Refine
Has Fulltext
- yes (31)
Is part of the Bibliography
- yes (31) (remove)
Year of publication
Document Type
- Doctoral Thesis (31)
Keywords
- Topologischer Isolator (31) (remove)
Institute
- Physikalisches Institut (31) (remove)
In this dissertation the electronic and high-energy optical properties of thin nanoscale
films of the magnetic topological insulator (MTI) (V,Cr)y(BixSb1-x)2-yTe3 are studied
by means of X-ray photoelectron spectroscopy (XPS) and electron energy-loss
spectroscopy (EELS). Magnetic topological insulators are presently of broad interest
as the combination of ferromagnetism and spin-orbit coupling in these materials
leads to a new topological phase, the quantum anomalous Hall state (QAHS), with
dissipation less conduction channels. Determining and controlling the physical
properties of these complex materials is therefore desirable for a fundamental understanding
of the QAHS and for their possible application in spintronics. EELS can
directly probe the electron energy-loss function of a material from which one can
obtain the complex dynamic dielectric function by means of the Kramers-Kronig
transformation and the Drude-Lindhard model of plasmon oscillations.
The XPS core-level spectra in (V,Cr)y(BixSb1-x)2-yTe3 are analyzed in detail with
regards to inelastic background contributions. It is shown that the spectra can be
accurately described based on the electron energy-loss function obtained from an
independent EELS measurement. This allows for a comprehensive and quantitative
analysis of the XPS data, which will facilitate future core-level spectroscopy studies
in this class of topological materials. From the EELS data, furthermore, the bulk and
surface optical properties were estimated, and compared to ab initio calculations
based on density functional theory (DFT) performed in the GW approximation
for Sb2Te3. The experimental results show a good agreement with the calculated
complex dielectric function and the calculated energy-loss function. The positions of
the main plasmon modes reported here are expected to be generally similar in other
materials in this class of nanoscale TI films. Hence, the present work introduces
EELS as a powerful method to access the high-energy optical properties of TI
thin films. Based on the presented results it will be interesting to explore more
systematically the effects of stoichiometry, magnetic doping, film thickness and
surface morphology on the electron-loss function, potentially leading to a better
understanding of the complex interplay of structural, electronic, magnetic and
optical properties in MTI nanostructures.
In the present thesis the MBE growth and sample characterization of HgTe structures is investigated
and discussed. Due to the first experimental discovery of the quantum Spin Hall effect
(QSHE) in HgTe quantum wells, this material system attains a huge interest in the spintronics
society. Because of the long history of growing Hg-based heterostructures here at the Experimentelle
Physik III in Würzburg, there are very good requirements to analyze this material
system more precisely and in new directions. Since in former days only doped HgTe quantum
wells were grown, this thesis deals with the MBE growth in the (001) direction of undoped
HgTe quantum wells, surface located quantum wells and three dimensional bulk layers. All
Hg-based layers were grown on CdTe substrates which generate strain in the layer stack and
provide therefore new physical effects. In the same time, the (001) CdTe growth was investigated
on n-doped (001) GaAs:Si because the Japanese supplier of CdTe substrates had a
supply bottleneck due to the Tohoku earthquake and its aftermath in 2011.
After a short introduction of the material system, the experimental techniques were demonstrated
and explained explicitly. After that, the experimental part of this thesis is displayed.
So, the investigation of the (001) CdTe growth on (001) GaAs:Si is discussed in chapter 4.
Firstly, the surface preparation of GaAs:Si by oxide desorption is explored and analyzed.
Here, rapid thermal desorption of the GaAs oxide with following cool down in Zn atmosphere
provides the best results for the CdTe due to small holes at the surface, while e.g. an atomic
flat GaAs buffer deteriorates the CdTe growth quality. The following ZnTe layer supplies the
(001) growth direction of the CdTe and exhibits best end results of the CdTe for 30 seconds
growth time at a flux ratio of Zn/Te ~ 1/1.2. Without this ZnTe layer, CdTe will grow in the
(111) direction. However, the main investigation is here the optimization of the MBE growth
of CdTe. The substrate temperature, Cd/Te flux ratio and the growth time has to be adjusted
systematically. Therefore, a complex growth process is developed and established. This optimized
CdTe growth process results in a RMS roughness of around 2.5 nm and a FWHM value
of the HRXRD w-scan of 150 arcsec. Compared to the literature, there is no lower FWHM
value traceable for this growth direction. Furthermore, etch pit density measurements show
that the surface crystallinity is matchable with the commercial CdTe substrates (around 1x10^4
cm^(-2)). However, this whole process is not completely perfect and offers still room for improvements.
The growth of undoped HgTe quantum wells was also a new direction in research in contrast
to the previous n-doped grown HgTe quantum wells. Here in chapter 5, the goal of very low
carrier densities was achieved and therefore it is now possible to do transport experiments in
the n - and p - region by tuning the gate voltage. To achieve this high sample quality, very precise
growth of symmetric HgTe QWs and their HRXRD characterization is examined. Here,
the quantum well thickness can now determined accurate to under 0.3 nm. Furthermore, the transport analysis of different quantum well thicknesses shows that the carrier density and
mobility increase with rising HgTe layer thickness. However, it is found out that the band
gap of the HgTe QW closes indirectly at a thickness of 11.6 nm. This is caused by the tensile
strained growth on CdTe substrates. Moreover, surface quantum wells are studied. These
quantum wells exhibit no or a very thin HgCdTe cap. Though, oxidization and contamination
of the surface reduces here the carrier mobility immensely and a HgCdTe layer of around 5 nm
provides the pleasing results for transport experiments with superconductors connected to the
topological insulator [119]. A completely new achievement is the realization of MBE growth
of HgTe quantum wells on CdTe/GaAs:Si substrates. This is attended by the optimization of
the CdTe growth on GaAs:Si. It exposes that HgTe quantum wells grown in-situ on optimized
CdTe/GaAs:Si show very nice transport data with clear Hall plateaus, SdH oscillations, low
carrier densities and carrier mobilities up to 500 000 cm^2/Vs. Furthermore, a new oxide etching
process is developed and analyzed which should serve as an alternative to the standard
HCl process which generates volcano defects at some time. However, during the testing time
the result does not differ in Nomarski, HRXRD, AFM and transport measurements. Here,
long-time tests or etching and mounting in nitrogen atmosphere may provide new elaborate
results.
The main focus of this thesis is on the MBE growth and standard characterization of HgTe bulk
layers and is discussed in chapter 6. Due to the tensile strained growth on lattice mismatched
CdTe, HgTe bulk opens up a band gap of around 22 meV at the G-point and exhibits therefore
its topological surface states. The analysis of surface condition, roughness, crystalline quality,
carrier density and mobility via Nomarski, AFM, XPS, HRXRD and transport measurements
is therefore included in this work. Layer thickness dependence of carrier density and mobility
is identified for bulk layer grown directly on CdTe substrates. So, there is no clear correlation
visible between HgTe layer thickness and carrier density or mobility. So, the carrier density is
almost constant around 1x10^11 cm^(-2) at 0 V gate voltage. The carrier mobility of these bulk
samples however scatters between 5 000 and 60 000 cm^2/Vs almost randomly. Further experiments
should be made for a clearer understanding and therefore the avoidance of unusable
bad samples.But, other topological insulator materials show much higher carrier densities and
lower mobility values. For example, Bi2Se3 exhibits just density values around 1019 cm^(-2)
and mobility values clearly below 5000 cm2/Vs. The carrier density however depends much
on lithography and surface treatment after growth. Furthermore, the relaxation behavior and
critical thickness of HgTe grown on CdTe is determined and is in very good agreement with
theoretical prediction (d_c = 155 nm). The embedding of the HgTe bulk layer between HgCdTe
layers created a further huge improvement. Similar to the quantum well structures the carrier
mobility increases immensely while the carrier density levels at around 1x10^11 cm^(-2) at 0
V gate voltage as well. Additionally, the relaxation behavior and critical thickness of these
barrier layers has to be determined. HgCdTe grown on commercial CdTe shows a behavior as
predicted except the critical thickness which is slightly higher than expected (d_c = 850 nm).
Otherwise, the relaxation of HgCdTe grown on CdTe/GaAs:Si occurs in two parts. The layer
is fully strained up to 250 nm. Between 250 nm and 725 nm the HgCdTe film starts to relax
randomly up to 10 %. The relaxation behavior for thicknesses larger than 725 nm occurs than
linearly to the inverse layer thickness. A explanation is given due to rough interface conditions
and crystalline defects of the CdTe/GaAs:Si compared to the commercial CdTe substrate. HRXRD and AFM data support this statement. Another point is that the HgCdTe barriers protect the active HgTe layer and because of the high carrier mobilities the Hall measurements provide new transport data which have to be interpreted more in detail in the future. In addition, HgTe bulk samples show very interesting transport data by gating the sample from the top and the back. It is now possible to manipulate the carrier densities of the top and bottom surface states almost separately. The back gate consisting of the n-doped GaAs substrate and the thick insulating CdTe buffer can tune the carrier density for Delta(n) ~ 3x10^11 cm^(-2). This is sufficient to tune the Fermi energy from the p-type into the n-type region [138].
In this thesis it is shown that strained HgTe bulk layers exhibit superior transport data by embedding between HgCdTe barrier layers. The n-doped GaAs can here serve as a back gate.
Furthermore, MBE growth of high crystalline, undoped HgTe quantum wells shows also new
and extended transport output. Finally, it is notable that due to the investigated CdTe growth
on GaAs the Hg-based heterostructure MBE growth is partially independent from commercial
suppliers.
