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This thesis examines the electronic properties of two materials that promise the realization and observation of novel exotic quantum phenomena. For this purpose, angle-resolved photoemission forms the experimental basis for the investigation of the electronic properties. Furthermore, the magnetic order is investigated utilizing X-ray dichroism measurements.
First, the bulk and surface electronic structure of epitaxially grown HgTe in its three-dimensional topological insulator phase is investigated. In this study, synchrotron radiation is used to address the three-dimensional band structure and orbital composition of the bulk states by employing photon-energy-dependent and polarization-dependent measurements, respectively. In addition, the topological surface state is examined on in situ grown samples using a laboratory photon source. The resulting data provide a means to experimentally localize the bulk band inversion in momentum space and to evidence the momentum-dependent change in the orbital character of the inverted bulk states.
Furthermore, a rather new series of van der Waals compounds, (MnBi\(_2\)Te\(_4\))(Bi\(_2\)Te\(_3\))\(_n\), is investigated. First, the magnetic properties of the first two members of the series, MnBi\(_2\)Te\(_4\) and MnBi\(_4\)Te\(_7\), are studied via X-ray absorption-based techniques. The topological surface state on the two terminations of MnBi\(_4\)Te\(_7\) is analyzed using circular dichroic, photon-energy-dependent, and spin-resolved photoemission. The topological state on the (MnBi\(_2\)Te\(_4\))-layer termination shows a free-standing Dirac cone with its Dirac point located in the bulk band gap. In contrast, on the (Bi\(_2\)Te\(_3\))-layer termination the surface state hybridizes with the bulk valences states, forming a spectral weight gap, and exhibits a Dirac point that is buried within the bulk continuum. Lastly, the lack of unambiguous evidence in the literature showing a temperature-dependent mass gap opening in these magnetic topological insulators is discussed through MnBi\(_2\)Te\(_4\).
After the discovery of three-dimensional topological insulators (TIs), such as tetradymite chalcogenides Bi$_2$Se$_3$, Bi$_2$Te$_3$ and Sb$_2$Te$_3$ – a new class of quantum materials characterized by their unique surface electronic properties – the solid state community got focused on topological states that are driven by strong electronic correlations and magnetism. An important material class is the magnetic TI (MTI) exhibiting the quantum anomalous Hall (QAH) effect, i.e. a dissipationless quantized edge-state transport in the absence of external magnetic field, originating from the interplay between ferromagnetism and a topologically non-trivial band structure. The unprecedented opportunities offered by these new exotic materials open a new avenue for the development of low-dissipation electronics, spintronics, and quantum computation. However, the major concern with QAH effect is its extremely low onset temperature, limiting its practical application. To resolve this problem, a comprehensive understanding of the microscopic origin of the underlying ferromagnetism is necessary.
V- and Cr-doped (Bi,Sb)$_2$Te$_3$ are the two prototypical systems that have been widely studied as realizations of the QAH state. Finding microscopic differences between the strongly correlated V and Cr impurities would help finding a relevant model of ferromagnetic coupling and eventually provide better control of the QAH effect in these systems. Therefore, this thesis first focuses on the V- and Cr-doped (Bi,Sb)$_2$Te$_3$ systems, to better understand these differences. Exploiting the unique capabilities of x-ray absorption spectroscopy and magnetic circular dichroism (XAS/XMCD), combined with advanced modeling based on multiplet ligand-field theory (MLFT), we provide a detailed microscopic insight into the local electronic and magnetic properties of these systems and determine microscopic parameters crucial for the comparison with theoretical models, which include the $d$-shell filling, spin and orbital magnetic moments. We find a strongly covalent ground state, dominated by the superposition of one and two Te-ligand-hole configurations, with a negligible contribution from a purely ionic 3+ configuration. Our findings indicate the importance of the Te $5p$ states for the ferromagnetism in (Bi, Sb)$_2$Te$_3$ and favor magnetic coupling mechanisms involving $pd$-exchange. Using state-of-the-art density functional theory (DFT) calculations in combination with XMCD and resonant photoelectron spectroscopy (resPES), we reveal the important role of the $3d$ impurity states in mediating magnetic exchange coupling. Our calculations illustrate that the kind and strength of the exchange coupling varies with the impurity $3d$-shell occupation. We find a weakening of ferromagnetic properties upon the increase of doping concentration, as well as with the substitution of Bi at the Sb site. Finally, we qualitatively describe the origin of the induced magnetic moments at the Te and Sb sites in the host lattice and discuss their role in mediating a robust ferromagnetism based on a $pd$-exchange interaction scenario. Our findings reveal important clues to designing higher $T_{\text{C}}$ MTIs.
Rare-earth ions typically exhibit larger magnetic moments than transition-metal ions and thus promise the opening of a wider exchange gap in the Dirac surface states of TIs, which is favorable for the realization of the high-temperature QAH effect. Therefore, we have further focused on Eu-doped Bi$_2$Te$_3$ and scrutinized whether the conditions for formation of a substantial gap in this system are present by combining spectroscopic and bulk characterization methods with theoretical calculations. For all studied Eu doping concentrations, our atomic multiplet analysis of the $M_{4,5}$ x-ray absorption and magnetic circular dichroism spectra reveals a Eu$^{2+}$ valence, unlike most other rare earth elements, and confirms a large magnetic moment. At temperatures below 10 K, bulk magnetometry indicates the onset of antiferromagnetic ordering. This is in good agreement with DFT results, which predict AFM interactions between the Eu impurities due to the direct overlap of the impurity wave functions. Our results support the notion of antiferromagnetism coexisting with topological surface states in rare-earth doped Bi$_2$Te$_3$ and corroborate the potential of such doping to result in an antiferromagnetic TI with exotic quantum properties.
