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Gegenstand dieser Arbeit ist die Kopplung von kollektiven Anregungen in einlagigen und doppellagigen quasi-zweidimensionalen Elektronensystemen. Es wurden verschiedene modulationsdotierte Proben auf Basis von GaAs mit Gate-Elektrode und Gitterkoppler präpariert, um bei variabler Elektronendichte die Plasmon-Anregungen mit Hilfe der Ferninfrarot-Spektroskopie zu studieren. Die Auswertung der experimentellen Daten erfolgte durch eine selbstkonsistente Berechnung des elektronischen Grundzustandes, der Plasmon-Anregungsenergien und der optischen Absorption des Elektronengases. Zur Bestimmung der Absorption wurde dabei auf Grundlage bestehender Ansätze ein eigener Formalismus im Rahmen der Stromantwort-Theorie entwickelt. Somit gelangen der erstmalige Nachweis von optischen und akustischen Intersubband-Plasmonen in zweilagigen Elektronensystemen sowie eine detaillierte Analyse der Kopplung von Intersubband-Plasmonen an optische Phononen und an strahlende Gittermoden im Bereich der Rayleigh-Anomalie.
> In oxidischen Heterostrukturen kann es zur Ausbildung unerwarteter elektronischer und magnetischer Phasen kommen. Ein bekanntes Beispiel ist das Heterostruktursystem LaAlO\(_3\)/SrTiO\(_3\), an dessen Grenzfläche ein zweidimensionalen Elektronensystem (2DES) entsteht, sofern die LaAlO\(_3\)-Filmdicke einen kritischen Wert von mindestens vier Einheitszellen aufweist. Ähnliches Verhalten konnte an der Heterostruktur γ-Al\(_2\)O\(_3\)/SrTiO\(_3\) beobachtet werden. Die gemessenen Elektronenbeweglichkeiten und Flächenladungsträgerdichten übertreffen hierbei die in LaAlO\(_3\)/SrTiO\(_3\) um mehr als eine Größenordnung. Die vorliegende Arbeit beschäftigt sich mit der Herstellung sowie der Analyse dieser beiden Heterostruktursysteme. Die Hauptaspekte sind dabei die Untersuchung der physikalischen Eigenschaften an der Grenzfläche sowie das Verständnis der zugrundeliegenden Mechanismen.
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> Im Hinblick auf das Wachstum wird demonstriert, dass die für LaAlO\(_3\)/SrTiO\(_3\) etablierte Wachstumsroutine der gepulsten Laserablation sowie die zur Überwachung des Schichtwachstums verwendete Methode der Beugung hochenergetischer Elektronen in Reflexion (RHEED) für das γ-Al\(_2\)O\(_3\)-Wachstum modifiziert werden müssen. So kann gezeigt werden, dass durch eine geeignete Variation der Wachstumsgeometrie die Resonanz von Oberflächenwellen, welche im Falle des γ-Al\(_2\)O\(_3\)-Wachstums die Beobachtung von RHEED-Oszillationen erschwert, vermieden werden kann und somit auch hier die Überwachung des heteroepitaktischen Schichtwachstum mittels Elektronenbeugung möglich wird.
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> Für die Ausbildung des 2DES in LaAlO\(_3\)/SrTiO\(_3\) wird das Szenario der elektronischen Rekonstruktion als mögliche Ursache diskutiert, wonach das divergierende Potential innerhalb des polaren LaAlO\(_3\)-Films durch einen Ladungstransfer von der Probenoberfläche in die obersten Atomlagen des unpolaren SrTiO\(_3\)-Substrats kompensiert wird. Zudem sind die Eigenschaften der Heterostruktur von den Wachstumsparametern abhängig. So wird in der vorliegenden Arbeit eine deutliche Zunahme der Ladungsträgerkonzentration und der räumliche Ausdehnung der leitfähigen Schicht insbesondere für Proben, welche bei sehr niedrigen Sauerstoffhintergrunddrücken gewachsen wurden, gezeigt und auf die Erzeugung von Sauerstofffehlstellen innerhalb des Substrats zurückgeführt. Darüber hinaus wird erstmalig die Herstellung atomar scharfer Grenzflächen mit sehr geringer Defektdichte selbst bei sehr niedrigen Wachstumsdrücken belegt und erstmals auch direkt elektronenmikroskopisch nachgewiesen. Es werden allenfalls vernachlässigbare Effekte der Sauerstoffkonzentration auf charakteristische, strukturelle Merkmale der Probe beobachtet. Desweiteren zeigt diese Arbeit erstmalig eine von den Wachstumsbedingungen abhängige Gitterverzerrung des Films, was in Übereinstimmung mit Rechnungen auf Basis der Dichtefunktionaltheorie einen Hinweis auf ein komplexes Zusammenspiel von elektronischer Rekonstruktion, Sauerstofffehlstellen an der LaAlO\(_3\)-Oberfläche und einer Verzerrung der Kristallstruktur als Ursache für die Entstehung des 2DES in LaAlO\(_3\)/SrTiO\(_3\) liefert.