Neue physikalische Erkenntnisse vervollständigen die Sicht auf die Welt und erschließen gleichzeitig Wege für Folgeexperimente und technische Anwendungen. Das letzte Jahrzehnt der Festkörperforschung war vom zunehmenden Fokus der theoretischen und experimentellen Erkundung topologischer Materialien geprägt. Eine fundamentale Eigenschaft ist ihre Resistenz gegenüber solchen Störungen, welche spezielle physikalische Symmetrien nicht verletzen. Insbesondere die Topologischen Isolatoren - Halbleiter mit isolierenden Volumen- sowie gleichzeitig leitenden und spinpolarisierten Oberflächenzuständen - sind vielversprechende Kandidaten zur Realisierung breitgefächerter spintronischer Einsatzgebiete. Bis zur Verwirklichung von Quantencomputern und anderer, heute noch exotisch anmutender Konzepte bedarf es allerdings ein umfassenderes Verständnis der grundlegenden, physikalischen Zusammenhänge. Diese kommen vor allem an Grenzflächen zum Tragen, weshalb oberflächensensitive Methoden bei der Entdeckung der Topologischen Isolatoren eine wichtige Rolle spielten.
Im Rahmen dieser Arbeit werden daher strukturelle, elektronische und magnetische Eigenschaften Topologischer Isolatoren mittels Tieftemperatur-Rastertunnelmikroskopie und -spektroskopie sowie begleitenden Methoden untersucht.
Die Veränderung der Element-Ausgangskonzentration während dem Wachstum des prototypischen Topologischen Isolators Bi2Te3 führt zur Realisierung eines topologischen p-n Übergangs innerhalb des Kristalls. Bei einem spezifischen Verhältnis von Bi zu Te in der Schmelze kommt es aufgrund unterschiedlicher Erstarrungstemperaturen der Komponenten zu einer Ansammlung von Bi- und Te-reichen Gegenden an den gegenüberliegenden Enden des Kristalls. In diesen bildet sich infolge des jeweiligen Elementüberschusses durch Kristallersetzungen und -fehlstellen eine Dotierung des Materials aus. Daraus resultiert die Existenz eines Übergangsbereiches, welcher durch Transportmessungen verifiziert werden kann. Mit der räumlich auflösenden Rastertunnelmikroskopie wird diese Gegend lokalisiert und strukturell sowie elektronisch untersucht. Innerhalb des Übergangsbereiches treten charakteristische Kristalldefekte beider Arten auf - eine Defektunterdrückung bleibt folglich aus. Dennoch ist dort der Beitrag der Defekte zum Stromtransport aufgrund ihres gegensätzlichen Dotiercharakters vernachlässigbar, sodass der topologische Oberflächenzustand die maßgeblichen physikalischen Eigenschaften bestimmt. Darüber hinaus tritt der Übergangsbereich in energetischen und räumlichen Größenordnungen auf, die Anwendungen bei Raumtemperatur denkbar machen.
Neben der Veränderung Topologischer Isolatoren durch den gezielten Einsatz intrinsischer Kristalldefekte bieten magnetische Störungen die Möglichkeit zur Prüfung des topologischen Oberflächenzustandes auf dessen Widerstandsfähigkeit sowie der gegenseitigen Wechselwirkungen. Die Zeitumkehrinvarianz ist ursächlich für den topologischen Schutz des Oberflächenzustandes, weshalb magnetische Oberflächen- und Volumendotierung diese Symmetrie brechen und zu neuartigem Verhalten führen kann.
Die Oberflächendotierung Topologischer Isolatoren kann zu einer starken Bandverbiegung und einer energetischen Verschiebung des Fermi-Niveaus führen. Bei einer wohldosierten Menge der Adatome auf p-dotiertem Bi2Te3 kommt die Fermi-Energie innerhalb der Volumenzustands-Bandlücke zum Liegen. Folglich wird bei Energien rund um das Fermi-Niveau lediglich der topologische Oberflächenzustand bevölkert, welcher eine Wechselwirkung zwischen den Adatomen vermitteln kann. Für Mn-Adatome kann Rückstreuung beobachtet werden, die aufgrund der Zeitumkehrinvarianz in undotierten Topologischen Isolatoren verboten ist. Die überraschenderweise starken und fokussierten Streuintensitäten über mesoskopische Distanzen hinweg resultieren aus der ferromagnetischen Kopplung nahegelegener Adsorbate, was durch theoretische Berechnungen und Röntgendichroismus-Untersuchungen bestätigt wird. Gleichwohl wird für die Proben ein superparamagnetisches Verhalten beobachtet.
Im Gegensatz dazu führt die ausreichende Volumendotierung von Sb2Te3 mit V-Atomen zu einem weitreichend ferromagnetischen Verhalten. Erstaunlicherweise kann trotz der weitläufig verbreiteten Theorie Zeitumkehrinvarianz-gebrochener Dirac-Zustände und der experimentellen Entdeckung des Anormalen Quanten-Hall-Effektes in ähnlichen Probensystemen keinerlei Anzeichen einer spektroskopischen Bandlücke beobachtet werden. Dies ist eine direkte Auswirkung der dualen Natur der magnetischen Adatome: Während sie einerseits eine magnetisch induzierte Bandlücke öffnen, besetzen sie diese durch Störstellenresonanzen wieder. Ihr stark lokaler Charakter kann durch die Aufnahme ihrer räumlichen Verteilung aufgezeichnet werden und führt zu einer Mobilitäts-Bandlücke, deren Indizien durch vergleichende Untersuchungen an undotiertem und dotiertem Sb2Te3 bestätigt werden.
Two-dimensional (2D) topological insulators are a new class of materials with properties that are
promising for potential future applications in quantum computers. For example, stanene represents
a possible candidate for a topological insulator made of Sn atoms arranged in a hexagonal
lattice. However, it has a relatively fragile low-energy spectrum and sensitive topology. Therefore,
to experimentally realize stanene in the topologically non-trivial phase, a suitable substrate
that accommodates stanene without compromising these topological properties must be found.
A heterostructure consisting of a SiC substrate with a buffer layer of adsorbed group-III elements
constitutes a possible solution for this problem. In this work, 2D adatom systems of Al and In
were grown epitaxially on SiC(0001) and then investigated structurally and spectroscopically by
scanning tunneling microscopy (STM) and photoelectron spectroscopy.
Al films in the high coverage regime \( (\Theta_{ML}\approx2\) ML\( ) \) exhibit unusually large, triangular- and
rectangular-shaped surface unit cells. Here, the low-energy electron diffraction (LEED)
pattern is brought into accordance with the surface topography derived from STM. Another Al
reconstruction, the quasi-one-dimensional (1D) Al phase, exhibits a striped surface corrugation,
which could be the result of the strain imprinted by the overlayer-substrate lattice mismatch.
It is suggested that Al atoms in different surface areas can occupy hexagonal close-packed and
face-centered cubic lattice sites, respectively, which in turn lead to close-packed transition regions
forming the stripe-like corrugations. On the basis of the well-known herringbone reconstruction
from Au(111), a first structural model is proposed, which fits well to the structural data from
STM. Ultimately, however, thermal treatments of the sample could not generate lower coverage
phases, i.e. in particular, a buffer layer structure.
Strong metallic signatures are found for In high coverage films \( (\Theta_{ML}\approx3\) to \(2\) ML\() \) by
scanning tunneling spectroscopy (STS) and angle-resolved photoelectron spectroscopy (ARPES),
which form a \( (7\times7) \), \( (6\times4\sqrt{3}) \), and \( (4\sqrt{3}\times4\sqrt{3}) \) surface reconstruction. In all these In phases
electrons follow the nearly-free electron model. Similar to the Al films, thermal treatments could
not obtain the buffer layer system.
Surprisingly, in the course of this investigation a triangular In lattice featuring a \( (1\times1) \)
periodicity is observed to host massive Dirac-like bands at \( K/K^{\prime} \) in ARPES. Based on this
strong electronic similarity with graphene at the Brillouin zone boundary, this new structure is
referred to as \textit{indenene}. An extensive theoretical analysis uncovers the emergence of an electronic
honeycomb network based on triangularly arranged In \textit{p} orbitals. Due to strong atomic spin-orbit
coupling and a comparably small substrate-induced in-plane inversion symmetry breaking this
material system is rendered topologically non-trivial. In indenene, the topology is intimately
linked to a bulk observable, i.e., the energy-dependent charge accumulation sequence within the
surface unit cell, which is experimentally exploited in STS to confirm the non-trivial topological
character. The band gap at \( K/K^{\prime} \), a signature of massive Dirac fermions, is estimated by
ARPES to approximately 125 meV. Further investigations by X-ray standing wave, STM, and
LEED confirm the structural properties of indenene. Thus, this thesis presents the growth and
characterization of the novel quantum spin Hall insulator material indenene.
The presented thesis summarizes the results from four and a half years of intense lithography development on (Cd,Hg)Te/HgTe/(Cd,Hg)Te quantum well structures. The effort was motivated by the unique properties of this topological insulator. Previous work from Molenkamp at al.\ has proven that the transport through such a 2D TI is carried by electrons with opposite spin, counter-propagating in 1D channels along the sample edge. However, up to this thesis, the length of quantized spin Hall channels has never been reported to exceed 4 µm. Therefore, the main focus was put on a reproducible and easy-to-handle fabrication process that reveals the intrinsic material parameters.
Every single lithography step in macro as well as microscopic sample fabrication has been re-evaluated. In the Development, the process changes have been presented along SEM pictures, microgaphs and, whenever possible, measurement responses.
We have proven the conventional ion milling etch method to damage the remaining mesa and result in drastically lower electron mobilities in samples of microscopic size.
The novel KI:I2:HBr wet etch method for macro and microstructure mesa fabrication has been shown to leave the crystalline structure intact and result in unprecedented mobilities, as high as in macroscopic characterization Hall bars. Difficulties, such as an irregular etch start and slower etching of the conductive QW have been overcome by concentration, design and etch flow adaptations. In consideration of the diffusive regime, a frame around the EBL write field electrically decouples the structure mesa from the outside wafer. As the smallest structure, the frame is etched first and guarantees a non-different etching of the conductive layer during the redox reaction. A tube-pump method assures reproducible etch results with mesa heights below 300 nm. The PMMA etch mask is easy to strip and leaves a clean mesa with no redeposition. From the very first attempts, to the final etch process, the reader has been provided with the characteristics and design requirements necessary to enable the fabrication of nearly any mesa shape within an EBL write field of 200 µm.