The doping with impurities introduces disorder detrimental for the QAH effect, which may be avoided in stoichiometric, well-ordered magnetic compounds. In the last part of the thesis we have investigated the recently discovered intrinsic magnetic TI (IMTI) MnBi$_6$Te$_{10}$, where we have uncovered robust ferromagnetism with $T_{\text{C}} \approx 12$ K and connected its origin to the Mn/Bi intermixing. Our measurements reveal a magnetically intact surface with a large moment, and with FM properties similar to the bulk, which makes MnBi$_6$Te$_{10}$ a promising candidate for the QAH effect at elevated temperatures. Moreover, using an advanced ab initio MLFT approach we have determined the ground-state properties of Mn and revealed a predominant contribution of the $d^5$ configuration to the ground state, resulting in a $d$-shell electron occupation $n_d = 5.31$ and a large magnetic moment, in excellent agreement with our DFT calculations and the bulk magnetometry data. Our results together with first principle calculations based on the DFT-GGA$+U$, performed by our collaborators, suggest that carefully engineered intermixing plays a crucial role in achieving a robust long-range FM order and therefore could be the key for achieving enhanced QAH effect properties.
We expect our findings to aid better understanding of MTIs, which is essential to help increasing the temperature of the QAH effect, thus facilitating the realization of low-power electronics in the future.
Realization and Spectroscopy of the Quantum Spin Hall Insulator Bismuthene on Silicon Carbide
(2022)
Topological matter is one of the most vibrant research fields of contemporary solid state physics since the theoretical prediction of the quantum spin Hall effect in graphene in 2005. Quantum spin Hall insulators possess a vanishing bulk conductivity but symmetry-protected, helical edge states that give rise to dissipationless charge transport.
The experimental verification of this exotic state of matter in 2007 lead to a boost of research activity in this field, inspired by possible ground-breaking future applications.
However, the use of the quantum spin Hall materials available to date is limited to cryogenic temperatures owing to their comparably small bulk band gaps.
In this thesis, we follow a novel approach to realize a quantum spin Hall material with a large energy gap and epitaxially grow bismuthene, i.e., Bi atoms adopting a honeycomb lattice, in a \((\sqrt{3}\times\sqrt{3})\) reconstruction on the semiconductor SiC(0001). In this way, we profit both from the honeycomb symmetry as well as the large spin-orbit coupling of Bi, which, in combination, give rise to a topologically non-trivial band gap on the order of one electronvolt.
An in-depth theoretical analysis demonstrates that the covalent bond between the Si and Bi atoms is not only stabilizing the Bi film but is pivotal to attain the quantum spin Hall phase.
The preparation of high-quality, unreconstructed SiC(0001) substrates sets the basis for the formation of bismuthene and requires an extensive procedure in ultra-pure dry H\(_2\) gas. Scanning tunneling microscopy measurements unveil the (\(1\times1\)) surface periodicity and smooth terrace planes, which are suitable for the growth of single Bi layers by means of molecular beam epitaxy. The chemical configuration of the resulting Bi film and its oxidation upon exposure to ambient atmosphere are inspected with X-ray photoelectron spectroscopy.
Angle-resolved photoelectron spectroscopy reveals the excellent agreement of probed and calculated band structure. In particular, it evidences a characteristic Rashba-splitting of the valence bands at the K point. Scanning tunneling spectroscopy probes signatures of this splitting, as well, and allows to determine the full band gap with a magnitude of \(E_\text{gap}\approx0.8\,\text{eV}\).
Constant-current images and local-density-of-state maps confirm the presence of a planar honeycomb lattice, which forms several domains due to different, yet equivalent, nucleation sites of the (\(\sqrt{3}\times\sqrt{3}\))-Bi reconstruction.
Differential conductivity measurements demonstrate that bismuthene edge states evolve at atomic steps of the SiC substrate. The probed, metallic local density of states is in agreement with the density of states expected from the edge state's energy dispersion found in density functional theory calculations - besides a pronounced dip at the Fermi level.
By means of temperature- and energy-dependent tunneling spectroscopy it is shown that the spectral properties of this suppressed density of states are successfully captured in the framework of the Tomonaga-Luttinger liquid theory and most likely originate from enhanced electronic correlations in the edge channel.
The presented thesis summarizes the results from four and a half years of intense lithography development on (Cd,Hg)Te/HgTe/(Cd,Hg)Te quantum well structures. The effort was motivated by the unique properties of this topological insulator. Previous work from Molenkamp at al.\ has proven that the transport through such a 2D TI is carried by electrons with opposite spin, counter-propagating in 1D channels along the sample edge. However, up to this thesis, the length of quantized spin Hall channels has never been reported to exceed 4 µm. Therefore, the main focus was put on a reproducible and easy-to-handle fabrication process that reveals the intrinsic material parameters.
Every single lithography step in macro as well as microscopic sample fabrication has been re-evaluated. In the Development, the process changes have been presented along SEM pictures, microgaphs and, whenever possible, measurement responses.
We have proven the conventional ion milling etch method to damage the remaining mesa and result in drastically lower electron mobilities in samples of microscopic size.
The novel KI:I2:HBr wet etch method for macro and microstructure mesa fabrication has been shown to leave the crystalline structure intact and result in unprecedented mobilities, as high as in macroscopic characterization Hall bars. Difficulties, such as an irregular etch start and slower etching of the conductive QW have been overcome by concentration, design and etch flow adaptations. In consideration of the diffusive regime, a frame around the EBL write field electrically decouples the structure mesa from the outside wafer. As the smallest structure, the frame is etched first and guarantees a non-different etching of the conductive layer during the redox reaction. A tube-pump method assures reproducible etch results with mesa heights below 300 nm. The PMMA etch mask is easy to strip and leaves a clean mesa with no redeposition. From the very first attempts, to the final etch process, the reader has been provided with the characteristics and design requirements necessary to enable the fabrication of nearly any mesa shape within an EBL write field of 200 µm.
Magneto resistance measurement of feed-back samples have been presented along the development chronology of wet etch method and subsequent lithography steps. With increasing feature quality, more and more physics has been revealed enabling detailed evaluation of smallest disturbances. The following lithography improvements have been implemented. They represent a tool-box for high quality macro and microstructure fabrication on (CdHg)Te/HgTe of almost any kind.
The optical positive resist ECI 3027 can be used as wet and as dry etch mask for structure sizes larger than 1 µm. It serves to etch mesa structures larger than the EBL write field.
The double layer PMMA is used for ohmic contact fabrication within the EBL write field. Its thickness allows to first dry etch the (Cd,Hg)Te cap layer and then evaporate the AuGe contact, in situ and self-aligned. Because of an undercut, up to 300 nm can be metalized without any sidewalls after the lift-off. An edge channel mismatch within the contact leads can be avoided, if the ohmic contacts are designed to reach close to the sample and beneath the later gate electrode.
