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Due to their complex chemical structure transition metal oxides display many fascinating properties which conventional semiconductors lack.
For this reason transition metal oxides hold a lot of promise for novel electronic functionalities.
Just as in conventional semiconductor heterostructures, the interfaces between different materials play a key role in oxide electronics.
The textbook example is the (001) interface between the band insulators LaAlO\(_3\) and SrTiO\(_3\) at which a two-dimensional electron system (2DES) forms.
In order to utilize such a 2DES in prospective electronic devices, it is vital that the electronic properties of the interface can be controlled and manipulated at will.
Employing photoelectron spectroscopy as well as electronic transport measurements, this thesis examines how such interface engineering can be realized in the case of the LaAlO\(_3\)/SrTiO\(_3\) heterostructure:
By photoemission we manage to unambiguously distinguish the different mechanisms by which SrTiO\(_3\) can be doped with electrons.
An electronic reconstruction is identified as the driving mechanism to render stoichiometric LaAlO\(_3\)/SrTiO\(_3\) interfaces metallic.
The doping of the LaAlO\(_3\)/SrTiO\(_3\) heterointerface can furthermore be finely adjusted by changing the oxygen vacancy \(V_{\mathrm{O}}\) concentration in the heterostructure.
Combining intense x-ray irradiation with oxygen dosing, we even achieve control over the \(V_{\mathrm{O}}\) concentration and, consequently, the doping in the photoemission experiment itself.
Exploiting this method, we investigate how the band diagram of SrTiO\(_3\)-based heterostructures changes as a function of the \(V_{\mathrm{O}}\) concentration and temperature by hard x-ray photoemission spectroscopy.
With the band bending in the SrTiO\(_3\) substrate changing as a function of the \(V_{\mathrm{O}}\) concentration, the interfacial band alignment is found to vary as well.
The relative permittivity of the SrTiO\(_3\) substrate and, in particular, its dependence on temperature and electric field is identified as one of the essential parameters determining the electronic interface properties.
That is also why the sample temperature affects the charge carrier distribution.
The mobile charge carriers are shown to shift toward the SrTiO\(_3\) bulk when the sample temperature is lowered.
This effect is, however, only pronounced if the total charge carrier concentration is small.
At high charge carrier concentrations the charge carriers are always confined to the interface, independent of the sample temperature.
The dependence of the electronic interface properties on the \(V_{\mathrm{O}}\) concentration is also investigated by a complementary method, viz. by electronic transport measurements.
These experiments confirm that the mobile charge carrier concentration increases concomitantly to the \(V_{\mathrm{O}}\) concentration.
The mobility of the charge carriers changes as well depending on the \(V_{\mathrm{O}}\) concentration.
Comparing spectroscopy and transport results, we are able to draw conclusions about the processes limiting the mobility in electronic transport.
We furthermore build a memristor device from our LaAlO\(_3\)/SrTiO\(_3\) heterostructures and demonstrate how interface engineering is used in practice in such novel electronic applications.
This thesis furthermore investigates how the electronic structure of the 2DES is affected by the interface topology:
We show that, akin to the (001) LaAlO\(_3\)/SrTiO\(_3\) heterointerface, an electronic reconstruction also renders the (111) interface between LaAlO\(_3\) and SrTiO\(_3\) metallic.
The change in interface topology becomes evident in the Fermi surface of the buried 2DES which is probed by soft x-ray photoemission.
Based on the asymmetry in the Fermi surface, we estimate the extension of the conductive layer in the (111)-oriented LaAlO\(_3\)/SrTiO\(_3\) heterostructure.
The spectral function measured furthermore identifies the charge carriers at the interface as large polarons.