Magneto resistance measurement of feed-back samples have been presented along the development chronology of wet etch method and subsequent lithography steps. With increasing feature quality, more and more physics has been revealed enabling detailed evaluation of smallest disturbances. The following lithography improvements have been implemented. They represent a tool-box for high quality macro and microstructure fabrication on (CdHg)Te/HgTe of almost any kind.
The optical positive resist ECI 3027 can be used as wet and as dry etch mask for structure sizes larger than 1 µm. It serves to etch mesa structures larger than the EBL write field.
The double layer PMMA is used for ohmic contact fabrication within the EBL write field. Its thickness allows to first dry etch the (Cd,Hg)Te cap layer and then evaporate the AuGe contact, in situ and self-aligned. Because of an undercut, up to 300 nm can be metalized without any sidewalls after the lift-off. An edge channel mismatch within the contact leads can be avoided, if the ohmic contacts are designed to reach close to the sample and beneath the later gate electrode.
The MIBK cleaning step prior to the gate application removes PMMA residuals and thereby improves gate and potential homogeneity.
The novel low HfO2-ALD process enables insulator growth into optical and EBL lift-off masks of any resolvable shape. Directly metalized after the insulator growth, the self-aligned method results in thin and homogeneous gate electrode reproducibly withholding gate voltages to +-10 V.
The optical negative resist ARN 4340 exhibits an undercut when developed. Usable as dry etch mask and lift-off resist, it enables an in-situ application of ohmic contacts first etching close to the QW, then metalizing AuGe. Up to 500 nm thickness, the undercut guarantees an a clean lift-off with no sidewalls.
The undertaken efforts have led to micro Hall bar measurements with Hall plateaus and SdH-oszillations in up to now unseen levels of detail.
The gap resistance of several micro Hall bars with a clear QSH signal have been presented in Quantum Spin Hall. The first to exhibit longitudinal resistances close to the expected h/2e2 since years, they reveal unprecedented details in features and characteristics. It has been shown that their protection against backscattering through time reversal symmetry is not as rigid as previously claimed. Values below and above 12.9 kΩ been explained, introducing backscattering within the Landauer-Büttiker formalism of edge channel transport. Possible reasons have been discussed. Kondo, interaction and Rashba-backscattering arising from density inhomogeneities close to the edge are most plausible to explain features on and deviations from a quantized value. Interaction, tunneling and dephasing mechanisms as well as puddle size, density of states and Rashba Fields are gate voltage dependent. Therefore, features in the QSH signal are fingerprints of the characteristic potential landscape.
Stable up to 11 K, two distinct but clear power laws have been found in the higher temperature dependence of the QSH in two samples. However, with ΔR = Tα, α = ¼ in one (QC0285) and α = 2 in the other (Q2745), none of the predicted dependencies could be confirmed. Whereas, the gap resistances of QC0285 remains QSH channel dominated up to 3.9 T and thereby confirmed the calculated lifting of the band inversion in magnetic field. The gate-dependent oscillating features in the QSH signal of Q2745 immediately increase in magnetic field. The distinct field dependencies allowed the assumption of two different dominant backscattering mechanisms.
Resulting in undisturbed magneto transport and unprecedented QSH measurements The Novel Micro Hall Bar Process has proven to enable the fabrication of a new generation of microstructures.
This thesis examines the electronic properties of two materials that promise the realization and observation of novel exotic quantum phenomena. For this purpose, angle-resolved photoemission forms the experimental basis for the investigation of the electronic properties. Furthermore, the magnetic order is investigated utilizing X-ray dichroism measurements.
First, the bulk and surface electronic structure of epitaxially grown HgTe in its three-dimensional topological insulator phase is investigated. In this study, synchrotron radiation is used to address the three-dimensional band structure and orbital composition of the bulk states by employing photon-energy-dependent and polarization-dependent measurements, respectively. In addition, the topological surface state is examined on in situ grown samples using a laboratory photon source. The resulting data provide a means to experimentally localize the bulk band inversion in momentum space and to evidence the momentum-dependent change in the orbital character of the inverted bulk states.
Furthermore, a rather new series of van der Waals compounds, (MnBi\(_2\)Te\(_4\))(Bi\(_2\)Te\(_3\))\(_n\), is investigated. First, the magnetic properties of the first two members of the series, MnBi\(_2\)Te\(_4\) and MnBi\(_4\)Te\(_7\), are studied via X-ray absorption-based techniques. The topological surface state on the two terminations of MnBi\(_4\)Te\(_7\) is analyzed using circular dichroic, photon-energy-dependent, and spin-resolved photoemission. The topological state on the (MnBi\(_2\)Te\(_4\))-layer termination shows a free-standing Dirac cone with its Dirac point located in the bulk band gap. In contrast, on the (Bi\(_2\)Te\(_3\))-layer termination the surface state hybridizes with the bulk valences states, forming a spectral weight gap, and exhibits a Dirac point that is buried within the bulk continuum. Lastly, the lack of unambiguous evidence in the literature showing a temperature-dependent mass gap opening in these magnetic topological insulators is discussed through MnBi\(_2\)Te\(_4\).
Spin-Orbit Torques and Galvanomagnetic Effects Generated by the 3D Topological Insulator HgTe
(2021)
Nature shows us only the tail of the lion. But I have no doubt that the lion belongs with it even if he cannot reveal himself all at once. Albert Einstein
In my dissertation, I addressed the question of whether the 3D topological insulator mercury telluride (3D TI HgTe) is a suitable material for spintronics applications. This question was addressed by investigating the SOTs generated by the 3D TI HgTe in an adjacent ferromagnet (Permalloy) by using the ferromagnetic resonance technique (SOT-FMR).
In the first part of the dissertation, the reader was introduced to the mathematical description of the SOTs of a hybrid system consisting of a topological insulator (TI) and a ferromagnet (FM). Furthermore, the sample preparation and the measurement setup for the SOT-FMR measurements were discussed. Our SOT-FMR measurements showed that at low temperatures (T = 4.2 K) the out-of-plane component of the torque is dominant. At room temperature, both in-plane and out-of-plane components of the torque could be observed. From the symmetry of the mixing voltage (Figs. 3.14 and 3.15) we could conclude that the 3D TI HgTe may be efficient for the generation of spin torques in the permalloy [1]. The investigations reported here showed that the SOT efficiencies generated by the 3D TI HgTe are comparable with other existent topological insulators (see Fig. 3.17). We also discussed in detail the parasitic effects (such as thermovoltages) that can contribute to the correct interpretation of the spin torque efficiencies.
Although the results reported here provide several indications that the 3D TI HgTe might be efficient in exerting spin-torques in adjacent ferromagnets [2], the reader was repeatedly made aware that parasitic effects might contaminate the correct writing and reading of the information in the ferromagnet. These effects should be taken into consideration when interpreting results in the published literature claiming high spin-orbit torque efficiencies [2–4]. The drawbacks of the SOT-FMR measurement method led to a further development of our measurement concept, in which the ferromagnet on top of the 3D TI HgTe was replaced by a
spin-valve structure. In contrast with our measurements, in this measurement setup, the current flowing through the HgTe is known and changes in the spin-valve resistance can be read via the GMR effect.
Moreover, the SOT-FMR experiments required the application of an in-plane magnetic field up to 300 mT to define the magnetization direction in the ferromagnet. Motivated by this fact, we investigated the influence of an in-plane magnetic field in the magnetoresistance of the 3D TI HgTe. The surprising results of these measurements are described in the second part of the dissertation. Although the TI studied here is non-magnetic, its transversal MR (Rxy) showed an oscillating behavior that depended on the angle between the in-plane magnetic field and the electrical current. This effect is a typical property of ferromagnetic materials and is called planar Hall effect (PHE) [5, 6]. Moreover, it was also shown that the PHE amplitude (Rxy) and the longitudinal resistance (Rxx) oscillate as a function of the in-plane magnetic field amplitude for a wide range of carrier densities of the topological insulator.
The PHE was already described in another TI material (Bi2−xSbxTe3) [7]. The authors suggested as a possible mechanism the scattering of the electron off impurities that are polarized by an in-plane magnetic field. We critically discussed this and other theoretical proposed mechanisms existent in the literature [8, 9].
In this thesis, we attempted to explain the origin of the PHE in the 3D TI HgTe by anisotropies in the band structure of this material. The k.p calculations based on 6-orbitals were able to demonstrate that an interplay between Rashba, Dresselhaus, and in-plane magnetic field deforms the Fermi contours of the camel back band of the 3D TI HgTe, which could lead to anisotropies in its conductivity. However, the magnetic fields needed to experimentally observe this effect are as
high as 40 T, i.e., one order of magnitude higher than reported in our experiments. Additionally, calculations of the DoS to assess if there is a difference in the states for Bin parallel and Bin perpendicular to the current were, so far, inconclusive. Moreover, the complicated dependence of Rashba in the p-conducting
regime of HgTe [10] makes it not straightforward the inclusion of this term in the band structure calculations.
Despite the extensive efforts to understand the origin of the galvanomagnetic effects in the 3D TI HgTe, we could not determine a clear mechanism for the origin of the PHE and the MR oscillations studied in this thesis. However, our work clarifies and excludes a few mechanisms reported in the literature as the origin of these effects in the 3D TI HgTe. The major challenge, which still needs to be overcome, is to find a model that simultaneously explains the PHE, the gate dependence, and the oscillations in the magnetoresistance of the 3D TI HgTe as a function of the in-plane magnetic field.
To conclude, the author would like to express her hope to have brought the reader closer to the complexity of the questions addressed in this thesis and to have initiated them into the art of properly conducting electrical transport measurements on topological insulators with in-plane magnetic fields.
This thesis focuses on investigating magneto-transport properties of a ferromagnetic topological insulator (V,Bi,Sb)2Te3. This material is most famously known for exhibiting the quantum anomalous Hall effect, a novel quantum state of matter that has opened up possibilities for potential applications in quantum metrology as a quantum standard of resistance, as well as for academic investigations into unusual magnetic properties and axion electrodynamics. All of those aspects are investigated in the thesis.