The MIBK cleaning step prior to the gate application removes PMMA residuals and thereby improves gate and potential homogeneity.
The novel low HfO2-ALD process enables insulator growth into optical and EBL lift-off masks of any resolvable shape. Directly metalized after the insulator growth, the self-aligned method results in thin and homogeneous gate electrode reproducibly withholding gate voltages to +-10 V.
The optical negative resist ARN 4340 exhibits an undercut when developed. Usable as dry etch mask and lift-off resist, it enables an in-situ application of ohmic contacts first etching close to the QW, then metalizing AuGe. Up to 500 nm thickness, the undercut guarantees an a clean lift-off with no sidewalls.
The undertaken efforts have led to micro Hall bar measurements with Hall plateaus and SdH-oszillations in up to now unseen levels of detail.
The gap resistance of several micro Hall bars with a clear QSH signal have been presented in Quantum Spin Hall. The first to exhibit longitudinal resistances close to the expected h/2e2 since years, they reveal unprecedented details in features and characteristics. It has been shown that their protection against backscattering through time reversal symmetry is not as rigid as previously claimed. Values below and above 12.9 kΩ been explained, introducing backscattering within the Landauer-Büttiker formalism of edge channel transport. Possible reasons have been discussed. Kondo, interaction and Rashba-backscattering arising from density inhomogeneities close to the edge are most plausible to explain features on and deviations from a quantized value. Interaction, tunneling and dephasing mechanisms as well as puddle size, density of states and Rashba Fields are gate voltage dependent. Therefore, features in the QSH signal are fingerprints of the characteristic potential landscape.
Stable up to 11 K, two distinct but clear power laws have been found in the higher temperature dependence of the QSH in two samples. However, with ΔR = Tα, α = ¼ in one (QC0285) and α = 2 in the other (Q2745), none of the predicted dependencies could be confirmed. Whereas, the gap resistances of QC0285 remains QSH channel dominated up to 3.9 T and thereby confirmed the calculated lifting of the band inversion in magnetic field. The gate-dependent oscillating features in the QSH signal of Q2745 immediately increase in magnetic field. The distinct field dependencies allowed the assumption of two different dominant backscattering mechanisms.
Resulting in undisturbed magneto transport and unprecedented QSH measurements The Novel Micro Hall Bar Process has proven to enable the fabrication of a new generation of microstructures.
Quantum point contacts (QPCs) are one-dimensional constrictions in an otherwise extended two-dimensional electron or hole system. Since their first realization in GaAs based two-dimensional electron gases, QPCs have become basic building blocks of mesoscopic physics and are used in manifold experimental contexts. A so far unrealized goal however is the implementation of QPCs in the new material class of two-dimensional topological insulators, which host the emergence of the so-called quantum spin Hall (QSH) effect. The latter is characterized by the formation of conducting one-dimensional spin-polarized states at the device edges, while the bulk is insulating. Consequently, an implemented QPC technology can be utilized to bring the QSH edge channels in close spatial proximity, thus for example enabling the study of interaction effects between the edge states. The thesis at hand describes the technological realization as well as the subsequent experimental characterization and analysis of QPCs in a QSH system for the first time.
After an introduction is given in Chapter 1, the subsequent Chapter 2 starts with discussing the peculiar band structure of HgTe. The emergence of the QSH phase for HgTe quantum wells with an inverted band structure is explained. For the band inversion to occur, the quantum wells have to exhibit a well thickness d_QW above a critical value (d_QW > d_c = 6.3 nm). Subsequently, the concept of QPCs is explicated and the corresponding transport behaviour is analytically described. Following the discussion of relevant constraints when realizing a QPC technology in a QSH system, a newly developed lithography process utilizing a multi-step wet etching technique for fabricating QPC devices based on HgTe quantum wells is presented. Transport measurements of exemplary devices show the expected conductance quantization in steps of ΔG ≈ 2e^2/h within the conduction band for a topological as well as for a trivial (d_QW < d_c) QPC. For the topological case, the residual conductance within the bulk band gap saturates at G_QSH ≈ 2e^2/h due to presence of the QSH state, while it drops to G ≈ 0 for the trivial device. Moreover, bias voltage dependent measurements of the differential conductance of an inverted sample provide explicit proof of the unperturbed coexistence of topological and trivial transport modes.
In a next step, Chapter 3 describes the emergence of a QSH interferometer state in narrow QPC devices with a quantum well thickness of d_QW = 7 nm. Presented band structure calculations reveal that the spatial extension of the QSH edge states depends on the position of the Fermi energy within the bulk band gap. As a consequence, reservoir electrons with randomized spin couple to both edge channels with the same probability under certain conditions, thus causing the formation of a QSH ring. A straightforward model capturing and specifying the occurrence of such a QSH interferometer is provided as well as substantiated by two experimental plausibility checks. After relevant quantum phases are theoretically introduced, the discussion of the obtained data reveals the accumulation of an Aharonov-Bohm phase, of a dynamical Aharonov-Casher phase as well as of a spin-orbit Berry phase of π in appropriate QPC devices. These results are consistent with analytic model considerations.
The last part of this thesis, Chapter 4, covers the observation of an unexpected conductance pattern for QPC samples fabricated from quantum wells with d_QW = 10.5 nm. In these devices, an anomalous plateau at G ≈ e^2/h = 0.5 x G_QSH emerges in addition to the QSH phase entailed residual conductance of G_QSH ≈ 2e^2/h. This so-called 0.5 anomaly occurs only for a specific interval of QPC width values, while it starts to get lost for too large sample widths. Furthermore, presented temperature and bias voltage dependent measurements insinuate that the emergence of the 0.5 anomaly is related to a gapped topological state. Additional characterization of this peculiar transport regime is provided by the realization of a novel device concept, which integrates a QPC within a standard Hall bar geometry. The results of the experimental analysis of such a sample link the occurrence of the 0.5 anomaly to a backscattered QSH channel. Thus, following a single particle perspective argumentation, it is reasoned that only one edge channel is transmitted in the context of the 0.5 anomaly. Two theoretic models possibly explaining the emergence of the 0.5 anomaly -- based on electron-electron interactions -- are discussed.