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> Neben der mikroskopischen Analyse des 2DES in LaAlO\(_3\)/SrTiO\(_3\) wird die elektronische Struktur dieses Systems zudem mithilfe der resonanten inelastischen Röntgenstreuung charakterisiert. Die vorliegende Dissertation zeigt dabei, neben dem Nachweis lokalisierter Ladungsträger vor dem Einsetzen metallischen Verhaltens ab einer kritischen Schichtdicke von vier Einheitszellen, die Existenz eines Raman- und eines fluoreszenzartigen Signals in Abhängigkeit der verwendeten Photonenenergie, was wiederum auf einen unterschiedlichen elektronischen Charakter im Zwischenzustand zurückgeführt werden kann. Gestützt wird diese Interpretation durch vergleichbare Messungen an γ- Al\(_2\)O\(_3\)/SrTiO\(_3\). In diesem System finden sich zudem ebenfalls Anzeichen lokalisierter Ladungsträger unterhalb der kritischen Schichtdicke für metallisches Verhalten, was ein Hinweis auf einen mit LaAlO\(_3\)/SrTiO\(_3\) vergleichbaren Grundzustand sein könnte.
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> Weitere Messungen mithilfe der resonanten Photoelektronenspektroskopie ermöglichen zudem eine direkte Beobachtung und Analyse der Ti 3d-Valenzelektronen. Messungen an LaAlO\(_3\)/SrTiO\(_3\) und γ-Al\(_2\)O\(_3\)/SrTiO\(_3\) liefern dabei Hinweise auf verschiedene elektronische Ti 3d-artige Zustände. Diese werden zum einen den mobilen Ladungsträgern des 2DES zugeschrieben, zum anderen als lokalisierte Elektronen in der Nähe von Sauerstofffehlstellen identifiziert. Eine Analyse des Resonanzverhaltens sowie der spektralen Form der beobachteten Signale zeigt quantitative Unterschiede, was auf einen unterschiedlichen treibenden Mechanismus in beiden Systemen hindeutet und im Hin- blick auf den Einfluss von Sauerstofffehlstellen auf das System diskutiert wird. Zudem zeigen impulsaufgelöste Messungen der Zustände am chemischen Potential eine unterschiedliche Intensitätsverteilung im k -Raum. Dies wird im Zusammenhang mit Matrixelementeffekten diskutiert und kann vermutlich auf Photoelektronendiffraktion bedingt durch die unterschiedliche Kristallstruktur des Filmmaterials, zurückgeführt werden.