Graphene-based single-electron and hybrid devices, their lithography, and their transport properties
(2016)
This work explores three different aspects of graphene, a single-layer of carbon atoms arranged in a hexagonal lattice, with regards to its usage in future electronic devices; for instance in the context of quantum information processing. For a long time graphene was believed to be thermodynamically unstable. The discovery of this strictly two-dimensional material completed the family of carbon based structures, which had already been subject of intensive research with focus on zero-dimensional fullerenes and one-dimensional carbon nanotubes. Within only a few years of its discovery, the field of graphene related research has grown into one of today’s most diverse and prolific areas in condensed matter physics, highlighted by the award of the 2010 Nobel Prize in Physics to A.K. Geim and K. Noveselov for “their groundbreaking experiments regarding the two-dimensional material graphene”.
From the point of view of an experimental physicist interested in the electronic properties of a material system, the most intriguing characteristic of graphene is found in the Dirac-like nature of its charge carriers, a peculiar fact that distinguishes graphene from all other known standard semiconductors. The dynamics of charge carriers close to zero energy are described by a linear energy dispersion relation, as opposed to a parabolic one, which can be understood as a result of the underlying lattice symmetry causing them to behave like massless relativistic particles. This fundamentally different behavior can be expected to lead to the observation of completely new phenomena or the occurrence of deviations in well-known effects.
Following a brief introduction of the material system in chapter 2, we present our work studying the effect of induced superconductivity in mesoscopic graphene Josephson junctions by proximity to superconducting contacts in chapter 3. We explore the use of Nb as the superconducting material driven by the lack of high critical temperature and high critical magnetic field superconductor technology in graphene devices at that time. Characterization of sputter-deposited Nb films yield a critical transition temperature of \(T_{C}\sim 8{\rm \,mK}\). A prerequisite for successful device operation is a high interface quality between graphene and the superconductor. In this context we identify the use of an Ti as interfacial layer and incorporate its use by default in our lithography process. Overall we are able to increase the interface transparency to values as high as \(85\%\). With the prospect of interesting effects in the ballistic regime we try to enhance the electronic quality of our Josephson junction devices by substrate engineering, yet with limited success. We achieve moderate charge carrier mobilities of up to \(7000{\rm \,cm^2/Vs}\) on a graphene/Boron-nitride heterostructure (fabrication details are covered in chapter 5) putting the junction in the diffusive regime (\(L_{device}<L_{\rm{mfp}}\)). We speculate that either inhomogeneities in the graphene channel or lithography residues are responsible for this observation.
Furthermore we study the Josephson effect and Andreev reflection related physics in this device by low-temperature transport measurements. The junction carries a bipolar supercurrent which remains finite at the charge neutrality point. The genuine Josephson character is confirmed by the modulation of the supercurrent as a function of an out-of-plane magnetic field resembling that of a Fraunhofer-like pattern. This is further supported by the response of the junction to microwave radiation in the form of Shaprio steps. Surprisingly we find a strongly reduced superconducting energy gap of approximately \(\Delta = 400{\rm \,\mu eV}\) by quantitatively analyzing data of multiple Andreev reflections. We show this result to be consistent by careful analysis of the device parameters and comparison of these to a theoretical model. More experiments will be needed to determine the origin of this reduction and if the presence of the Ti interfacial layer plays an important role in that.
With regards to possible usability of superconducting contacts in more complex hybrid structures we can conclude that our work establishes the necessary preconditions while still leaving room for improvements; especially in terms of device quality.
In the second part of this work we are primarily interested in electrical transport properties of graphene nanodevices and their application in graphene-superconductor hybrid structures. The fact that graphene is mechanically stable down to a few tens of nanometers in width while exhibiting a finite conductance makes it an appealing choice as host for single-electron devices, also known as quantum dots. Our work on this topic is covered in chapter 4 where we first develop a high-resolution lithography process for the fabrication of single electron devices with critical feature sizes of roughly \(50{\rm \,nm}\). To this end we use a resist etch mask in combination with a reactive-ion etch process for device patterning. Carrier confinement in graphene is known to be hindered by the Klein tunneling phenomenon, a challenge that can be overcome by using all-graphene nano-constrictions to decouple the source and drain contacts from the central island.