To conclude, the implementation of a working QPC technology in a QSH system represents a paramount development in the context of researching two-dimensional topological insulators and enables a multitude of future experiments. QPC devices realized in a QSH system are for example envisaged to allow for the detection of Majorana fermions and parafermions. Furthermore, the reported formation of a QSH interferometer state in appropriate QPC devices is of high interest. The observed dynamical Aharonov-Casher phase in the QSH regime enables a controllable modulation of the topological conductance, thus providing the conceptual basis for a topological transistor. Moreover, due to the resilience of geometric phases against dephasing, the presence of a spin-orbit Berry phase of π represents a promising perspective with regard to possible quantum computation concepts. Besides that, the transmission of only one QSH edge channel due to the emergence of the 0.5 anomaly is equivalent to 100 % spin polarization, which is an essential ingredient for realizing spintronic applications. Hence, the thesis at hand covers the experimental detection of three effects of fundamental importance in the context of developing new generations of logic devices -- based on QPCs fabricated from topological HgTe quantum wells.
In this thesis, we investigate aspects of the physics of heavy-fermion systems and correlated topological insulators.
We numerically solve the interacting Hamiltonians that model the physical systems using quantum Monte Carlo algorithms
to access both ground-state and finite-temperature observables.
Initially, we focus on the metamagnetic transition in the Kondo lattice model for heavy fermions.
On the basis of the dynamical mean-field theory and the dynamical cluster approximation,
our calculations point towards a continuous transition, where the signatures of metamagnetism are linked to a Lifshitz transition of heavy-fermion bands.
In the second part of the thesis, we study various aspects of magnetic pi fluxes in the Kane-Mele-Hubbard model of a correlated topological insulator.
We describe a numerical measurement of the topological index, based on the localized mid-gap states that are provided by pi flux insertions.
Furthermore, we take advantage of the intrinsic spin degree of freedom of a pi flux to devise instances of interacting quantum spin systems.
In the third part of the thesis, we introduce and characterize the Kane-Mele-Hubbard model on the pi flux honeycomb lattice.
We place particular emphasis on the correlations effects along the one-dimensional boundary of the lattice and
compare results from a bosonization study with finite-size quantum Monte Carlo simulations.
Numerical Simulations of Heavy Fermion Systems: From He-3 Bilayers to Topological Kondo Insulators
(2014)
Even though heavy fermion systems have been studied for a long time, a strong interest in heavy fermions persists to this day. While the basic principles of local moment formation, Kondo effect and formation of composite quasiparticles leading to a Fermi liquid, are under- stood, there remain many interesting open questions. A number of issues arise due to the interplay of heavy fermion physics with other phenomena like magnetism and superconduc- tivity.
In this regard, experimental and theoretical investigations of He-3 can provide valuable insights. He-3 represents a unique realization of a quantum liquid. The fermionic nature of He-3 atoms, in conjunction with the absence of long-range Coulomb repulsion, makes this material an ideal model system to study Fermi liquid behavior.
Bulk He-3 has been investigated for quite some time. More recently, it became possible to prepare and study layered He-3 systems, in particular single layers and bilayers. The pos- sibility of tuning various physical properties of the system by changing the density of He-3 and using different substrate materials makes layers of He-3 an ideal quantum simulator for investigating two-dimensional Fermi liquid phenomenology.
In particular, bilayers of He-3 have recently been found to exhibit heavy fermion behavior. As a function of temperature, a crossover from an incoherent state with decoupled layers to a coherent Fermi liquid of composite quasiparticles was observed. This behavior has its roots in the hybridization of the two layers. The first is almost completely filled and subject to strong correlation effects, while the second layer is only partially filled and weakly correlated. The quasiparticles are formed due to the Kondo screening of localized moments in the first layer by the second-layer delocalized fermions, which takes place at a characteristic temperature scale, the coherence scale Tcoh.
Tcoh can be tuned by changing the He-3 density. In particular, at a certain critical filling,
the coherence scale is expected to vanish, corresponding to a divergence of the quasiparticle effective mass, and a breakdown of the Kondo effect at a quantum critical point. Beyond the critical point, the layers are decoupled. The first layer is a local moment magnet, while the second layer is an itinerant overlayer.
However, already at a filling smaller than the critical value, preempting the critical point, the onset of a finite sample magnetization was observed. The character of this intervening phase remained unclear.
Motivated by these experimental observations, in this thesis the results of model calcula- tions based on an extended Periodic Anderson Model are presented. The three particle ring exchange, which is the dominant magnetic exchange process in layered He-3, is included in the model. It leads to an effective ferromagnetic interaction between spins on neighboring sites. In addition, the model incorporates the constraint of no double occupancy by taking the limit of large local Coulomb repulsion.
By means of Cellular DMFT, the model is investigated for a range of values of the chemical potential µ and inverse temperature β = 1/T . The method is a cluster extension to the Dy- namical Mean-Field Theory (DMFT), and allows to systematically include non-local correla- tions beyond the DMFT. The auxiliary cluster model is solved by a hybridization expansion CTQMC cluster solver, which provides unbiased, numerically exact results for the Green’s function and other observables of interest.
As a first step, the onset of Fermi liquid coherence is studied. At low enough temperature, the self-energy is found to exhibit a linear dependence on Matsubara frequency. Meanwhile, the spin susceptibility crossed over from a Curie-Weiss law to a Pauli law. Both observations serve as fingerprints of the Fermi liquid state.
The heavy fermion state appears at a characteristic coherence scale Tcoh. This scale depends strongly on the density. While it is rather high for small filling, for larger filling Tcoh is increas- ingly suppressed. This involves a decreasing quasiparticle residue Z ∼ Tcoh and an enhanced mass renormalization m∗/m ∼ Tcoh−1. Extrapolation leads to a critical filling, where the co-
herence scale is expected to vanish at a quantum critical point. At the same time, the effective mass diverges. This corresponds to a breakdown of the Kondo effect, which is responsible for the formation of quasiparticles, due to a vanishing of the effective hybridization between the layers.