Oxide heterostructures attract a lot of attention as they display a vast range of physical phenomena like conductivity, magnetism, or even superconductivity. In most cases, these effects are caused by electron correlations and are therefore interesting for studying fundamental physics, but also in view of future applications. This thesis deals with the growth and characterization of several prototypical oxide heterostructures. Fe3O4 is highly ranked as a possible spin electrode in the field of spintronics. A suitable semiconductor for spin injection in combination with Fe3O4 is ZnO due to its oxide character and a sufficiently long spin coherence length. Fe3O4 has been grown successfully on ZnO using pulsed laser deposition and molecular beam epitaxy by choosing the oxygen partial pressure adequately. Here, a pressure variation during growth reduces an FeO-like interface layer. Fe3O4 films grow in an island-like growth mode and are structurally nearly fully relaxed, exhibiting the same lattice constants as the bulk materials. Despite the presence of a slight oxygen off-stoichiometry, indications of the Verwey transition hint at high-quality film properties. The overall magnetization of the films is reduced compared to bulk Fe3O4 and a slow magnetization behavior is observed, most probably due to defects like anti-phase boundaries originating from the initial island growth. LaAlO3/SrTiO3 heterostructures exhibit a conducting interface above a critical film thickness, which is most likely explained by an electronic reconstruction. In the corresponding model, the potential built-up owing to the polar LaAlO3 overlayer is compensated by a charge transfer from the film surface to the interface. The properties of these heterostructures strongly depend on the growth parameters. It is shown for the first time, that it is mainly the total pressure which determines the macroscopic sample properties, while it is the oxygen partial pressure which controls the amount of charge carriers near the interface. Oxygen-vacancy-mediated conductivity is found for too low oxygen pressures. A too high total pressure, however, destroys interface conductivity, most probably due to a change of the growth kinetics. Post-oxidation leads to a metastable state removing the arbitrariness in controlling the electronic interface properties by the oxygen pressure during growth. LaVO3/SrTiO3 heterostructures exhibit similar behavior compared to LaAlO3/SrTiO3 when it comes to a thickness-dependent metal-insulator transition. But in contrast to LaAlO3, LaVO3 is a Mott insulator exhibiting strong electron correlations. Films have been grown by pulsed laser deposition. Layer-by-layer growth and a phase-pure pervoskite lattice structure is observed, indicating good structural quality of the film and the interface. An electron-rich layer is found near the interface on the LaVO3 side for conducting LaVO3/SrTiO3. This could be explained by an electronic reconstruction within the film. The electrostatic doping results in a band-filling-controlled metal-insulator transition without suffering from chemical impurities, which is unavoidable in conventional doping experiments.
2-Punkt Transportmessungen, die in der Vergangenheit an ZnSe-basierenden DMS/NMS/DMS Multischichtsystemem durchgeführt wurden, zeigten eine 25-prozentige Erhöhung des Widerstandes beim Übergang vom unpolarisierten in den polarisierten Zustand des DMS. Dieser Magnetowiderstandseffekt wurde durch elektrische Spininjektion in den NMS erklärt. In dieser Arbeit wird zunächst anhand von 4-Punkt Transportmessungen an miniaturisierten, elektronenstrahllithographisch gefertigten DMS/NMS/DMS Strukturen dieser Widerstandseffekt näher untersucht, um eine Bestimmung der Spinrelaxationslänge im nichtmagnetischen II-VI Halbleiter zu erlauben. Aufgrund der im Rahmen dieser Experimente erhaltenen Ergebnisse muss jedoch die Verknüpfung des positiven Magnetowiderstandseffekts mit der elektrischen Spininjektion in den NMS des Multischichtsystems revidiert werden. Im weiteren Verlauf der Arbeit werden Strukturen mit Abmessungen in der Größenordnung von 1 µm hergestellt und gemessen, mit deren Hilfe ein eindeutiger Nachweis der elektrischen Spininjektion in einen nichtmagnetischen Halbleiter mittels Transportmessungen ermöglicht wird. Mit diesen Resultaten kann eine oberer Grenzwert für die Spinfliplänge in ZnBeSe von 100 nm abgeschätzt werden.