One of the most significant technological advances in history was driven by the utilization of a new material class: semiconductors.
Its most important application being the transistor, which is indispensable in our everyday life. The technological advance in the semiconductor industry, however, is about to slow down. Making transistors ever smaller to increase the performance and trying to reduce and deal with the dissipative heat will soon reach the limits dictated by quantum mechanics with Moore himself, predicting the death of his famous law in the next decade.
A possible successor for semiconductor transistors is the recently discovered material class of topological insulators. A material which in its bulk is insulating but has topological protected metallic surface states or edge states at its boundary. Their electrical transport characteristics include forbidden backscattering and spin-momentum-locking with the spin of the electron being perpendicular to its momentum. Topological insulators therefore offer an opportunity for high performance devices with low dissipation, and applications in spintronic where data is stored and processed at the same point.
The topological insulator Bi\(_2\)Se\(_3\) and related compounds offer relatively high energy band gaps and a rather simple band structure with a single dirac cone at the gamma point of the Brillouin zone. These characteritics make them ideal candidates to study the topological surface state in electrical transport experiments and explore its physics.
Novel appraches to the molecular beam epitaxy of core-shell nanowires in the group II telluride material system were explored in this work. Significant advances in growth spurred the development of a flexible and reliable platform for a charge transport characterization of the topological insulator HgTe in a tubular nanowire geometry. The transport results presented provide an important basis for the design of future studies that strive for the experimental realization of topological charge transport in the quantum wire limit.
Topological phenomena known from solid state physics have been transferred to a variety of other classical and quantum systems. Due to the equivalence of the Hamiltonian matrix describing tight binding models and the grounded circuit Laplacian describing an electrical circuit we can investigate such phenomena in circuits. By implementing different Hermitian topological models general suggestions on designing those types of circuit are worked out with the aim of minimizing unwanted coupling effects and parasitic admittances in the circuit. Here the existence and the spatial profile of topological states as well as the band structure of the model can be determined.
Due to the complex nature of electric admittance the investigations can be directly expanded to systems with broken Hermiticity. The particular advantages of the experimental investigation of non-exclusively topological phenomena by means of electric circuits come to light in the realization of non-Hermitian and non-linear models. Here we find limitation of the Hermitian bulk-boundary correspondence principle, purely real eigenvalues in non-Hermitian PT-symmetrical systems and edge localization of all eigenstates in non-Hermitian and non-reciprocal systems, which in literature is termed the non-Hermitian skin effect.
When systems obeying non-linear equations are studied, the grounded circuit Laplacian based on the Fourier-transform cannot be applied anymore. By combination of the connectivity of a topological system together with non-linear van der Pol oscillators self-activated and self-sustained topological edge oscillations can be found. These robust high frequency sinusoidal edge oscillations differ significantly from low frequency relaxation oscillations, which can be found in the bulk of the system.
Einerseits besteht die einfachste Möglichkeit zum Ladungs- und Informationstransport zwischen zwei Punkten in deren direkter Verbindung durch eindimensionale Kanäle. Andererseits besitzen topologische Materialien exotische und äußerst vorteilhafte Eigenschaften, weshalb es nahe liegt, dass schon bald neue Anwendungen aus ihnen realisiert werden. Wenn diese beiden Entwicklungen zusammenkommen, dann ist ein grundlegendes Verständnis von Quanteninterferenz oder Hybridisierungseffekten in eindimensionalen, topologischen Kanälen von fundamentaler Wichtigkeit. Deshalb werden in der vorliegenden Arbeit Wechselwirkungen von eindimensionalen, topologisch geschützten Kantenzuständen, die an ungeradzahligen Stufenkanten auf der (001)–Oberfläche von Pb1−xSnxSe auftreten, untersucht. Aufgrund der lateralen Lokalisierung auf wenige Nanometer um eine Stufenkante herum und der Notwendigkeit zwischen gerad- und ungeradzahligen Stufenkantenhöhen zu unterscheiden, bieten sich die Rastertunnelmikroskopie und -spektroskopie als Methoden an. Die neu entdeckten Kopplungs- bzw. Wechselwirkungseffekte zwischen benachbarten Kantenzuständen treten auf, sobald der Stufe zu Stufe Abstand einen kritischen Wert von dkri ≈ 25nm unterschreitet. Dieses Kriterium kann durch verschiedene räumliche Anordnungen von Stufenkanten erfüllt werden. Infolgedessen werden sich kreuzende, parallel verlaufende und zusammenlaufende Stufenkanten genauer untersucht. Bei letzteren verändert sich entlang der Struktur kontinuierlich der Abstand und damit die Kopplungsstärke zwischen den beiden Randkanälen. Infolgedessen wurden drei Koppelungsregime identifiziert. (I) Ausgehend von einer schwachen Wechselwirkung zeigt der für die Kantenzustände charakteristische Peak im Spektrum zunächst eine Verbreiterung und Verminderung der Intensität. (II) Mit weiter zunehmender Wechselwirkung beginnt sich der Zustand in zwei Peaks aufzuspalten, sodass ab dkri ≈ 15nm an beiden Stufenkanten durchgehen eine Doppelpeak zu beobachten ist . Mit weiter abnehmendem Abstand erreicht die Aufspaltung Werte von einigen 10 meV, während sich die Intensität weiter reduziert. (III) Sobald zwei Stufenkanten weniger als etwa 5nm voneinander getrennt sind, konvergieren aufgrund der schwindenden Intensität und des sinkenden energetischen Abstands der beiden Peaks zu den van Hove Singularitäten die Spektren an den Stufenkanten gegen das Spektrum über einer Terrasse. i Die Aufspaltung verläuft in den Bereichen I und II asymmetrisch, d. h. ein Peak verbleibt ungefähr bei der Ausgangsenergie, während der andere mit zunehmender Kopplung immer weiter weg schiebt. Bezüglich der Asymmetrie kann kein Unterschied festgestellt werden, ob die zusammenlaufenden Stufenkanten eine Insel oder Fehlstelleninsel bilden oder ob die Stufenkanten sogar gänzlich parallel verlaufen. Es zeigt sich keine Präferenz, ob zunächst der niederenergetische oder der hochenergetische Peak schiebt. Erst im Regime starker Kopplung (III) kann beobachtet werden, dass beide Peaks die Ausgangsenergie deutlich verlassen. Im Gegensatz dazu kann bei sich kreuzenden Stufen ein erheblicher Einfluss der Geometrie, in Form des eingeschlossenen Winkels, auf das Spektrum beobachtet werden. Unabhängig vom Winkel existiert am Kreuzungspunkt selbst kein Kantenzustand mehr. Die Zustände an den vier Stufen beginnen, abhängig vom Winkel, etwa 10-15nm vor dem Kreuzungspunkt abzuklingen. Überraschenderweise zeigt sich dabei, dass im Fall rechtwinkliger Stufen gar keine Aufspaltung zu beobachten ist, während bei allen anderen Winkeln ein Doppelpeak festgestellt werden kann. Diese Entdeckung deutet auf Orthogonalität bezüglich einer Quantenzahl bei den beteiligten Kantenzustände hin. Neben einer nur theoretisch vorhergesagten Spinpolarisation kann dieser Effekt auch von dem orbitalem Charakter der beteiligten Dirac–Kegel verursacht sein. Da der topologische Schutz in Pb1−xSnxSe durch Kristallsymmetrien garantiert ist, wird als letzter intrinsischer Effekt der Einfluss von eindimensionalen Defekten auf die Kantenzustände untersucht. Berücksichtigt werden dabei ein nicht näher klassifizierbarer, oberflächennaher Defekt und Schraubversetzungen. In beiden Fällen kann ebenfalls eine Aufspaltung des Kantenzustands in einen Doppelpeak gezeigt werden. Im zweiten Teil dieser Arbeit werden die Grundlagen für eine Wiederverwendung von (Pb,Sn)Se–Oberflächen bei zukünftige Experimenten mit (magnetischen) Adatomen geschaffen. Durch Kombination von Inoenzerstäubung und Tempern wird dabei nicht nur eine gereinigte Oberfläche erzeugt, sondern es kann auch das Ferminiveau gezielt erhöht oder gesenkt werden. Dieser Effekt beruht auf eine Modifikation der Sn– Konzentration und der von ihr kontrollierten Anzahl an Defektelektronen. Als letztes sind erste Messungen an Cu- und Fe–dotierte Proben gezeigt. Durch die Adatome tritt eine n–Dotierung auf, welche den Dirac–Punkt des Systems in Richtung des Ferminiveaus verschiebt. Sobald er dieses erreicht hat kommt es zu Wechselwirkungsphänomenen an freistehenden Stufenkanten. Dies führt zu einer Doppelpeakstruktur mit einer feinen Aufspaltung von wenigen meV. Das Phänomen ist auf ein schmales Energiefenster beschränkt, bei dem die Lage des Dirac–Punkts nur etwa 5 meV (in beide Richtungen) von der des Ferminiveaus abweichen darf.
A novel growth method has been developed, allowing for the growth of strained HgTe shells on CdTe nanowires (NWs). The growth of CdTe-HgTe core-shell NWs required high attention in controlling basic parameters like substrate temperature and the intensity of supplied material fluxes. The difficulties in finding optimized growth conditions have been successfully overcome in this work.
We found the lateral redistribution of liquid growth seeds with a ZnTe growth start to be crucial to trigger vertical CdTe NW growth. Single crystalline zinc blende CdTe NWs grew, oriented along [111]B. The substrate temperature was the most critical parameter to achieve straight and long wires. In order to adjust it, the growth was monitored by reflection high-energy electron diffraction, which was used for fine tuning of the temperature over time in each growth run individually. For optimized growth conditions, a periodic diffraction pattern allowed for the detailed analysis of atomic arrangement on the surfaces and in the bulk. The ability to do so reflected the high crystal quality and ensemble uniformity of our CdTe NWs. The NW sides were formed by twelve stable, low-index crystalline facets. We observed two types stepped and polar sides, separated by in total six flat and non-polar facets.