Taking only single-site DMFT results into account, the above scenario seems plausible. However, paramagnetic DMFT neglects the ring exchange interaction completely. In or- der to improve on this, Cellular DMFT simulations are conducted for small clusters of size Nc = 2 and 3. The results paint a different physical picture. The ring exchange, by favor- ing a ferromagnetic alignment of spins, competes with the Kondo screening. As a result, strong short-range ferromagnetic fluctuations appear at larger values of µ. By lowering the temperature, these fluctuations are enhanced at first. However, for T < Tcoh they are increas- ingly suppressed, which is consistent with Fermi liquid coherence. However, beyond a certain threshold value of µ, fluctuations persist to the lowest temperatures. At the same time, while not apparent in the DMFT results, the total occupation n increases quite strongly in a very narrow range around the same value of µ. The evolution of n with µ is always continuous, but hints at a discontinuity in the limit Nc → ∞. This first-order transition breaks the Kondo effect. Beyond the transition, a ferromagnetic state in the first layer is established, and the second layer becomes a decoupled overlayer.
These observations provide a quite appealing interpretation of the experimental results. As a function of chemical potential, the Kondo breakdown quantum critical point is preempted by a first-order transition, where the layers decouple and the first layer turns into a ferromagnet. In the experimental situation, where the filling can be tuned directly, the discontinuous transition is mirrored by a phase separation, which interpolates between the Fermi liquid ground state at lower filling and the magnetic state at higher filling. This is precisely the range of the intervening phase found in the experiments, which is characterized by an onset of a finite sample magnetization.
Besides the interplay of heavy fermion physics and magnetic exchange, recently the spin- orbit coupling, which is present in many heavy fermion materials, attracted a lot of interest. In the presence of time-reversal symmetry, due to spin-orbit coupling, there is the possibility of a topological ground state.
It was recently conjectured that the energy scale of spin-orbit coupling can become dom- inant in heavy fermion materials, since the coherence scale and quasiparticle bandwidth are rather small. This can lead to a heavy fermion ground state with a nontrivial band topology; that is, a topological Kondo insulator (TKI). While being subject to strong correlation effects, this state must be adiabatically connected to a non-interacting, topological state.
The idea of the topological ground state realized in prototypical Kondo insulators, in par- ticular SmB6, promises to shed light on some of the peculiarities of these materials, like a residual conductivity at the lowest temperatures, which have remained unresolved so far.
In this work, a simple two-band model for two-dimensional topological Kondo insulators is devised, which is based on a single Kramer’s doublet coupled to a single conduction band. The model is investigated in the presence of a Hubbard interaction as a function of interaction strength U and inverse temperature β. The bulk properties of the model are obtained by DMFT, with a hybridization expansion CTQMC impurity solver. The DMFT approximation of a local self-energy leads to a very simple way of computing the topological invariant.
The results show that with increasing U the system can be driven through a topological phase transition. Interestingly, the transition is between distinct topological insulating states, namely the Γ-phase and M-phase. This appearance of different topological phases is possible due to the symmetry of the underlying square lattice. By adiabatically connecting both in- teracting states with the respective non-interacting state, it is shown that the transition indeed drives the system from the Γ-phase to the M-phase.
A different behavior can be observed by pushing the bare position of the Kramer’s doublet to higher binding energies. In this case, the non-interacting starting point has a trivial band topology. By switching on the interaction, the system can be tuned through a quantum phase transition, with a closing of the band gap. Upon reopening of the band gap, the system is in the Γ-phase, i. e. a topological insulator. By increasing the interaction strength further, the system moves into a strongly correlated regime. In fact, close to the expected transition to the M phase, the mass renormalization becomes quite substantial. While absent in the para- magnetic DMFT simulations conducted, it is conceivable that instead of a topological phase transition, the system undergoes a time-reversal symmetry breaking, magnetic transition.
The regime of strong correlations is studied in more detail as a function of temperature, both in the bulk and with open boundary conditions. A quantity which proved very useful is the bulk topological invariant Ns, which can be generalized to finite interaction strength and temperature. In particular, it can be used to define a temperature scale T ∗ for the onset of the topological state. Rescaling the results for Ns, a nice data collapse of the results for different values of U, from the local moment regime to strongly mixed valence, is obtained. This hints at T ∗ being a universal low energy scale in topological Kondo insulators. Indeed, by comparing T ∗ with the coherence scale extracted from the self-energy mass renormalization, it is found that both scales are equivalent up to a constant prefactor. Hence, the scale T ∗ obtained from the temperature dependence of topological properties, can be used as an independent measure for Fermi liquid coherence. This is particularly useful in the experimentally relevant mixed valence regime, where charge fluctuations cannot be neglected. Here, a separation of the energy scales related to spin and charge fluctuations is not possible.
The importance of charge fluctuations becomes evident in the extent of spectral weight transfer as the temperature is lowered. For mixed valence, while the hybridization gap emerges, a substantial amount of spectral weight is shifted from the vicinity of the Fermi level to the lower Hubbard band. In contrast, this effect is strongly suppressed in the local moment regime.
In addition to the bulk properties, the spectral function for open boundaries is studied as a function of temperature, both in the local moment and mixed valence regime. This allows an investigation of the emergence of topological edge states with temperature. The method used here is the site-dependent DMFT, which is a generalization of the conventional DMFT to inhomogeneous systems. The hybridization expansion CTQMC algorithm is used as impurity solver.
By comparison with the bulk results for the topological quantity Ns, it is found that the
temperature scale for the appearance of the topological edge states is T ∗, both in the mixed valence and local moment regime.
Topological insulators belong to a new quantum state of matter that is currently one of
the most recognized research fields in condensed matter physics. Strained bulk HgTe
and HgTe/HgCdTe quantum well structures are currently one of few topological insulator
material systems suitable to be studied in transport experiments. In addition
HgTe quantum wells provide excellent requirements for the conduction of spintronic
experiments. A fundamental requirement for most experiments, however, is to reliably
pattern these heterostructures into advanced nano-devices. Nano-lithography on this
material system proves to be challenging because of inherent temperature limitations,
its high reactivity with various metals and due to its properties as a topological insulator.