Seit 1988 werden mit dem Verfahren der Molekularstrahlepitaxie (MBE: Molecular Beam Epitaxy) am Physikalischen Institut der Universität Würzburg Halbleiterheterostrukturen aus dem Halbleitermaterialsystem Hg(1-x)Cd(x)Te hergestellt. Diese quecksilberhaltige Legierung ist ein II-VI-Verbindungshalbleiter und zeichnet sich durch eine legierungs- und temperaturabhängige fundamentale Energielücke aus. Die Bandstruktur ist je nach Temperatur und Legierungsfaktor x einerseits halbleitend, anderseits aber halbmetallisch. Die schmallückigen Hg(1-x)Cd(x)Te-Legierungen werden als Infrarotdetektoren eingesetzt. Mit dem Verfahren der Molekularstrahlepitaxie ist es möglich Bandstrukturen mit spezifischen Eigenschaften herzustellen (band structure engineering). Unter diesen neuen Materialien stellen die Typ-III-Übergitter eine besondere Klasse dar. Bei diesen zweidimensionalen Materialstrukturen wird eine nur wenige Atomlagen dicke Schicht von 30 °A bis 100 °A aus dem Halbmetall HgTe, dem Trogmaterial, in eine Legierung aus Hg(1-x)Cd(x)Te, dem Barrierenmaterial, eingebettet und zu einem Übergitter aufgebaut. Zweidimensionale Typ-III-Halbleiterheterostrukturen, wie die HgTe-Hg(1-x)Cd(x)Te-Quantentrogstrukturen und HgTe-Hg(1-x)Cd(x)Te-Übergitter, sind von fundamentalen Interesse zum Verständnis von elektronischen Zuständen komplexer Bandstrukturen und zweidimensionaler Ladungsträgersysteme. Darüber hinaus werden HgTe-Hg(1-x)Cd(x)Te-Übergitter in der Sensorik als Infrarotdektoren eingesetzt, deren cut-off-Wellenlänge prozessgesteuert in der Molekularstrahlepitaxie über die Trogbreite, der Schichtdicke des HgTe, eingestellt werden kann. Je nach verwendeten Barrierenmaterial Hg(1-x)Cd(x)Te und Temperatur besitzen die Übergitterstrukturen mit großen Barrierenschichtdicken, das sind die Quantentrogstrukturen, in Abhängigkeit von der Trogbreite, für niedrige Trogbreiten eine normal halbleitende Subbandstruktur, während sich für größere Trogbreiten eine invertiert halbleitende Subbandstruktur einstellt. In der invertiert halbleitenden Subbandstruktur ist ein indirekter Halbleiter realisierbar. Bei Strukturen mit dünnen Barrierenschichtdicken ist die Minibanddispersion stark ausgeprägt und es kann sich zusätzlich eine halbmetallische Subbandstruktur ausbilden. Diese speziellen Eigenschaften sind einzigartig und kennzeichnen die komplexe Bandstruktur von Typ-III-Heterostrukturen. Erst die genaue Kenntnis und ein vertieftes Verständnis der komplexen Bandstruktur erlaubt die Interpretation von Ergebnissen aus (magneto)-optischen Untersuchungen der elektronischen Eigenschaften von Typ-III-Halbleiterheterostrukturen. Die Berechnung der elektronischen Zustände in den HgTe-Hg(1-x)Cd(x)Te-Übergitter wurde in der vorliegenden Arbeit in der Envelopefunktionsnäherung durchgeführt. Seit drei Jahrzehnten wird die Envelopefunktionenn¨aherung (EFA: Envelope Function Approximation) sehr erfolgreich bei der Interpretation der experimentellen Ergebnisse von (magneto)- optischen Untersuchungen an Halbleiterheterostrukturen eingesetzt. Der Erfolg basiert auf der effektiven Beschreibung der quantisierten, elektronischen Zustände an Halbleitergrenzflächen, in Quantentrögen und Übergittern und der Einzigartigkeit, zur Berechnung der experimentellen Ergebnisse, die Abhängigkeit von äußeren Parametern, wie der Temperatur und des hydrostatischen Druckes, aber auch eines elektrischen und magnetischen Feldes, wie auch von freien Ladungsträgern, ein zu arbeiten. Die sehr gute quantitative Übereinstimmung der theoretischen Berechnungen in der Envelopefunktionennäherung und vieler experimenteller Messergebnisse an Halbleiterheterostrukturen baut auf der quantitativen Bestimmung der relevanten Bandstrukturparameter in der k·p-Störungstheorie zur Beschreibung der elektronischen Eigenschaften der beteiligten Volumenhalbleiter auf. In Kapitel 1 der vorliegenden Arbeit wird daher zunächst das Bandstrukturmodell des Volumenmaterials Hg(1-x)Cd(x)Te vorgestellt und daraus die Eigenwertgleichung des Hamilton-Operators in der Envelopefunktionenn¨aherung abgeleitet. Danach wird das L¨osungsverfahren, die Matrixmethode, zur Berechnung der Eigenwerte und Eigenfunktionen beschrieben und auf die Berechnung der elektronischen Subbandzustände der Typ-III-Hg(1-x)Cd(x)Te-Übergitter angewendet. Es folgt eine Diskussion der grundlegenden Eigenschaften der komplexen Bandstruktur in den verschiedenen Regimen der Typ-III-Halbleiterheterostrukturen und der charakteristischen Wellenfunktionen, den Grenzflächenzuständen. An Ende dieses Kapitels wird die Berechnung des Absorptionskoeffizienten hergeleitet und die grundlegenden Eigenschaften der Diplomatrixelemente zur Charakterisierung der optischen Eigenschaften von HgTe-Hg(1-x)Cd(x)Te-Übergitter exemplarisch vorgestellt. In Kapitel 2 sind die wesentlichen Ergebnisse aus dem Vergleich von Infrarotabsorptionsmessungen an HgTe-Hg(1-x)Cd(x)Te-Übergitter mit den berechneten Absorptionskoeffizienten zusammengestellt.