The high crystalline quality of the cores allowed to grow epitaxial HgTe shells around. We reported on two different heterostructure geometries. In the first one, the CdTe NWs exhibit a closed HgTe shell, while for the second one, the CdTe NWs are overgrown mainly on one side. Scanning electron microscopy and scanning transmission electron microscopy confirmed, that many of the core-shell NWs are single crystalline zinc blende and have a high uniformity. The symmetry of the zinc blende unit cell was reduced by residual lattice strain. We used high-resolution X-ray diffraction to reveal the strain level caused by the small lattice mismatch in the heterostructures. Shear strain has been induced by the stepped hetero-interface, thereby stretching the lattice of the HgTe shell by 0.06 % along a direction oriented with an angle of 35 ° to the interface.
The different heterostructures obtained, were the base for further investigation of quasi-one-dimensional crystallites of HgTe. We therefore developed methods to reliably manipulate, align, localize and contact individual NWs, in order to characterize the charge transport in our samples. Bare CdTe cores were insulating, while the HgTe shells were conducting. At low temperature we found the mean free path of charge carriers to be smaller, but the phase coherence length to be larger than the sample size of several hundred nanometers. We observed universal conductance fluctuations and therefore drew the conclusion, that the trajectories of charge carriers are defined by elastic backscattering at randomly distributed scattering sites. When contacted with superconducting leads, we saw induced superconductivity, multiple Andreev reflections and the associated excess current. Thus, we achieved HgTe/superconductor interfaces with high interfacial transparency.
In addition, we reported on the appearance of peaks in differential resistance at Delta/e for HgTe-NW/superconductor and 2*Delta/e for superconductor/HgTe-NW/superconductor junctions, which is possibly related to unconventional pairing at the HgTe/superconductor interface. We noticed that the great advantage of our self-organized growth is the possibility to employ the metallic droplet, formerly seeding the NW growth, as a superconducting contact. The insulating wire cores with a metallic droplet at the tip have been overgrown with HgTe in a fully in-situ process. A very high interface quality was achieved in this case.
Topologische Isolatoren gehören zu einer Klasse von Materialien, an deren Realisation im Rahmen der zweiten quantenmechanischen Revolution gearbeitet wird. Einerseits sind zahlreiche Fragestellungen zu diesen Materialen und deren Nutzbarmachung noch nicht beantwortet, andererseits treiben vielversprechende Anwendungen im Feld der Quantencomputer und Spintronik die Lösung dieser Fragen voran. Topologische Rand- bzw. Oberflächenzustände wurden für unterschiedlichste Materialien und Strukturen theoretisch vorhergesagt, so auch für GaSb/InAs Doppelquantenfilme und Bi2Se3. Trotz intensiver Forschungsarbeiten und großer Fortschritte bedürfen viele Prozesse v. a. im Bereich der Probenherstellung und Verarbeitung noch der Optimierung. Die vorliegende Arbeit präsentiert Ergebnisse zur Molekularstahlepitaxie, zur Probenfertigung sowie zu elektro-optisch modulierter Transportuntersuchung von GaSb/InAs Doppelquantenfilmen und der epitaktischen Fertigung von Bi2Se3 Nanostrukturen.
Im ersten Teil dieser Arbeit werden die Parameter zur Molekularstrahlepitaxie sowie die Anpassung der Probenfertigung von GaSb/InAs Doppelquantenfilmen an material- und untersuchungsbedingte Notwendigkeiten beschrieben. Dieser verbesserte Prozess ermöglicht die Fertigung quantitativ vergleichbarer Probenserien. Anschließend werden Ergebnisse für Strukturen mit variabler InAs Schichtdicke unter elektrostatischer Kontrolle mit einem Frontgate präsentiert. Auch mit verbessertem Prozess zeigten sich Leckströme zum Substrat. Diese erschweren eine elektrostatische Kontrolle über Backgates. Die erstmals durch optische Anregung präsentierte Manipulation der Ladungsträgerart sowie des Phasenzustandes in GaSb/InAs Doppelquantenfilmen bietet eine Alternative zu problembehafteten elektrostatisch betriebenen Gates.
Im zweiten Teil wird die epitaktische Herstellung von Bi2Se3 Nanostrukturen gezeigt. Mit dem Ziel, Vorteile aus dem erhöhten Oberfläche-zu-Volumen Verhältnis zu ziehen, wurden im Rahmen dieser Arbeit erstmals Bi2Se3 Nanodrähte und -flocken mittels Molekularstrahlepitaxie für die Verwendung als topologischer Isolator hergestellt.
Ein Quantensprung – Kapitel 1 führt über die umgangssprachliche Wortbedeutung des Quantensprungs und des damit verbundenen Modells der Quantenmechanik in das Thema. Die Anwendung dieses Modells auf Quanten-Ensembles und dessen technische Realisation wird heute als erste Quantenmechanische Revolution bezeichnet und ist aus unserem Alltag nicht mehr wegzudenken. Im Rahmen der zweiten Quantenmechanischen Revolution soll nun die Anwendung auf einzelne Zustände realisiert und technisch nutzbar gemacht werden. Hierbei sind topologische Isolatoren ein vielversprechender Baustein. Es werden das Konzept des topologischen Isolators sowie die Eigenschaften der beiden in dieser Arbeit betrachteten Systeme beschrieben: GaSb/InAs Doppelquantenfilme und Bi2Se3 Nanostrukturen.
GaSb/InAs Doppelquantenfilme
Kapitel 2 beschreibt die notwendigen physikalischen und technischen Grundlagen. Ausgehend von der Entdeckung des Hall-Effekts 1879 werden die Quanten-Hall-Effekte eingeführt. Quanten-Spin-Hall-Isolatoren oder allgemeiner topologische Isolatoren sind Materialien mit einem isolierenden Inneren, weisen an der Oberfläche aber topologisch geschützte Zustände auf. Doppelquantenfilme aus GaSb/InAs, die in AlSb gebettet werden, weisen – abhängig vom Aufbau der Heterostruktur – eine typische invertierte Bandstruktur auf und sind ein vielversprechender Kandidat für die Nutzbarmachung der topologischen Isolatoren. GaSb, InAs und AlSb gehören zur 6,1 Ångström-Familie, welche für ihre opto-elektronischen Eigenschaften bekannt ist und häufig verwendet wird. Die Eigenschaften sowie die technologischen Grundlagen der epitaktischen Fertigung von Heterostrukturen aus den Materialien der 6,1 Ångström-Familie mittels Molekularstrahlepitaxie werden besprochen. Abschließend folgen die Charakterisierungs- und Messmethoden. Ein Überblick über die Literatur zu GaSb/InAs Doppelquantenfilmen in Bezug auf topologische Isolatoren rundet dieses Kapitel ab.
Zu Beginn dieser Arbeit stellten Kurzschlusskanäle eine Herausforderung für die Detektion der topologischen Randkanäle dar. Kapitel 3 behandelt Lösungsansätze hierfür und beschreibt die Verbesserung der Herstellung von GaSb/InAs Doppelquantenfilm-Strukturen mit Blick auf die zukünftige Realisation topologischer Randkanäle. In Abschnitt 3.1 werden numerische Simulationen präsentiert, die sich mit der Inversion der elektronischen Niveaus in Abhängigkeit der GaSb und InAs Schichtdicken dGaSb und dInAs beschäftigen. Ein geeigneter Schichtaufbau für Strukturen mit invertierter Bandordnung liegt im Parameterraum von 8 nm ≾ dInAs ≾ 12 nm und 8 nm ≾ dGaSb ≾ 10 nm. Abschnitt 3.2 beschreibt die epitaktische Herstellung von GaSb/InAs Doppelquantenfilmen mittels Molekularstrahlepitaxie. Die Fertigung eines GaSb Quasisubstrats auf ein GaAs Substrat wird präsentiert und anschließend der Wechsel auf native GaSb Substrate mit einer reduzierten Defektdichte sowie reproduzierbar hoher Probenqualität begründet. Ein Wechseln von binärem AlSb auf gitterangepasstes AlAsSb erlaubt die Verwendung dickerer Barrieren. Versuche, eine hinlängliche Isolation des Backgates durch das Einbringen einer dickeren unteren Barriere zu erreichen, werden in diesem Abschnitt diskutiert. In Abschnitt 3.3 wird die Optimierung der Probenprozessierung gezeigt. Die Kombination zweier angepasster Ätzprozesse – eines trockenchemischen und eines sukzessive folgenden nasschemischen Schrittes – liefert zusammen mit der Entfernung von Oberflächenoxiden reproduzierbar gute Ergebnisse. Ein materialselektiver Ätzprozess mit darauffolgender direkter Kontaktierung des InAs Quantenfilmes liefert gute Kontaktwiderstände, ohne Kurzschlusskanäle zu erzeugen. Abschnitt 3.4 gibt einen kompakten Überblick, über den im weiteren Verlauf der Arbeit verwendeten „best practice“ Prozess.
Mit diesem verbesserten Prozess wurden Proben mit variabler InAs Schichtdicke gefertigt und bei 4,2 K auf ihre Transporteigenschaften hin untersucht. Dies ist in Kapitel 4 präsentiert und diskutiert. Abschnitt 4.1 beschreibt die Serie aus drei Proben mit GaSb/InAs Doppelquantenfilm in AlSb Matrix mit einer variablen InAs Schichtdicke. Die InAs Schichtdicke wurde über numerische Simulationen so gewählt, dass je eine Probe im trivialen Regime, eine im invertierten Regime und eine am Übergang liegt. Gezeigt werden in Kapitel 4.2 Magnetotransportmessungen für konstante Frontgatespannungen sowie Messungen mit konstantem Magnetfeld gegen die Frontgatespannung. Die Messungen bestätigen eine Fertigung quantitativ vergleichbarer Proben, zeigen aber auch, dass keine der Proben im topologischen Regime liegt. Hierfür kommen mehrere Ursachen in Betracht: Eine Überschätzung der Hybridisierung durch die numerische Simulation, zu geringe InAs Schichtdicken in der Fertigung oder ein asymmetrisches Verschieben mit nur einem Gate (Kapitel 4.3). Zur Reduktion der Volumenleitfähigkeit wurden Al-haltigen Schichten am GaSb/InAs Übergang eingebracht. Die erwartete Widerstandssteigerung konnte in ersten Versuchen nicht gezeigt werde.