The traditionally used constriction design is comprised of long and narrow connections. We argue that a design with very short and narrow constrictions could be beneficial for the quantum dot performance as the length merely affects the overall conductance and requires extended side-gates to control their transmission. We confirm the functionality of two different devices in low-temperature measurements, which differ in the size of their central island with \(d=250{\rm \,nm}\) for device no. 1 and \(d=400{\rm \,nm}\) for device no. 2. Coulomb blockade measurements conducted at \(20{\rm \,mK}\) on both devices reveal clear sequences of Coulomb peaks with amplitudes of up to \(0.8\rm{\,e}^2/\rm{h}\), a value significantly larger than what is commonly reported for similar devices. We interpret this as an indication of rather homogeneous constrictions, resulting from the modified design. Coulomb diamond measurements display the behavior expected for a lithographically designed single quantum dot revealing no features related to the presence of an additional dot. Using the stability diagram we determine the addition energies of the two dots and find them to be in good agreement with values reported in the literature for devices of similar size. Using the normalized Coulomb peak spacing as a figure of merit for the device quality we find that device no. 1 quantitatively compares well with a similar device fabricated on a superior hexagonal boron-nitride substrate. This result underlines the importance of non-substrate related extrinsic disorder sources and emphasizes the cleanliness of our lithography process.
Superconductor-graphene quantum dot hybrid structures employing Nb and Al electrodes were successfully fabricated from a lithography point of view, yet no evidence of any superconducting related effect was found in transport measurements. We assign the missing observation to interface issues that require careful analysis and likely a revision of the fabrication process.
A property equally important in graphene Josephson Junctions and quantum dots is the electronic quality of the device, as has been addressed in the previous paragraphs. It turns out that the \(\rm{SiO}_{2}\;\) substrate and lithography residues constitute the two major sources of disorder in graphene. In chapter 5 we present an approach based on the original work of Dean et al. who utilize hexagonal-Boron nitride as a replacement substrate for \(\rm{SiO}_{2}\). This idea was then extended by Wang et al. who also used this material as a shield to protect the graphene surface from contaminations during the lithography process. These structures are commonly referred to as van der Waals heterostructures and are assembled by stacking individual crystals on top of each other.
For this purpose we build a mechanical transfer system based on an optical microscope equipped with an additional micro-manipulator stage allowing precise alignment of two micrometer sized crystals with high precision. We demonstrate the functionality of this setup on the basis of successfully fabricated heterostructures. Furthermore a variation on the traditional method for single graphene/boron nitride structures is presented. Based on a reversed stacking order this method yields large areas of homogeneous graphene, however it comes with the drawback of limited yields. A common type of problem accompanying the fabrication of encapsulated graphene structures is the formation of contamination spots (also referred to as bubbles in the literature) at the interfaces between BN and graphene. We experience similar issues which we are unable to prevent and thus pose a limit to the maximum available device size. In the next step we develop a full lithography paradigm including high-resolution device patterning by electron beam lithography combined with reactive ion etching and two different ways to establish electrical contact to the encapsulated graphene flake. In this context we explore the use of three different types of etch masks and find a double layer of PMMA/HSQ best suited for our purposes. Our low power plasma etch process utilizes a combination of \(\rm{O}_{2}\;\) and \(\rm{CHF}_{3}\;\) and is optimized to show reproducible etch results.
A widely used method for electrical contacts relies on one-dimensional edge contacts whose functionality crucially depends on the use of Cr as the interface layer. For compatibility reasons with superconducting materials, e.g. Nb, we develop a self-aligned contact process that instead of only Cr is also compatible with Ti. We achieve this by modifying the plasma etch parameters such that the etch process exhibits extremely low graphene etch rates while keeping a high etch rate for h-BN. This allows clearing of a narrow stripe of graphene at the edge of the structure by using a thick PMMA layer as etch mask as replacement of the PMMA/HSQ combination. The purpose of this PMMA mask is two-fold since it also serves as lift-off mask during metalization.