Graphene-based single-electron and hybrid devices, their lithography, and their transport properties
(2016)
This work explores three different aspects of graphene, a single-layer of carbon atoms arranged in a hexagonal lattice, with regards to its usage in future electronic devices; for instance in the context of quantum information processing. For a long time graphene was believed to be thermodynamically unstable. The discovery of this strictly two-dimensional material completed the family of carbon based structures, which had already been subject of intensive research with focus on zero-dimensional fullerenes and one-dimensional carbon nanotubes. Within only a few years of its discovery, the field of graphene related research has grown into one of today’s most diverse and prolific areas in condensed matter physics, highlighted by the award of the 2010 Nobel Prize in Physics to A.K. Geim and K. Noveselov for “their groundbreaking experiments regarding the two-dimensional material graphene”.
From the point of view of an experimental physicist interested in the electronic properties of a material system, the most intriguing characteristic of graphene is found in the Dirac-like nature of its charge carriers, a peculiar fact that distinguishes graphene from all other known standard semiconductors. The dynamics of charge carriers close to zero energy are described by a linear energy dispersion relation, as opposed to a parabolic one, which can be understood as a result of the underlying lattice symmetry causing them to behave like massless relativistic particles. This fundamentally different behavior can be expected to lead to the observation of completely new phenomena or the occurrence of deviations in well-known effects.
Following a brief introduction of the material system in chapter 2, we present our work studying the effect of induced superconductivity in mesoscopic graphene Josephson junctions by proximity to superconducting contacts in chapter 3. We explore the use of Nb as the superconducting material driven by the lack of high critical temperature and high critical magnetic field superconductor technology in graphene devices at that time. Characterization of sputter-deposited Nb films yield a critical transition temperature of \(T_{C}\sim 8{\rm \,mK}\). A prerequisite for successful device operation is a high interface quality between graphene and the superconductor. In this context we identify the use of an Ti as interfacial layer and incorporate its use by default in our lithography process. Overall we are able to increase the interface transparency to values as high as \(85\%\). With the prospect of interesting effects in the ballistic regime we try to enhance the electronic quality of our Josephson junction devices by substrate engineering, yet with limited success. We achieve moderate charge carrier mobilities of up to \(7000{\rm \,cm^2/Vs}\) on a graphene/Boron-nitride heterostructure (fabrication details are covered in chapter 5) putting the junction in the diffusive regime (\(L_{device}<L_{\rm{mfp}}\)). We speculate that either inhomogeneities in the graphene channel or lithography residues are responsible for this observation.
Furthermore we study the Josephson effect and Andreev reflection related physics in this device by low-temperature transport measurements. The junction carries a bipolar supercurrent which remains finite at the charge neutrality point. The genuine Josephson character is confirmed by the modulation of the supercurrent as a function of an out-of-plane magnetic field resembling that of a Fraunhofer-like pattern. This is further supported by the response of the junction to microwave radiation in the form of Shaprio steps. Surprisingly we find a strongly reduced superconducting energy gap of approximately \(\Delta = 400{\rm \,\mu eV}\) by quantitatively analyzing data of multiple Andreev reflections. We show this result to be consistent by careful analysis of the device parameters and comparison of these to a theoretical model. More experiments will be needed to determine the origin of this reduction and if the presence of the Ti interfacial layer plays an important role in that.
With regards to possible usability of superconducting contacts in more complex hybrid structures we can conclude that our work establishes the necessary preconditions while still leaving room for improvements; especially in terms of device quality.