Die in Kapitel 5 gezeigte optische Manipulation des dominanten Ladungsträgertyps der InAs/GaSb-Doppelquantentöpfe gibt eine zusätzliche Kontrollmöglichkeit im Phasendiagramm. Optische Anregung ermöglicht den Wechsel der Majoritätsladungsträger von Elektronen zu Löchern. Dabei wird ein Regime durchlaufen, in dem beide Ladungsträger koexistieren. Dies weist stark auf eine Elektron-Loch-Hybridisierung mit nichttrivialer topologischer Phase hin. Dabei spielen zwei unterschiedliche physikalische Prozesse eine Rolle, die analog eines Frontgates bzw. eines Backgates wirken. Der Frontgate Effekt beruht auf der negativ persistenten Photoleitfähigkeit, der Backgate Effekt fußt auf der Akkumulation von Elektronen auf der Substratseite. Das hier gezeigte optisch kontrollierte Verschieben der Zustände belegt die Realisation von opto-elektronischem Schalten zwischen unterschiedlichen topologischen Phasen. Dies zeigt die Möglichkeit einer optischen Kontrolle des Phasendiagramms der topologischen Zustände in GaSb/InAs Doppelquantenfilmen. In Abschnitt 5.1 wird die optische Verstimmung von GaSb/InAs Quantenfilmen gezeigt und erklärt. Sie wird in Abhängigkeit von der Temperatur, der Anregungswellenlänge sowie der Anregungsintensität untersucht. Kontrollversuche an Proben mit einem unterschiedlichen Strukturaufbau zeigen, dass das Vorhandensein eines Übergitters auf der Substratseite der Quantenfilmstruktur essentiell für die Entstehung der Backgate-Wirkung ist (Abschnitt 5.2). Abschließend werden in Abschnitt 5.3 die Erkenntnisse zur optischen Kontrolle zusammengefasst und deren Möglichkeiten, wie optisch definierte topologischen Phasen-Grenzflächen, diskutiert.
Bi2Se3 Nanostrukturen
Mit Blick auf die Vorteile eines erhöhten Oberfläche-zu-Volumen Verhältnisses ist die Verwendung von Nanostrukturen für das Anwendungsgebiet der dreidimensionalen topologischen Isolatoren effizient. Mit dem Ziel, diesen Effekt für die Realisation des topologischen Isolators in Bi2Se3 auszunutzen, wurde im Rahmen dieser Arbeit erstmalig das Wachstum von Bi2Se3 Nanodrähten und -flocken mit Molekularstrahlepitaxie realisiert. In Kapitel 6 werden technische und physikalische Grundlagen hierzu erläutert (Abschnitt 6.1). Ausgehend von einer Einführung in dreidimensionale topologische Isolatoren werden die Eigenschaften des topologischen Zustandes in Bi2Se3 gezeigt. Darauf folgen die Kristalleigenschaften von Bi2Se3 sowie die Erklärung des epitaktischen Wachstums von Nanostrukturen mit Molekularstrahlepitaxie. In Abschnitt 6.2 schließt sich die Beschreibung der epitaktischen Herstellung an. Die Kristallstruktur wurde mittels hochauflösender Röntgendiffraktometrie und Transmissionselektronenmikroskopie als Bi2Se3 identifiziert. Rasterelektronenmikroskopie-Aufnahmen zeigen Nanodrähte und Nanoflocken auf mit Gold vorbehandelten bzw. nicht mit Gold vorbehandelten Proben. Der Wachstumsmechanismus für Nanodrähte kann nicht zweifelsfrei definiert werden. Das Fehlen von Goldtröpfchen an der Drahtspitze legt einen wurzelbasierten Wachstumsmechanismus nahe (Abschnitt 6.3).
The subject of this thesis is the control of strain in HgTe thin-film crystals. Such systems are members of the new class of topological insulator materials and therefore of special research interest. A major task was the experimental control of the strain in the HgTe films. This was achieved by a new epitaxial approach and confirmed by cristallographic analysis and magneto-transport measurements.
In this work, strain was induced in thin films by means of coherent epitaxy on substrate crystals. This means that the film adopts the lattice constant of the substrate in the plane of the substrate-epilayer interface. The level of strain is determined by the difference between the strain-free lattice constants of the substrate and epilayer material (the so-called lattice mismatch). The film responds to an in-plane strain with a change of its lattice constant perpendicular to the interface. This relationship is crucial for both the correct interpretation of high resolution X-ray diffraction (HRXRD) measurements, and the precise determination of the band dispersion. The lattice constant of HgTe is smaller than the lattice constant of CdTe. Therefore, strain in HgTe is tensile if it is grown on a CdTe substrate. In principle, compressive strain can be achieved by using an appropriate \(\text{Cd}_{1-x}\text{Zn}_{x}\text{Te}\) substrate. This concept was modified and applied in this work.
Epilayers have been fabricated by molecular-beam epitaxy (MBE). The growth of thick buffer layers of CdTe on GaAs:Si was established as an alternative to commercial CdTe and \(text{Cd}_{0.96}\text{Zn}_{0.04}\text{Te}\) substrates. The growth conditions have been optimized by an analysis of atomic force microscopy and HRXRD studies. HRXRD measurements reveal a power-law increase of the crystal quality with increasing thickness. Residual strain was found in the buffer layers, and was attributed to a combination of finite layer thickness and mismatch of the thermal expansion coefficients of CdTe and GaAs. In order to control the strain in HgTe epilayers, we have developed a new type of substrate with freely adjustable lattice constant.
CdTe-\(\text{Cd}_{0.5}\text{Zn}_{0.5}\text{Te}\) strained-layer-superlattices have been grown by a combination of MBE and atomic-layer epitaxy (ALE), and have been analyzed by HRXRD. ALE of the \(\text{Cd}_{0.5}\text{Zn}_{0.5}\text{Te}\) layer is self-limiting to one monolayer, and the effective lattice constant can be controlled reproducibly and straightforward by adjusting the CdTe layer thickness. The crystal quality has been found to degrade with increasing Zn-fraction. However, the effect is less drastic compared to single layer \(\text{Cd}_{1-x}\text{Zn}_{x}\text{Te}\) solid solutions. HgTe quantum wells (QWs) sandwiched in between CdHgTe barriers have been fabricated in a similar fashion on superlattices and conventional CdTe and \(\text{Cd}_{0.96}\text{Zn}_{0.04}\text{Te}\) substrates. The lower critical thickness of the CdHgTe barrier material grown on superlattice substrates had to be considered regarding the sample design. The electronic properties of the QWs depend on the strain and thickness of the QW. We have determined the QW thickness with an accuracy of \(\pm\)0.5 nm by an analysis of the beating patterns in the thickness fringes of HRXRD measurements and X-ray reflectometry measurements. We have, for the first time, induced compressive strain in HgTe QWs by an epitaxial technique (i.e. the effective lattice constant of the superlattice is lower compared to the lattice constant of HgTe). The problem of the lattice mismatch between superlattice and barriers has been circumvented by using CdHgTe-ZnHgTe superlattices instead of CdHgTe as a barrier material. Furthermore, the growth of compressively strained HgTe bulk layers (with a thickness of at least 50 nm) was demonstrated as well.
The control of the state of strain adds a new degree of freedom to the design of HgTe epilayers, which has a major influence on the band structure of QWs and bulk layers. Strain in bulk layers lifts the degeneracy of the \(\Gamma_8\) bands at \(\mathbf{k}=0\). Tensile strain opens an energy gap, compressive strain shifts the touching points of the valence- and conduction band to positions in the Brillouin zone with finite \(\mathbf{k}\). Such a situation has been realized for the first time in the course of this work. For QWs in the inverted regime, it is demonstrated that compressive strain can be used to significantly enhance the thermal energy gap of the two-dimensional electron gas (2DEG). In addition, semi-metallic and semiconducting behavior is expected in wide QWs, depending on the state of strain. An examination of the temperature dependence of the subband ordering in QWs revealed that the band gap is only temperature-stable for appropriate sample parameters and temperature regimes. The band inversion is always lifted for sufficiently high temperatures.
A large number of models investigate the influence of the band gap on the stability of the quantum-spin-Hall (QSH) effect. An enhancement of the stability of QSH edge state conductance is expected for enlarged band gaps. Furthermore, experimental studies on the temperature dependence of the QSH conductance are in contradiction to theoretical predictions. Systematic studies of these aspects have become feasible based on the new flexibility of the sample design.