The quality of the edge contacts fabricated with either method is excellent as determined from transport measurements at room and cryogenic temperatures. With typical contact resistances of a few hundred \({\rm \,}\Omega\mu{\rm m}\) and a record low of \(100{\rm \,}\Omega\mu{\rm m}\) the contacts can be considered to be state-of-the-art. The positive effect of encapsulation on the electronic quality is confirmed on a device exhibiting charge carrier mobilities exceeding \(10^5{\rm \,cm^2/Vs}\), one magnitude larger than what is commonly achieved on \(\rm{SiO}_{2}\).
The investigation of induced superconductivity in graphene Josephson Junctions, quantum dots, and high mobility heterostructures underlines the versatility of this material system, while covering only a tiny fraction of its prospects. Combination of the acquired knowledge regarding the physical effects and the developed lithography processes lay the foundation towards the fabrication and study of novel graphene hybrid devices.
This thesis describes the epitaxial growth of the Half-Heusler alloy NiMnSb by molecular beam epitaxy. Its structural and magnetic properties are controlled by tuning the composition and the resulting small deviation from stoichiometry. The magnetic in-plane anisotropy depends on the Mn concentration of the sample and can be controlled in both strength and orientation. This control of the magnetic anisotropy allows for growing NiMnSb layers of a given thickness and magnetic properties as requested for the design of NiMnSb-based devices. The growth and characterization of NiMnSb-ZnTe-NiMnSb heterostructures is presented - such heterostructures form an all-NiMnSb based spin-valve and are a promising basis for spin torque devices.
The present thesis “Hot spin carriers in cold semiconductors” investigates hot carrier effects in low-temperature photoinduced magneto-optical Kerr effect (MOKE) microscopy of electron spins in semiconductor heterostructures. Our studies reveal that the influence of hot photocarriers in magneto-optical pump-probe experiments is twofold.
First, it is commonly assumed that a measurement of the local Kerr rotation using an arbitrary probe wavelength maps the local electron spin polarization. This is the fundamental assumption that underlies the widely used two-color MOKE microscopy technique. Our continuous-wave (cw) spectroscopy experiments demonstrate that this assumption is not correct.
At low lattice temperatures the nonresonant spin excitation by the focused pump laser inevitably leads to a strong heating of the electron system. This heating, in turn, locally modifies the magneto-optical coefficient which links the experimentally observed Kerr rotation to the electron spin polarization. As a consequence, the spin-induced local Kerr rotation is augmented by spin-unrelated changes in the magneto-optical coefficient. A spatially resolved measurement of the Kerr rotation then does not correctly map the electron spin polarization profile.
We demonstrate different ways to overcome this limitation and to correctly measure the electron spin profile. For cw spectroscopy we show how the true local electron spin polarization can be obtained from a quantitative analysis of the full excitonic Kerr rotation spectrum. Alternatively, picosecond MOKE microscopy using a spectrally broad probe laser pulse mitigates hot-carrier effects on the magneto-optical spin detection and allows to directly observe the time-resolved expansion of optically excited electron spin packets in real-space.
Second, we show that hot photocarriers strongly modify the spin diffusion process. Owing to their high kinetic energy, hot carriers greatly enhance the electron spin diffusion coefficient with respect to the intrinsic value of the undisturbed system. Therefore, for steady-state excitation the spin diffusivity is strongly enhanced close to the pump spot center where hot electrons are present. Similarly, for short delays following pulsed excitation the high initial temperature of the electrons leads to a very fast initial expansion of the spin packet which gradually slows as the electrons cool down to the lattice temperature.
While few previous publications have recognized the possible influence of hot carriers on the electron spin transport properties, the present work is the first to directly observe and quantify such hot carrier contributions. We develop models which for steady-state and pulsed excitation quantitatively describe the experimentally observed electron spin diffusion. These models are capable of separating the intrinsic spin diffusivity from the hot electron contribution, and allow to obtain spin transport parameters of the undisturbed system.