In the second part of this work we are primarily interested in electrical transport properties of graphene nanodevices and their application in graphene-superconductor hybrid structures. The fact that graphene is mechanically stable down to a few tens of nanometers in width while exhibiting a finite conductance makes it an appealing choice as host for single-electron devices, also known as quantum dots. Our work on this topic is covered in chapter 4 where we first develop a high-resolution lithography process for the fabrication of single electron devices with critical feature sizes of roughly \(50{\rm \,nm}\). To this end we use a resist etch mask in combination with a reactive-ion etch process for device patterning. Carrier confinement in graphene is known to be hindered by the Klein tunneling phenomenon, a challenge that can be overcome by using all-graphene nano-constrictions to decouple the source and drain contacts from the central island.
The traditionally used constriction design is comprised of long and narrow connections. We argue that a design with very short and narrow constrictions could be beneficial for the quantum dot performance as the length merely affects the overall conductance and requires extended side-gates to control their transmission. We confirm the functionality of two different devices in low-temperature measurements, which differ in the size of their central island with \(d=250{\rm \,nm}\) for device no. 1 and \(d=400{\rm \,nm}\) for device no. 2. Coulomb blockade measurements conducted at \(20{\rm \,mK}\) on both devices reveal clear sequences of Coulomb peaks with amplitudes of up to \(0.8\rm{\,e}^2/\rm{h}\), a value significantly larger than what is commonly reported for similar devices. We interpret this as an indication of rather homogeneous constrictions, resulting from the modified design. Coulomb diamond measurements display the behavior expected for a lithographically designed single quantum dot revealing no features related to the presence of an additional dot. Using the stability diagram we determine the addition energies of the two dots and find them to be in good agreement with values reported in the literature for devices of similar size. Using the normalized Coulomb peak spacing as a figure of merit for the device quality we find that device no. 1 quantitatively compares well with a similar device fabricated on a superior hexagonal boron-nitride substrate. This result underlines the importance of non-substrate related extrinsic disorder sources and emphasizes the cleanliness of our lithography process.
Superconductor-graphene quantum dot hybrid structures employing Nb and Al electrodes were successfully fabricated from a lithography point of view, yet no evidence of any superconducting related effect was found in transport measurements. We assign the missing observation to interface issues that require careful analysis and likely a revision of the fabrication process.
A property equally important in graphene Josephson Junctions and quantum dots is the electronic quality of the device, as has been addressed in the previous paragraphs. It turns out that the \(\rm{SiO}_{2}\;\) substrate and lithography residues constitute the two major sources of disorder in graphene. In chapter 5 we present an approach based on the original work of Dean et al. who utilize hexagonal-Boron nitride as a replacement substrate for \(\rm{SiO}_{2}\). This idea was then extended by Wang et al. who also used this material as a shield to protect the graphene surface from contaminations during the lithography process. These structures are commonly referred to as van der Waals heterostructures and are assembled by stacking individual crystals on top of each other.
For this purpose we build a mechanical transfer system based on an optical microscope equipped with an additional micro-manipulator stage allowing precise alignment of two micrometer sized crystals with high precision. We demonstrate the functionality of this setup on the basis of successfully fabricated heterostructures. Furthermore a variation on the traditional method for single graphene/boron nitride structures is presented. Based on a reversed stacking order this method yields large areas of homogeneous graphene, however it comes with the drawback of limited yields. A common type of problem accompanying the fabrication of encapsulated graphene structures is the formation of contamination spots (also referred to as bubbles in the literature) at the interfaces between BN and graphene. We experience similar issues which we are unable to prevent and thus pose a limit to the maximum available device size. In the next step we develop a full lithography paradigm including high-resolution device patterning by electron beam lithography combined with reactive ion etching and two different ways to establish electrical contact to the encapsulated graphene flake. In this context we explore the use of three different types of etch masks and find a double layer of PMMA/HSQ best suited for our purposes. Our low power plasma etch process utilizes a combination of \(\rm{O}_{2}\;\) and \(\rm{CHF}_{3}\;\) and is optimized to show reproducible etch results.
A widely used method for electrical contacts relies on one-dimensional edge contacts whose functionality crucially depends on the use of Cr as the interface layer. For compatibility reasons with superconducting materials, e.g. Nb, we develop a self-aligned contact process that instead of only Cr is also compatible with Ti. We achieve this by modifying the plasma etch parameters such that the etch process exhibits extremely low graphene etch rates while keeping a high etch rate for h-BN. This allows clearing of a narrow stripe of graphene at the edge of the structure by using a thick PMMA layer as etch mask as replacement of the PMMA/HSQ combination. The purpose of this PMMA mask is two-fold since it also serves as lift-off mask during metalization.