Detailed low-temperature magnetotransport studies have been carried out on QWs and bulk layers. For this purpose, devices have been fabricated lithographically, which consist of two Hall-bar geometries with different dimensions. This allows to discriminate between conductance at the plane of the 2DEG and the edge of the sample. The Fermi energy in the 2DEG has been adjusted by means of a top gate electrode. The strain-induced transition from semi-metallic to semiconducting characteristics in wide QWs was shown. The magnitude of the semi-metallic overlap of valence- and conduction band was determined by an analysis of the two-carrier conductance and is in agreement with band structure calculations. The band gap of the semiconducting sample was determined by measurements of the temperature dependence of the conductance at the charge-neutrality point. Agreement with the value expected from theory has been achieved for the first time in this work. The influence of the band gap on the stability of QSH edge state conductance has been investigated on a set of six samples. The band gap of the set spans a range of 10 to 55 meV. The latter value has been achieved in a highly compressively strained QW, has been confirmed by temperature-dependent conductance measurements, and is the highest ever reported in the inverted regime. Studies of the carrier mobility reveal a degradation of the sample quality with increasing Zn-fraction in the superlattice, in agreement with HRXRD observations. The enhanced band gap does not suppress scattering mechanisms in QSH edge channels, but lowers the conductance in the plane of the 2DEG. Hence, edge state conductance is the dominant conducting process even at elevated temperatures. An increase in conductance with increasing temperature has been found, in agreement with reports from other groups. The increase follows a power-law dependency, the underlying physical mechanism remains open. A cause for the lack of an increase of the QSH edge state conductance with increasing energy gap has been discussed. Possibly, the sample remains insulating even at finite carrier densities, due to localization effects. The measurement does not probe the QSH edge state conductance at the situation where the Fermi energy is located in the center of the energy gap, but in the regime of maximized puddle-driven scattering. In a first set of measurements, it has been shown that the QSH edge state conductance can be influenced by hysteretic charging effects of trapped states in the insulating dielectric. A maximized conductance of \(1.6\ \text{e}^2/\text{h}\) was obtained in a \(58\ \mu\text{m}\) edge channel. Finally, measurements on three dimensional samples have been discussed. Recent theoretical works assign compressively strained HgTe bulk layers to the Weyl semi-metal class of materials. Such layers have been synthesized and studied in magnetotransport experiments for the first time. Pronounced quantum-Hall- and Shubnikov-de-Haas features in the Hall- and longitudinal resistance indicate two-dimensional conductance on the sample surface. However, this conductance cannot be assigned definitely to Weyl surface states, due to the inversion of \(\Gamma_6\) and \(\Gamma_8\) bands. If a magnetic field is aligned parallel to the current in the device, a decrease in the longitudinal resistance is observed with increasing magnetic field. This is a signature of the chiral anomaly, which is expected in Weyl semi-metals.
The motivation for this work has been contributing a step to the advancement of technology. A next leap in technology would be the realization of a scalable quantum computer. One potential route is via topological quantum computing. A profound understanding of topological materials is thus essential. My work contributes by the investigation of the exemplary topological material HgTe. The focus lies on the understanding of the topological surface states (TSS) and new possibilities to manipulate them appropriately. Traditionally top gate electrodes are used to adjust the carrier density in such semi-conductor materials. We found that the electric field of the top gate can further alter the properties of the HgTe layer. The formation of additional massive Volkov-Pankratov states limits the accessibility of the TSS. The understanding of these states and their interplay with the TSS is necessary to appropriately design devices and to ensure their desired properties. Similarly, I observed the existence and stability of TSSs even without a bandgap in the bulk band structure in the inversion induced Dirac semi-metal phase of compressively strained HgTe. The finding of topological surface states in inversion-induced Dirac semi-metals provides a consistent and simple explanation for the observation reported for \(\text{Cd}_3\text{As}_2\).
These observations have only been possible due to the high quality of the MBE grown HgTe layers and the access of different phases of HgTe via strain engineering. As a starting point I performed Magneto-transport measurements on 67 nm thick tensilely strained HgTe layers grown on a CdTe substrate. We observed multiple transport channels in this three-dimensional topological insulator and successfully identified them. Not only do the expected topological surface states exist, but also additional massive surface states have been observed. These additional massive surface states are formed due to the electrical field applied at the top gate, which is routinely used to vary the carrier density in the HgTe layer. The additional massive surface states are called Volkov-Pankratov states after B. A. Volkov and O. A. Pankratov. They predicted the existence of similar massive surface states at the interface of materials with mutually inverted bands. We first found indications for such massive Volkov-Pankratov states in high-frequency compressibility measurements for very high electron densities in a fruitful collaboration with LPA in Paris. Magneto-transport measurements and \(k \cdot p\) calculations revealed that such Volkov-Pankratov states are also responsible for the observed whole transport. We also found indications for similar massive VPS in the electron regime, which coexist with the topological surface states. The topological surface states exist over the full investigated gate range including a regime of pure topological insulator transport. To increase the variability of the topological surface states we introduced a modulation doping layer in the buffer layer. This modulation doping layer also enabled us to separate and identify the top and bottom topological surface states.
We used the variability of the bulk band structure of HgTe with strain to engineer the band structure of choice using virtual substrates. The virtual substrates enable us to grow compressively strained HgTe layers that do not possess a bandgap, but instead linear crossing points. These layers are predicted to beDirac semi-metals. Indeed I observed also topological surface states and massive Volkov-Pankratov states in the compressively strained Dirac semi-metal phase. The observation of topological surfaces states also in the Dirac semi-metal phase has two consequences: First, it highlights that no bulk bandgap is necessary to observe topological surface states. Second, the observation of TSS also in the Dirac semi-metal phase emphasizes the importance of the underlying band inversion in this phase. I could not find any clear signatures of the predicted disjoint topological surface states, which are typically called Fermi-arcs. The presence of topological surface states and massive Volkov-Pankratov states offer a simple explanation for the observed quantum Hall effect and other two-dimensional transport phenomena in the class of inversion induced Dirac semi-metals, as \(\text{Cd}_3\text{As}_2\). This emphasizes the importance of the inherent bulk band inversion of different topological materials and provides a consistent and elegant explanation for the observed phenomena in these materials. Additionally, it offers a route to design further experiments, devices, and thus the foundation for the induction of superconductivity and thus topological quantum computing.
Another possible path towards quantum computing has been proposed based on the chiral anomaly. The chiral anomaly is an apparent transport anomaly that manifests itself as an additional magnetic field-driven current in three-dimensional topological semimetals with a linear crossing point in their bulk band structure. I observed the chiral anomaly in compressively strained HgTe samples and performed multiple control experiments to identify the observed reduction of the magnetoresistance with the chiral anomaly. First, the dependence of the so-called negative magnetoresistance on the angle and strength of the magnetic field has been shown to fit the expectation for the chiral anomaly. Second, extrinsic effects as scattering could be excluded as a source for the observed negative MR using samples with different mobilities and thus impurity concentrations. Third, the necessity of the linear crossing point has been shown by shifting the electrochemical potential away from the linear crossing points, which diminished the negative magnetoresistance. Fourth, I could not observe a negative magnetoresistance in the three-dimensional topological insulator phase of HgTe. These observations together prove the existence of the chiral anomaly and verify compressively strained HgTe as Dirac semi-metal. Surprisingly, the chiral anomaly is also present in unstrained HgTe samples, which constitute a semi-metal with a quadratic band touching point. This observation reveals the relevance of the Zeeman effect for the chiral anomaly due to the lifting of the spin-degeneracy in these samples. Additionally to the chiral anomaly, the Dirac semi-metal phase of compressively strained HgTe showed other interesting effects. For low magnetic fields, a strong weak-antilocalization has been observed. Such a strong weak-anti-localization correction in a three-dimensional layer is surprising and interesting. Additionally, non-trivial magnetic field strength and direction dependencies have been observed. These include a strong positive magnetoresistance for high magnetic fields, which could indicate a metal-insulator transition. On a more device-oriented note, the semi-metal phase of unstrained HgTe constitutes the lower limit of the by strain engineering adjustable minimal carrier density of the topological surface states and thus of very high mobility.
To sum up, topological surface states have been observed in the three-dimensional topological insulator phase and the Dirac semi-metal phase of HgTe. The existence and accessibility of topological surface states are thus independent of the existence of a bandgap in the bulk band structure. The topological surface states can be accompanied by massive Volkov-Pankratov states. These VPS are created by electric fields, which are routinely applied to adjust the carrier density in semiconductor devices. The theoretical predicted chiral anomaly has been observed in the Dirac semi-metal phase of HgTe. In contrast to theoretical predictions, no indications for the Fermi-arc called disjoint surface states have been observed, but instead the topological and massive Volkov-Pankratov surface states have been found. These states are thus expected for all inversion-induced topological materials.
The combination of a topological insulator (TI) and a superconductor (S), which together
form a TI/S interface, is expected to influence the possible surface states in the
TI. It is of special interest, if the theoretical prediction of zero energy Majorana states
in this system is verifiable. This thesis presents the experimental realization of such
an interface between the TI strained bulk HgTe and the S Nb and studies if the afore
mentioned expectations are met.
As these types of interfaces were produced for the first time the initial step was
to develop a new lithographic process. Optimization of the S deposition technique as
well as the application of cleaning processes allowed for reproducible fabrication of
structures. In parallel the measurement setup was upgraded to be able to execute the
sensitive measurements at low energy. Furthermore several filters have been implemented
into the system to reduce high frequency noise and the magnetic field control
unit was additionally replaced to achieve the needed resolution in the μT range.
Two kinds of basic geometries have been studied: Josephson junctions (JJs) and
superconducting quantum interference devices (SQUIDs). A JJ consists of two Nb contacts
with a small separation on a HgTe layer. These S/TI/S junctions are one of the
most basic structures possible and are studied via transport measurements. The transport
through this geometry is strongly influenced by the behavior at the two S/TI
interfaces. In voltage dependent differential resistance measurements it was possible
to detect multiple Andreev reflections in the JJ, indicating that electrons and holes are
able to traverse the HgTe gap between both interfaces multiple times while keeping
phase coherence. Additionally using BTK theory it was possible to extract the interface
transparency of several junctions. This allowed iterative optimization for the highest
transparency via lithographic improvements at these interfaces. The increased transparency
and thus the increased coupling of the Nb’s superconductivity to the HgTe
results in a deeper penetration of the induced superconductivity into the HgTe. Due
to this strong coupling it was possible to enter the regime, where a supercurrent is
carried through the complete HgTe layer. For the first time the passing of an induced
supercurrent through strained bulk HgTe was achieved and thus opened the area for
detailed studies. The magnetic dependence of the supercurrent in the JJ was recorded,
which is also known as a Fraunhofer pattern. The periodicity of this pattern in magnetic
field compared to the JJ geometry allowed to conclude how the junction depends
on the phase difference between both superconducting contacts. Theoretical calculations
predicted a phase periodicity of 4p instead of 2p, if a TI is used as weak link
material between the contacts, due to the presence of Majorana modes. It could clearly
be shown that despite the usage of a TI the phase still was 2p periodic. By varying
further influencing factors, like number of modes and phase coherence length in the
junction, it might still be possible to reach the 4p regime with bound Majorana states
in the future. A good candidate for further experiments was found in capped HgTe
samples, but here the fabrication process still has to be developed to the same quality
as for the uncapped HgTe samples.
