and transport measurements
is therefore included in this work. Layer thickness dependence of carrier density and mobility
is identified for bulk layer grown directly on CdTe substrates. So, there is no clear correlation
visible between HgTe layer thickness and carrier density or mobility. So, the carrier density is
almost constant around 1x10^11 cm^(-2) at 0 V gate voltage. The carrier mobility of these bulk
samples however scatters between 5 000 and 60 000 cm^2/Vs almost randomly. Further experiments
should be made for a clearer understanding and therefore the avoidance of unusable
bad samples.But, other topological insulator materials show much higher carrier densities and
lower mobility values. For example, Bi2Se3 exhibits just density values around 1019 cm^(-2)
and mobility values clearly below 5000 cm2/Vs. The carrier density however depends much
on lithography and surface treatment after growth. Furthermore, the relaxation behavior and
critical thickness of HgTe grown on CdTe is determined and is in very good agreement with
theoretical prediction (d_c = 155 nm). The embedding of the HgTe bulk layer between HgCdTe
layers created a further huge improvement. Similar to the quantum well structures the carrier
mobility increases immensely while the carrier density levels at around 1x10^11 cm^(-2) at 0
V gate voltage as well. Additionally, the relaxation behavior and critical thickness of these
barrier layers has to be determined. HgCdTe grown on commercial CdTe shows a behavior as
predicted except the critical thickness which is slightly higher than expected (d_c = 850 nm).
Otherwise, the relaxation of HgCdTe grown on CdTe/GaAs:Si occurs in two parts. The layer
is fully strained up to 250 nm. Between 250 nm and 725 nm the HgCdTe film starts to relax
randomly up to 10 %. The relaxation behavior for thicknesses larger than 725 nm occurs than
linearly to the inverse layer thickness. A explanation is given due to rough interface conditions
and crystalline defects of the CdTe/GaAs:Si compared to the commercial CdTe substrate. HRXRD and AFM data support this statement. Another point is that the HgCdTe barriers protect the active HgTe layer and because of the high carrier mobilities the Hall measurements provide new transport data which have to be interpreted more in detail in the future. In addition, HgTe bulk samples show very interesting transport data by gating the sample from the top and the back. It is now possible to manipulate the carrier densities of the top and bottom surface states almost separately. The back gate consisting of the n-doped GaAs substrate and the thick insulating CdTe buffer can tune the carrier density for Delta(n) ~ 3x10^11 cm^(-2). This is sufficient to tune the Fermi energy from the p-type into the n-type region [138].
In this thesis it is shown that strained HgTe bulk layers exhibit superior transport data by embedding between HgCdTe barrier layers. The n-doped GaAs can here serve as a back gate.
Furthermore, MBE growth of high crystalline, undoped HgTe quantum wells shows also new
and extended transport output. Finally, it is notable that due to the investigated CdTe growth
on GaAs the Hg-based heterostructure MBE growth is partially independent from commercial
suppliers.