The quality of the edge contacts fabricated with either method is excellent as determined from transport measurements at room and cryogenic temperatures. With typical contact resistances of a few hundred \({\rm \,}\Omega\mu{\rm m}\) and a record low of \(100{\rm \,}\Omega\mu{\rm m}\) the contacts can be considered to be state-of-the-art. The positive effect of encapsulation on the electronic quality is confirmed on a device exhibiting charge carrier mobilities exceeding \(10^5{\rm \,cm^2/Vs}\), one magnitude larger than what is commonly achieved on \(\rm{SiO}_{2}\).
The investigation of induced superconductivity in graphene Josephson Junctions, quantum dots, and high mobility heterostructures underlines the versatility of this material system, while covering only a tiny fraction of its prospects. Combination of the acquired knowledge regarding the physical effects and the developed lithography processes lay the foundation towards the fabrication and study of novel graphene hybrid devices.
The present thesis “Hot spin carriers in cold semiconductors” investigates hot carrier effects in low-temperature photoinduced magneto-optical Kerr effect (MOKE) microscopy of electron spins in semiconductor heterostructures. Our studies reveal that the influence of hot photocarriers in magneto-optical pump-probe experiments is twofold.
First, it is commonly assumed that a measurement of the local Kerr rotation using an arbitrary probe wavelength maps the local electron spin polarization. This is the fundamental assumption that underlies the widely used two-color MOKE microscopy technique. Our continuous-wave (cw) spectroscopy experiments demonstrate that this assumption is not correct.
At low lattice temperatures the nonresonant spin excitation by the focused pump laser inevitably leads to a strong heating of the electron system. This heating, in turn, locally modifies the magneto-optical coefficient which links the experimentally observed Kerr rotation to the electron spin polarization. As a consequence, the spin-induced local Kerr rotation is augmented by spin-unrelated changes in the magneto-optical coefficient. A spatially resolved measurement of the Kerr rotation then does not correctly map the electron spin polarization profile.
We demonstrate different ways to overcome this limitation and to correctly measure the electron spin profile. For cw spectroscopy we show how the true local electron spin polarization can be obtained from a quantitative analysis of the full excitonic Kerr rotation spectrum. Alternatively, picosecond MOKE microscopy using a spectrally broad probe laser pulse mitigates hot-carrier effects on the magneto-optical spin detection and allows to directly observe the time-resolved expansion of optically excited electron spin packets in real-space.
Second, we show that hot photocarriers strongly modify the spin diffusion process. Owing to their high kinetic energy, hot carriers greatly enhance the electron spin diffusion coefficient with respect to the intrinsic value of the undisturbed system. Therefore, for steady-state excitation the spin diffusivity is strongly enhanced close to the pump spot center where hot electrons are present. Similarly, for short delays following pulsed excitation the high initial temperature of the electrons leads to a very fast initial expansion of the spin packet which gradually slows as the electrons cool down to the lattice temperature.
While few previous publications have recognized the possible influence of hot carriers on the electron spin transport properties, the present work is the first to directly observe and quantify such hot carrier contributions. We develop models which for steady-state and pulsed excitation quantitatively describe the experimentally observed electron spin diffusion. These models are capable of separating the intrinsic spin diffusivity from the hot electron contribution, and allow to obtain spin transport parameters of the undisturbed system.
We perform extensive cw and time-resolved spectroscopy studies of the lattice temperature dependence of the electron spin diffusion in bulk GaAs. Using our models we obtain a consistent set of parameters for the intrinsic temperature dependence of the electron spin diffusion coefficient and spin relaxation time and the hot carrier contributions which quantitatively describes all experimental observations. Our analysis unequivocally demonstrates that we have, as we believe for the first time, arrived at a coherent understanding of photoinduced low-temperature electron spin diffusion in bulk semiconductors.