The current work gives an insight into why many established semiconductor
lithography processes cannot be easily transferred to HgTe while providing alternative
solutions. The presented developments include novel ohmic contacts, the prevention
of metal sidewalls and redeposition fences in combination with low temperature
(80 °C) lithography and an adapted hardmask lithography process utilizing a sacrificial
layer. In addition we demonstrate high resolution low energy (2.5 kV) electron beam
lithography and present an alternative airbridge gating technique. The feasibility of
nano-structures on HgTe quantum wells is exemplarily verified in two separate transport
experiments. We are first to realize physically etched quantum point contacts
in HgTe/HgCdTe high mobility 2DEGs and to prove their controllability via external
top-gate electrodes. So far quantum point contacts have not been reported in TI
materials. However, these constrictions are part of many proposals to probe the nature
of the helical quantum spin Hall edge channels and are suggested as injector and
detector devices for spin polarized currents. To confirm their functionality we performed
four-terminal measurements of the point contact conductance as a function of
external gate voltage. Our measurements clearly exhibit quantized conductance steps
in 2e2/h, which is a fundamental characteristic of quantum point contacts. Furthermore
we conducted measurements on the formation and control of collimated electron beams, a key feature to realize an all electrical spin-optic device. In a second study
several of the newly developed lithography techniques were implemented to produce
arrays of nano-wires on inverted and non-inverted HgTe quantum well samples. These
devices were used in order to probe and compare the weak antilocalization (WAL) in
these structures as a function of magnetic field and temperature. Our measurements
reveal that the WAL is almost an order of magnitude larger in inverted samples. This
observation is attributed to the Dirac-like dispersion of the energy bands in HgTe quantum
wells. The described lithography has already been successfully implemented and
adapted in several published studies. All processes have been optimized to guarantee
a minimum effect on the heterostructure’s properties and the sample surface, which is
especially important for probing the topological surface states of strained HgTe bulk
layers. Our developments therefore serve as a base for continuous progress to further
establish HgTe as a topological insulator and give access to new experiments.
In the present thesis the MBE growth and sample characterization of HgTe structures is investigated
and discussed. Due to the first experimental discovery of the quantum Spin Hall effect
(QSHE) in HgTe quantum wells, this material system attains a huge interest in the spintronics
society. Because of the long history of growing Hg-based heterostructures here at the Experimentelle
Physik III in Würzburg, there are very good requirements to analyze this material
system more precisely and in new directions. Since in former days only doped HgTe quantum
wells were grown, this thesis deals with the MBE growth in the (001) direction of undoped
HgTe quantum wells, surface located quantum wells and three dimensional bulk layers. All
Hg-based layers were grown on CdTe substrates which generate strain in the layer stack and
provide therefore new physical effects. In the same time, the (001) CdTe growth was investigated
on n-doped (001) GaAs:Si because the Japanese supplier of CdTe substrates had a
supply bottleneck due to the Tohoku earthquake and its aftermath in 2011.
After a short introduction of the material system, the experimental techniques were demonstrated
and explained explicitly. After that, the experimental part of this thesis is displayed.
So, the investigation of the (001) CdTe growth on (001) GaAs:Si is discussed in chapter 4.
Firstly, the surface preparation of GaAs:Si by oxide desorption is explored and analyzed.
Here, rapid thermal desorption of the GaAs oxide with following cool down in Zn atmosphere
provides the best results for the CdTe due to small holes at the surface, while e.g. an atomic
flat GaAs buffer deteriorates the CdTe growth quality. The following ZnTe layer supplies the
(001) growth direction of the CdTe and exhibits best end results of the CdTe for 30 seconds
growth time at a flux ratio of Zn/Te ~ 1/1.2. Without this ZnTe layer, CdTe will grow in the
(111) direction. However, the main investigation is here the optimization of the MBE growth
of CdTe. The substrate temperature, Cd/Te flux ratio and the growth time has to be adjusted
systematically. Therefore, a complex growth process is developed and established. This optimized
CdTe growth process results in a RMS roughness of around 2.5 nm and a FWHM value
of the HRXRD w-scan of 150 arcsec. Compared to the literature, there is no lower FWHM
value traceable for this growth direction. Furthermore, etch pit density measurements show
that the surface crystallinity is matchable with the commercial CdTe substrates (around 1x10^4
cm^(-2)). However, this whole process is not completely perfect and offers still room for improvements.
The growth of undoped HgTe quantum wells was also a new direction in research in contrast
to the previous n-doped grown HgTe quantum wells. Here in chapter 5, the goal of very low
carrier densities was achieved and therefore it is now possible to do transport experiments in
the n - and p - region by tuning the gate voltage. To achieve this high sample quality, very precise
growth of symmetric HgTe QWs and their HRXRD characterization is examined. Here,
the quantum well thickness can now determined accurate to under 0.3 nm. Furthermore, the transport analysis of different quantum well thicknesses shows that the carrier density and
mobility increase with rising HgTe layer thickness. However, it is found out that the band
gap of the HgTe QW closes indirectly at a thickness of 11.6 nm. This is caused by the tensile
strained growth on CdTe substrates. Moreover, surface quantum wells are studied. These
quantum wells exhibit no or a very thin HgCdTe cap. Though, oxidization and contamination
of the surface reduces here the carrier mobility immensely and a HgCdTe layer of around 5 nm
provides the pleasing results for transport experiments with superconductors connected to the
topological insulator [119]. A completely new achievement is the realization of MBE growth
of HgTe quantum wells on CdTe/GaAs:Si substrates. This is attended by the optimization of
the CdTe growth on GaAs:Si. It exposes that HgTe quantum wells grown in-situ on optimized
CdTe/GaAs:Si show very nice transport data with clear Hall plateaus, SdH oscillations, low
carrier densities and carrier mobilities up to 500 000 cm^2/Vs. Furthermore, a new oxide etching
process is developed and analyzed which should serve as an alternative to the standard
HCl process which generates volcano defects at some time. However, during the testing time
the result does not differ in Nomarski, HRXRD, AFM and transport measurements. Here,
long-time tests or etching and mounting in nitrogen atmosphere may provide new elaborate
results.