We perform extensive cw and time-resolved spectroscopy studies of the lattice temperature dependence of the electron spin diffusion in bulk GaAs. Using our models we obtain a consistent set of parameters for the intrinsic temperature dependence of the electron spin diffusion coefficient and spin relaxation time and the hot carrier contributions which quantitatively describes all experimental observations. Our analysis unequivocally demonstrates that we have, as we believe for the first time, arrived at a coherent understanding of photoinduced low-temperature electron spin diffusion in bulk semiconductors.
The contribution of the present thesis consists of three parts. They are centered around investigating certain semiconductor heterointerfaces relevant to spin injection, exploring novel, diluted magnetic single barrier tunneling structures, and further developing diluted magnetic II-VI resonant tunneling diodes.
Within the scope of this thesis two main topics have been investigated: the examination of micromagnetic sensors and transport of massive and massless Dirac fermions in HgTe quantum wells. For the investigation of localized, inhomogeneous magnetic fields, the fabrication and characterization of two different non-invasive and ultra sensitive sensors has been established at the chair ”Experimentelle Physik” of the University of Würzburg. The first sensor is based on the young technique named micro-Hall magnetometry. The necessary semiconductor devices (Hall cross structures) were fabricated by high-resolution electron beam lithography based on two different two dimensional electron gases (2DEGs), namely InAs/(Al,Ga)Sb- and HgTe/(Hg,Cd)Te- heterostructures. The characteristics have been examined in two different ways. Measurements in homogeneous magnetic fields served for characterization of the sensors, whereas the investigation of artificially produced sub-µm magnets substantiates the suitability of the devices for the study of novel nanoscale magnetic materials (e.g. nanowires). Systematic experiments with various magnets are in accordance with the theory of single-domain particles and anisotropic behavior due to shapes with high aspect ratio. The highest sensitivity for strongly localized fields was obtained at T = 4.2 K for a (200x200) nm^2 Hall cross - made from shallow, high mobility HgTe 2DEG. Although the field resolution was merely δB ≈ 100 µT, the nanoscale sensor size yields an outstanding flux resolution of δΦ = 2 10^(−3) Φ0, where Φ0 = h/2e is the flux quantum. Translating this result in terms of magnetic moment, the sensitivity allows for the detection of magnetization changes of a particle centered on top of the sensor as low as δM ≈ 10^2 µB, with the magnetic moment of a single electron µB, the Bohr magneton. The further examination of a permalloy nanomagnet with a cross-section of (100x20) nm^2 confirms the expected resolution ability, extracted from the noise of the sensor. The observed high signal-to-noise ratio validates the detection limit of this sensor in terms of geometry. This would be reached for a magnet (same material) with quadratic cross-section for an edge length of 3.3 nm. Moreover, the feasibility of this sensor for operation in a wide temperature range (T = mK... > 200 K) and high magnetic fields has been confirmed. The second micromagnetic sensor is the micro-SQUID (micro-Superconducting-QUantum-Interference-Device) based on niobium. The typical sensor area of the devices built in this work was (1.0x1.0) µm^2, with constrictions of about 20 nm. The characterization of this device demonstrates an amazing field sensitivity (regarding its size) of δB < 1 µT. Even though the sensor was 25 times larger than the best micro-Hall sensor, it provided an excellent flux resolution in the order of δΦ ≈ 5 10^(−4) Φ0 and a similar magnetic moment resolution of δM ≈ 10^2 µB. Furthermore, the introduction of an ellipsoidal permalloy magnet (axes: 200 nm and 400 nm, thickness 30 nm) substantiates the suitability for the detection of minuscule, localized magnetic fields. The second part of the thesis deals with the peculiar transport properties of HgTe quantum wells. These rely on the linear contribution to the band structure inherent to the heterostructure. Therefore the system can be described by an effective Dirac Hamiltonian, whose Dirac mass is tunable by the variation of the quantum well thickness. By fabrication and characterization of a systematical series of substrates, a system with vanishing Dirac mass (zero energy gap) has been confirmed. This heterostructure therefore resembles graphene (a monolayer of graphite), with the difference of exhibiting only one valley in the energy dispersion of the Brillouin zone. Thus parasitical intervalley scattering cannot occur. The existence of this system has been proven by the agreement of theoretical predictions, based on widely accepted band structure calculations with the experiment (Landau level dispersion, conductivity). Furthermore, another particularity of the band structure - the transition from linear to parabolic character - has been illustrated by the widths of the plateaus in the quantum Hall effect. Finally, the transport of ”massive” Dirac fermions (with finite Dirac mass) is investigated. In particular the describing Dirac Hamiltonian induces weak localization effects depending on the Dirac mass. This mechanism has not been observed to date, and survives in higher temperatures compared to typical localization mechanisms.