This thesis describes the epitaxial growth of the Half-Heusler alloy NiMnSb by molecular beam epitaxy. Its structural and magnetic properties are controlled by tuning the composition and the resulting small deviation from stoichiometry. The magnetic in-plane anisotropy depends on the Mn concentration of the sample and can be controlled in both strength and orientation. This control of the magnetic anisotropy allows for growing NiMnSb layers of a given thickness and magnetic properties as requested for the design of NiMnSb-based devices. The growth and characterization of NiMnSb-ZnTe-NiMnSb heterostructures is presented - such heterostructures form an all-NiMnSb based spin-valve and are a promising basis for spin torque devices.
Due to their complex chemical structure transition metal oxides display many fascinating properties which conventional semiconductors lack.
For this reason transition metal oxides hold a lot of promise for novel electronic functionalities.
Just as in conventional semiconductor heterostructures, the interfaces between different materials play a key role in oxide electronics.
The textbook example is the (001) interface between the band insulators LaAlO\(_3\) and SrTiO\(_3\) at which a two-dimensional electron system (2DES) forms.
In order to utilize such a 2DES in prospective electronic devices, it is vital that the electronic properties of the interface can be controlled and manipulated at will.
Employing photoelectron spectroscopy as well as electronic transport measurements, this thesis examines how such interface engineering can be realized in the case of the LaAlO\(_3\)/SrTiO\(_3\) heterostructure:
By photoemission we manage to unambiguously distinguish the different mechanisms by which SrTiO\(_3\) can be doped with electrons.
An electronic reconstruction is identified as the driving mechanism to render stoichiometric LaAlO\(_3\)/SrTiO\(_3\) interfaces metallic.
The doping of the LaAlO\(_3\)/SrTiO\(_3\) heterointerface can furthermore be finely adjusted by changing the oxygen vacancy \(V_{\mathrm{O}}\) concentration in the heterostructure.
Combining intense x-ray irradiation with oxygen dosing, we even achieve control over the \(V_{\mathrm{O}}\) concentration and, consequently, the doping in the photoemission experiment itself.
Exploiting this method, we investigate how the band diagram of SrTiO\(_3\)-based heterostructures changes as a function of the \(V_{\mathrm{O}}\) concentration and temperature by hard x-ray photoemission spectroscopy.
With the band bending in the SrTiO\(_3\) substrate changing as a function of the \(V_{\mathrm{O}}\) concentration, the interfacial band alignment is found to vary as well.
The relative permittivity of the SrTiO\(_3\) substrate and, in particular, its dependence on temperature and electric field is identified as one of the essential parameters determining the electronic interface properties.
That is also why the sample temperature affects the charge carrier distribution.
The mobile charge carriers are shown to shift toward the SrTiO\(_3\) bulk when the sample temperature is lowered.
This effect is, however, only pronounced if the total charge carrier concentration is small.
At high charge carrier concentrations the charge carriers are always confined to the interface, independent of the sample temperature.
The dependence of the electronic interface properties on the \(V_{\mathrm{O}}\) concentration is also investigated by a complementary method, viz. by electronic transport measurements.
These experiments confirm that the mobile charge carrier concentration increases concomitantly to the \(V_{\mathrm{O}}\) concentration.
The mobility of the charge carriers changes as well depending on the \(V_{\mathrm{O}}\) concentration.
Comparing spectroscopy and transport results, we are able to draw conclusions about the processes limiting the mobility in electronic transport.
We furthermore build a memristor device from our LaAlO\(_3\)/SrTiO\(_3\) heterostructures and demonstrate how interface engineering is used in practice in such novel electronic applications.
This thesis furthermore investigates how the electronic structure of the 2DES is affected by the interface topology:
We show that, akin to the (001) LaAlO\(_3\)/SrTiO\(_3\) heterointerface, an electronic reconstruction also renders the (111) interface between LaAlO\(_3\) and SrTiO\(_3\) metallic.
The change in interface topology becomes evident in the Fermi surface of the buried 2DES which is probed by soft x-ray photoemission.
Based on the asymmetry in the Fermi surface, we estimate the extension of the conductive layer in the (111)-oriented LaAlO\(_3\)/SrTiO\(_3\) heterostructure.
The spectral function measured furthermore identifies the charge carriers at the interface as large polarons.
The contribution of the present thesis consists of three parts. They are centered around investigating certain semiconductor heterointerfaces relevant to spin injection, exploring novel, diluted magnetic single barrier tunneling structures, and further developing diluted magnetic II-VI resonant tunneling diodes.