The main focus of this thesis is on the MBE growth and standard characterization of HgTe bulk
layers and is discussed in chapter 6. Due to the tensile strained growth on lattice mismatched
CdTe, HgTe bulk opens up a band gap of around 22 meV at the G-point and exhibits therefore
its topological surface states. The analysis of surface condition, roughness, crystalline quality,
carrier density and mobility via Nomarski, AFM, XPS, HRXRD and transport measurements
is therefore included in this work. Layer thickness dependence of carrier density and mobility
is identified for bulk layer grown directly on CdTe substrates. So, there is no clear correlation
visible between HgTe layer thickness and carrier density or mobility. So, the carrier density is
almost constant around 1x10^11 cm^(-2) at 0 V gate voltage. The carrier mobility of these bulk
samples however scatters between 5 000 and 60 000 cm^2/Vs almost randomly. Further experiments
should be made for a clearer understanding and therefore the avoidance of unusable
bad samples.But, other topological insulator materials show much higher carrier densities and
lower mobility values. For example, Bi2Se3 exhibits just density values around 1019 cm^(-2)
and mobility values clearly below 5000 cm2/Vs. The carrier density however depends much
on lithography and surface treatment after growth. Furthermore, the relaxation behavior and
critical thickness of HgTe grown on CdTe is determined and is in very good agreement with
theoretical prediction (d_c = 155 nm). The embedding of the HgTe bulk layer between HgCdTe
layers created a further huge improvement. Similar to the quantum well structures the carrier
mobility increases immensely while the carrier density levels at around 1x10^11 cm^(-2) at 0
V gate voltage as well. Additionally, the relaxation behavior and critical thickness of these
barrier layers has to be determined. HgCdTe grown on commercial CdTe shows a behavior as
predicted except the critical thickness which is slightly higher than expected (d_c = 850 nm).
Otherwise, the relaxation of HgCdTe grown on CdTe/GaAs:Si occurs in two parts. The layer
is fully strained up to 250 nm. Between 250 nm and 725 nm the HgCdTe film starts to relax
randomly up to 10 %. The relaxation behavior for thicknesses larger than 725 nm occurs than
linearly to the inverse layer thickness. A explanation is given due to rough interface conditions
and crystalline defects of the CdTe/GaAs:Si compared to the commercial CdTe substrate. HRXRD and AFM data support this statement. Another point is that the HgCdTe barriers protect the active HgTe layer and because of the high carrier mobilities the Hall measurements provide new transport data which have to be interpreted more in detail in the future. In addition, HgTe bulk samples show very interesting transport data by gating the sample from the top and the back. It is now possible to manipulate the carrier densities of the top and bottom surface states almost separately. The back gate consisting of the n-doped GaAs substrate and the thick insulating CdTe buffer can tune the carrier density for Delta(n) ~ 3x10^11 cm^(-2). This is sufficient to tune the Fermi energy from the p-type into the n-type region [138].
In this thesis it is shown that strained HgTe bulk layers exhibit superior transport data by embedding between HgCdTe barrier layers. The n-doped GaAs can here serve as a back gate.
Furthermore, MBE growth of high crystalline, undoped HgTe quantum wells shows also new
and extended transport output. Finally, it is notable that due to the investigated CdTe growth
on GaAs the Hg-based heterostructure MBE growth is partially independent from commercial
suppliers.
The subject of this thesis is the fabrication and characterization of magnetic topological
insulator layers of (V,Bi,Sb)\(_2\)Te\(_3\) exhibiting the quantum anomalous Hall
effect. A major task was the experimental realization of the quantum anomalous
Hall effect, which is only observed in layers with very specific structural,
electronic and magnetic properties. These properties and their influence on the
quantum anomalous Hall effect are analyzed in detail.
First, the optimal conditions for the growth of pure Bi\(_2\)Te\(_3\) and Sb\(_2\)Te\(_3\) crystal
layers and the resulting structural quality are studied. The crystalline quality of
Bi\(_2\)Te\(_3\) improves significantly at higher growth temperatures resulting in a small
mosaicity-tilt and reduced twinning defects. The optimal growth temperature is
determined as 260\(^{\circ}\)C, low enough to avoid desorption while maintaining a high
crystalline quality.
The crystalline quality of Sb\(_2\)Te\(_3\) is less dependent on the growth temperature.
Temperatures below 230\(^{\circ}\)C are necessary to avoid significant material desorption,
though. Especially for the nucleation on Si(111)-H, a low sticking coefficient is
observed preventing the coalescence of islands into a homogeneous layer.
The influence of the substrate type, miscut and annealing sequence on the growth
of Bi\(_2\)Te\(_3\) layers is investigated. The alignment of the layer changes depending on
the miscut angle and annealing sequence: Typically, layer planes align parallel to
the Si(111) planes. This can enhance the twin suppression due to transfer of the
stacking order from the substrate to the layer at step edges, but results in a step
bunched layer morphology. For specific substrate preparations, however, the layer
planes are observed to align parallel to the surface plane. This alignment avoids
displacement at the step edges, which would cause anti-phase domains. This results
in narrow Bragg peaks in XRD rocking curve scans due to long-range order in
the absence of anti-phase domains. Furthermore, the use of rough Fe:InP(111):B
substrates leads to a strong reduction of twinning defects and a significantly reduced
mosaicity-twist due to the smaller lattice mismatch.
Next, the magnetically doped mixed compound V\(_z\)(Bi\(_{1−x}\)Sb\(_x\))\(_{2−z}\)Te\(_3\) is studied in
order to realize the quantum anomalous Hall effect. The addition of V and Bi to
Sb\(_2\)Te\(_3\) leads to efficient nucleation on the Si(111)-H surface and a closed, homogeneous
layer. Magneto-transport measurements of layers reveal a finite anomalous
Hall resistivity significantly below the von Klitzing constant. The observation of
the quantum anomalous Hall effect requires the complete suppression of parasitic
bulklike conduction due to defect induced carriers. This can be achieved by optimizing
the thickness, composition and growth conditions of the layers.
The growth temperature is observed to strongly influence the structural quality.
Elevated temperatures result in bigger islands, improved crystallographic orientation
and reduced twinning. On the other hand, desorption of primarily Sb is
observed, affecting the thickness, composition and reproducibility of the layers.
At 190\(^{\circ}\)C, desorption is avoided enabling precise control of layer thickness and
composition of the quaternary compound while maintaining a high structural
quality.