Oxide heterostructures attract a lot of attention as they display a vast range of physical phenomena like conductivity, magnetism, or even superconductivity. In most cases, these effects are caused by electron correlations and are therefore interesting for studying fundamental physics, but also in view of future applications. This thesis deals with the growth and characterization of several prototypical oxide heterostructures. Fe3O4 is highly ranked as a possible spin electrode in the field of spintronics. A suitable semiconductor for spin injection in combination with Fe3O4 is ZnO due to its oxide character and a sufficiently long spin coherence length. Fe3O4 has been grown successfully on ZnO using pulsed laser deposition and molecular beam epitaxy by choosing the oxygen partial pressure adequately. Here, a pressure variation during growth reduces an FeO-like interface layer. Fe3O4 films grow in an island-like growth mode and are structurally nearly fully relaxed, exhibiting the same lattice constants as the bulk materials. Despite the presence of a slight oxygen off-stoichiometry, indications of the Verwey transition hint at high-quality film properties. The overall magnetization of the films is reduced compared to bulk Fe3O4 and a slow magnetization behavior is observed, most probably due to defects like anti-phase boundaries originating from the initial island growth. LaAlO3/SrTiO3 heterostructures exhibit a conducting interface above a critical film thickness, which is most likely explained by an electronic reconstruction. In the corresponding model, the potential built-up owing to the polar LaAlO3 overlayer is compensated by a charge transfer from the film surface to the interface. The properties of these heterostructures strongly depend on the growth parameters. It is shown for the first time, that it is mainly the total pressure which determines the macroscopic sample properties, while it is the oxygen partial pressure which controls the amount of charge carriers near the interface. Oxygen-vacancy-mediated conductivity is found for too low oxygen pressures. A too high total pressure, however, destroys interface conductivity, most probably due to a change of the growth kinetics. Post-oxidation leads to a metastable state removing the arbitrariness in controlling the electronic interface properties by the oxygen pressure during growth. LaVO3/SrTiO3 heterostructures exhibit similar behavior compared to LaAlO3/SrTiO3 when it comes to a thickness-dependent metal-insulator transition. But in contrast to LaAlO3, LaVO3 is a Mott insulator exhibiting strong electron correlations. Films have been grown by pulsed laser deposition. Layer-by-layer growth and a phase-pure pervoskite lattice structure is observed, indicating good structural quality of the film and the interface. An electron-rich layer is found near the interface on the LaVO3 side for conducting LaVO3/SrTiO3. This could be explained by an electronic reconstruction within the film. The electrostatic doping results in a band-filling-controlled metal-insulator transition without suffering from chemical impurities, which is unavoidable in conventional doping experiments.