It is especially important to optimize the Bi/Sb ratio in the (V,Bi,Sb)\(_2\)Te\(_3\) layers,
since by alloying n-type Bi\(_2\)Te\(_3\) and p-type Sb\(_2\)Te\(_3\) charge neutrality is achieved at
a specific mixing ratio. This is necessary to shift the Fermi level into the magnetic
exchange gap and fully suppress the bulk conduction. The Sb content x furthermore
influences the in-plane lattice constant a significantly. This is utilized to
accurately determine x even for thin films below 10 nm thickness required for the
quantum anomalous Hall effect. Furthermore, x strongly influences the surface
morphology: with increasing x the island size decreases and the RMS roughness
increases by up to a factor of 4 between x = 0 and x = 1.
A series of samples with x varied between 0.56-0.95 is grown, while carefully
maintaining a constant thickness of 9 nm and a doping concentration of 2 at.% V.
Magneto-transport measurements reveal the charge neutral point around x = 0.86
at 4.2 K. The maximum of the anomalous Hall resistivity of 0.44 h/e\(^2\) is observed
at x = 0.77 close to charge neutrality. Reducing the measurement temperature
to 50 mK significantly increases the anomalous Hall resistivity. Several samples
in a narrow range of x between 0.76-0.79 show the quantum anomalous Hall effect
with the Hall resistivity reaching the von Klitzing constant and a vanishing
longitudinal resistivity. Having realized the quantum anomalous Hall effect as the
first group in Europe, this breakthrough enabled us to study the electronic and
magnetic properties of the samples in close collaborations with other groups.
In collaboration with the Physikalisch-Technische Bundesanstalt high-precision
measurements were conducted with detailed error analysis yielding a relative de-
viation from the von Klitzing constant of (0.17 \(\pm\) 0.25) * 10\(^{−6}\). This is published
as the smallest, most precise value at that time, proving the high quality of the
provided samples. This result paves the way for the application of magnetic topological
insulators as zero-field resistance standards.
Non-local magneto-transport measurements were conducted at 15 mK in close
collaboration with the transport group in EP3. The results prove that transport
happens through chiral edge channels. The detailed analysis of small anomalies in
transport measurements reveals instabilities in the magnetic phase even at 15 mK.
Their time dependent nature indicates the presence of superparamagnetic contributions
in the nominally ferromagnetic phase.
Next, the influence of the capping layer and the substrate type on structural properties
and the impact on the quantum anomalous Hall effect is investigated. To
this end, a layer was grown on a semi-insulating Fe:InP(111)B substrate using the
previously optimized growth conditions. The crystalline quality is improved significantly
with the mosaicity twist reduced from 5.4\(^{\circ}\) to 1.0\(^{\circ}\). Furthermore, a layer
without protective capping layer was grown on Si and studied after providing sufficient
time for degradation. The uncapped layer on Si shows perfect quantization,
while the layer on InP deviates by about 5%. This may be caused by the higher
crystalline quality, but variations in e.g. Sb content cannot be ruled out as the
cause. Overall, the quantum anomalous Hall effect seems robust against changes
in substrate and capping layer with only little deviations.
Furthermore, the dependence of the quantum anomalous Hall effect on the thickness
of the layers is investigated. Between 5-8 nm thickness the material typically
transitions from a 2D topological insulator with hybridized top and bottom surface
states to a 3D topological insulator. A set of samples with 6 nm, 8 nm, and
9 nm thickness exhibits the quantum anomalous Hall effect, while 5 nm and 15 nm
thick layers show significant bulk contributions. The analysis of the longitudinal
and Hall conductivity during the reversal of magnetization reveals distinct differences
between different thicknesses. The 6 nm thick layer shows scaling consistent
with the integer quantum Hall effect, while the 9 nm thick layer shows scaling expected
for the topological surface states of a 3D topological insulator. The unique
scaling of the 9 nm thick layer is of particular interest as it may be a result of
axion electrodynamics in a 3D topological insulator.
Subsequently, the influence of V doping on the structural and magnetic properties
of the host material is studied systematically. Similarly to Bi alloying, increased
V doping seems to flatten the layer surface significantly. With increasing V content,
Te bonding partners are observed to increase simultaneously in a 2:3 ratio
as expected for V incorporation on group-V sites. The linear contraction of the
in-plane and out-of-plane lattice constants with increasing V doping is quantitatively
consistent with the incorporation of V\(^{3+}\) ions, possibly mixed with V\(^{4+}\)
ions, at the group-V sites. This is consistent with SQUID measurements showing
a magnetization of 1.3 \(\mu_B\) per V ion.
Finally, magnetically doped topological insulator heterostructures are fabricated
and studied in magneto-transport. Trilayer heterostructures with a non-magnetic
(Bi,Sb)\(_2\)Te\(_3\) layer sandwiched between two magnetically doped layers are predicted
to host the axion insulator state if the two magnetic layers are decoupled and in
antiparallel configuration. Magneto-transport measurements of such a trilayer heterostructure
with 7 nm undoped (Bi,Sb)\(_2\)Te\(_3\) between 2 nm thick layers doped with
1.5 at.% V exhibit a zero Hall plateau representing an insulating state. Similar results
in the literature were interpreted as axion insulator state, but in the absence
of a measurement showing the antiparallel magnetic orientation other explanations
for the insulating state cannot be ruled out.
Furthermore, heterostructures including a 2 nm thin, highly V doped layer region
show an anomalous Hall effect of opposite sign compared to previous samples. A
dependency on the thickness and position of the doped layer region is observed,
which indicates that scattering at the interfaces causes contributions to the anomalous
Hall effect of opposite sign compared to bulk scattering effects.
Many interesting phenomena in quantum anomalous Hall insulators as well as axion
insulators are still not unambiguously observed. This includes Majorana bound
states in quantum anomalous Hall insulator/superconductor hybrid systems and
the topological magneto-electric effect in axion insulators. The limited observation
temperature of the quantum anomalous Hall effect of below 1 K could be increased
in 3D topological insulator/magnetic insulator heterostructures which utilize the
magnetic proximity effect.
The main achievement of this thesis is the reproducible growth and characterization
of (V,Bi,Sb)2Te3 layers exhibiting the quantum anomalous Hall effect. The
detailed study of the structural requirements of the quantum anomalous Hall effect
and the observation of the unique axionic scaling behavior in 3D magnetic
topological insulator layers leads to a better understanding of the nature of this
new quantum state. The high-precision measurements of the quantum anomalous
Hall effect reporting the smallest deviation from the von Klitzing constant
are an important step towards the realization of a zero-field quantum resistance
standard.