In this work heterostructures based on the half-Heusler alloy NiMnSb have been fabricated and characterized. NiMnSb is a member of the half-metallic ferromagnets, which exhibit an electron spin-polarization of 100% at the Fermi-level. For fabrication of these structures InP substrates with surface orientations of (001),(111)A and (111)B have been used. The small lattice mismatch of NiMnSb to InP allows for pseudomorphic layers, the (111) orientation additionally makes the formation of a half-metallic interface possible. For the growth on InP(001), procedures for the substrate preparation, growth of the lattice matched (In,Ga)As buffer layer and of the NiMnSb layer have been developed. The effect of flux-ratios and substrate temperatures on the MBE growth of the buffer as well as of the NiMnSb layer have been investigated and the optimum conditions have been pointed out. NiMnSb grows in the layer-by-layer Frank-van der Merwe growth mode, which can be seen by the intensity oscillations of the RHEED specular spot during growth. RHEED and LEED measurements show a flat surface and a well-defined surface reconstruction. High resolution x-ray measurements support this statement, additionally they show a high crystalline quality. Measurements of the lateral and the vertical lattice constant of NiMnSb films on (001) oriented substrates show that layers above a thickness of 20nm exhibit a pseudomorphic as well as a relaxed part in the same layer. Whereas layers around 40nm show partly relaxed partitions, these partitions are totally relaxed for layers above 100nm. However, even these layers still have a pseudomorphic part. Depth-dependent x-ray diffraction experiments prove that the relaxed part of the samples is always on top of the pseudomorphic part. The formation and propagation of defects in these layers has been investigated by TEM. The defects nucleate early during growth and spread until they form a defect network at a thickness of about 40nm. These defects are not typical misfit dislocations but rather antiphase boundaries which evolve in the Mn/Sb sublattice of the NiMnSb system. Dependent on the thickness of the NiMnSb films different magnetic anisotropies can be found. For layers up to 15nm and above 25nm a clear uniaxial anisotropy can be determined, while the layers with thicknesses in between show a fourfold anisotropy. Notably the easy axis for the thin layers is perpendicular to the easy axis observed for the thick layers. Thin NiMnSb layers show a very good magnetic homogeneity, as can be seen by the very small FMR linewidth of 20Oe at 24GHz. However, the increase of the linewidth with increasing thickness shows that the extrinsic damping gets larger for thicker samples which is a clear indication for magnetic inhomogeneities introduced by crystalline defects. Also, the magnetic moment of thick NiMnSb is reduced compared to the theoretically expected value. If a antiferromagnetic material is deposited on top of the NiMnSb, a clear exchange biasing of the NiMnSb layer can be observed. In a further step the epitaxial layers of the semiconductor ZnTe have been grown on these NiMnSb layers, which enables the fabrication of NiMnSb/ZnTe/NiMnSb TMR structures. These heterostructures are single crystalline and exhibit a low surface and interface roughness as measured by x-ray reflectivity. Magnetic measurements of the hysteresis curves prove that both NiMnSb layers in these heterostructures can switch separately, which is a necessary requirement for TMR applications. If a NiMn antiferromagnet is deposited on top of this structure, the upper NiMnSb layer is exchange biased by the antiferromagnet, while the lower one is left unaffected. Furthermore the growth of NiMnSb on (111) oriented substrates has been investigated. For these experiments, InP substrates with a surface orientation of (111)A and (111)B were used, which were miscut by 1 to 2° from the exact orientation to allow for smoother surfaces during growth. Both the (In, Ga)As buffer as well as the NiMnSb layer show well defined surface reconstructions during growth. X-ray diffraction experiments prove the single crystalline structure of the samples. However, neither for the growth on (111)A nor on (111)B a perfectly smooth surface could be obtained during growth, which can be attributed to the formation of pyramid-like facets evolving as a result of the atomic configuration at the surface. A similar relaxation behavior as NiMnSb layers on (001) oriented InP could not be observed. RHEED and x-ray diffraction measurements show that above a thickness of about 10nm the NiMnSb layer begins to relax, but remnants of pseudomorphic parts could not be found. Magnetic measurements show that the misorientation of the substrate crystal has a strong influence on the magnetic anisotropies of NiMnSb(111) samples. In all cases a uniaxial anisotropy could be observed. The easy axis is always aligned parallel to the direction of the miscut of the substrate.