The second type of geometry studied in this thesis was a DC-SQUID, which consists
of two parallel JJs and can also be described as an interference device between two JJs.
The DC-SQUID devices were produced in two configurations: The symmetric SQUID,
where both JJs were identical, and the asymmetric SQUID, where one JJ was not linear,
but instead has a 90° bent. These configurations allow to test, if the predicted
uniformity of the superconducting band gap for induced superconductivity in a TI
is valid. While the phase of the symmetric SQUID is not influenced by the shape of
the band gap, the asymmetric SQUID would be in phase with the symmetric SQUID
in case of an uniform band gap and out of phase if p- or d-wave superconductivity
is dominating the transport, due to the 90° junction. As both devices are measured
one after another, the problem of drift in the coil used to create the magnetic field has
to be overcome in order to decide if the oscillations of both types of SQUIDs are in
phase. With an oscillation period of 0.5 mT and a drift rate in the range of 5.5 μT/h
the measurements on both configurations have to be conducted in a few hours. Only
then the total shift is small enough to compare them with each other. For this to be
possible a novel measurement system based on a real time micro controller was programmed,
which allows a much faster extraction of the critical current of a device. The
measurement times were reduced from days to hours, circumventing the drift problems
and enabling the wanted comparison. After the final system optimizations it has
been shown that the comparison should now be possible. Initial measurements with
the old system hinted that both types of SQUIDs are in phase and thus the expected
uniform band gap is more likely. With all needed optimizations in place it is now up
to the successors of this project to conclusively prove this last point.
This thesis has proven that it is possible to induce superconductivity in strained
bulk HgTe. It has thus realized the most basic sample geometry proposed by Fu and
Kane in 2008 for the appearance of Majorana bound states. Based on this work it is
now possible to further explore induced superconductivity in strained bulk HgTe to
finally reach a regime, where the Majorana states are both stable and detectable.
Topological insulators belong to a new quantum state of matter that is currently one of
the most recognized research fields in condensed matter physics. Strained bulk HgTe
and HgTe/HgCdTe quantum well structures are currently one of few topological insulator
material systems suitable to be studied in transport experiments. In addition
HgTe quantum wells provide excellent requirements for the conduction of spintronic
experiments. A fundamental requirement for most experiments, however, is to reliably
pattern these heterostructures into advanced nano-devices. Nano-lithography on this
material system proves to be challenging because of inherent temperature limitations,
its high reactivity with various metals and due to its properties as a topological insulator.
The current work gives an insight into why many established semiconductor
lithography processes cannot be easily transferred to HgTe while providing alternative
solutions. The presented developments include novel ohmic contacts, the prevention
of metal sidewalls and redeposition fences in combination with low temperature
(80 °C) lithography and an adapted hardmask lithography process utilizing a sacrificial
layer. In addition we demonstrate high resolution low energy (2.5 kV) electron beam
lithography and present an alternative airbridge gating technique. The feasibility of
nano-structures on HgTe quantum wells is exemplarily verified in two separate transport
experiments. We are first to realize physically etched quantum point contacts
in HgTe/HgCdTe high mobility 2DEGs and to prove their controllability via external
top-gate electrodes. So far quantum point contacts have not been reported in TI
materials. However, these constrictions are part of many proposals to probe the nature
of the helical quantum spin Hall edge channels and are suggested as injector and
detector devices for spin polarized currents. To confirm their functionality we performed
four-terminal measurements of the point contact conductance as a function of
external gate voltage. Our measurements clearly exhibit quantized conductance steps
in 2e2/h, which is a fundamental characteristic of quantum point contacts. Furthermore
we conducted measurements on the formation and control of collimated electron beams, a key feature to realize an all electrical spin-optic device. In a second study
several of the newly developed lithography techniques were implemented to produce
arrays of nano-wires on inverted and non-inverted HgTe quantum well samples. These
devices were used in order to probe and compare the weak antilocalization (WAL) in
these structures as a function of magnetic field and temperature. Our measurements
reveal that the WAL is almost an order of magnitude larger in inverted samples. This
observation is attributed to the Dirac-like dispersion of the energy bands in HgTe quantum
wells. The described lithography has already been successfully implemented and
adapted in several published studies. All processes have been optimized to guarantee
a minimum effect on the heterostructure’s properties and the sample surface, which is
especially important for probing the topological surface states of strained HgTe bulk
layers. Our developments therefore serve as a base for continuous progress to further
establish HgTe as a topological insulator and give access to new experiments.
The thesis at hand is concerned with improving our understanding of and our control over transport properties of the three-dimensional topological insulator HgTe. Topological insulators are characterized by an insulating bulk and symmetry-protected metallic surface states. These topological surface states hold great promise for research and technology; at the same time, many properties of experimentally accessible topological insulator materials still need to be explored thoroughly. The overall aim of this thesis was to experimentally investigate micrometer-sized HgTe transport devices to observe the ballistic transport regime as well as intercarrier scattering and possibly identify special properties of the topological surface states.
Part I of the thesis presents lithographic developments concerned with etching small HgTe devices. The aim was to replace existing processes which relied on dry etching with high-energy \(\text{Ar}^+\) ions and an organic etch mask. This etching method is known to degrade the HgTe crystal quality. In addition, the etch mask turned out to be not durable for long etching processes and difficult to remove completely after etching. First, \(\text{BaF}_2\) was introduced as a new etch mask for dry etching to replace the organic etch mask. With common surface characterization techniques like SEM and XPS it was shown that \(\text{BaF}_2\) etch masks are easy to deposit, highly durable in common dry etching processes for \(\text{Hg}_{1-x}\text{Cd}_x\text{Te}\), and easy to remove in deionized water. Transport results of HgTe devices fabricated with the new etch mask are comparable to results obtained with the old process. At the same time, the new etch mask can withstand longer etching times and does not cause problems due to incomplete removal. Second, a new inductively coupled plasma dry etching process based on \(\text{CH}_4\) and Ar was introduced. This etching process is compatible with \(\text{BaF}_2\) etch masks and yields highly reproducible results. Transport results indicate that the new etching process does not degrade the crystal quality and is suitable to produce high-quality transport devices even in the micrometer range. A comparison with wet-etched samples shows that inductively coupled plasma etching introduces a pronounced edge roughness. This - usually undesirable - property is actually beneficial for some of the experiments in this study and mostly irrelevant for others. Therefore, most samples appearing in this thesis were fabricated with the new process.
Part II of the thesis details the advancements made in identifying topological and trivial states which contribute to transport in HgTe three-dimensional topological insulators. To this end, macroscopic Hall bar samples were fabricated from high-quality tensilely strained HgTe layers by means of the improved lithographic processes. All samples were equipped with a top gate electrode, and some also with a modulation doping layer or a back gate electrode to modify the carrier density of the surface states on both sides of the HgTe layer. Due to the high sample quality, Landau levels could be well-resolved in standard transport measurements down to magnetic fields of less than 0.5T. High-resolution measurements of the Landau level dispersion with gate voltage and magnetic field allowed disentangling different transport channels. The main result here is that the upper (electron) branches of the two topological surface states contribute to transport in all experimentally relevant density regimes, while the hole branch is not accessible. Far in n-regime bulk conduction band states give a minor contribution to transport. More importantly, trivial bulk valence band holes come into play close to the charge neutrality point. Further in p-regime, the strong applied gate voltage leads to the formation of two-dimensional, massive hole states at the HgTe surface. The interplay of different states gives rise to rich physics: Top gate-back gate maps revealed that an anticrossing of Landau levels from the two topological surface states occurs at equal filling. A possible explanation for this effect is a weak hybridization of the surface states; however, future studies need to further clarify this point. Furthermore, the superposition of n-type topological and p-type trivial surface states leads to an intriguing Landau level dispersion. The good quantization of the Hall conductance in this situation indicates that the counterpropagating edge states interact with each other. The nature of this interaction will be the topic of further research.
Part III of the thesis is focused on HgTe microstructures. These "channel samples" have a typical width of 0.5 to 4µm and a typical length of 5 to 80µm. The quality of these devices benefits particularly from the improved lithographic processes. As a result, the impurity mean free path of the topological surface state electrons is on the order of the device width and transport becomes semiballistic. This was verified by measuring the channel resistance in small magnetic fields in n-regime. The deflection of carriers towards the dissipative channel walls results in a pronounced peak in the magnetoresistance, which scales in a predictable manner with the channel width. To investigate transport effects due to mutual scattering of charge carriers, the differential resistance of channel samples was measured as a function of carrier temperature. Selective heating of the charge carriers - but not the lattice - was achieved by passing a heating current through the channel. Increasing the carrier temperature has two pronounced effects when the Fermi level is situated in proximity to the bulk valence band maximum where the density of states is large. First, when both topological surface state electrons and bulk holes are present, electron-hole scattering leads to a pronounced increase in resistance with increasing carrier temperature. Second, a thermally induced increase of the electron and hole carrier densities reduces the resistance again at higher temperatures. A model considering these two effects was developed, which can well reproduce the experimental results. Current heating experiments in zero-gap HgTe quantum wells and compressively strained HgTe layers are consistent with this model. These observations raise the question as to how electron-hole scattering may affect other transport properties of HgTe-based three-dimensional topological insulators, which is briefly discussed in the outlook.
Realization and Spectroscopy of the Quantum Spin Hall Insulator Bismuthene on Silicon Carbide
(2022)
Topological matter is one of the most vibrant research fields of contemporary solid state physics since the theoretical prediction of the quantum spin Hall effect in graphene in 2005. Quantum spin Hall insulators possess a vanishing bulk conductivity but symmetry-protected, helical edge states that give rise to dissipationless charge transport.
The experimental verification of this exotic state of matter in 2007 lead to a boost of research activity in this field, inspired by possible ground-breaking future applications.
However, the use of the quantum spin Hall materials available to date is limited to cryogenic temperatures owing to their comparably small bulk band gaps.
In this thesis, we follow a novel approach to realize a quantum spin Hall material with a large energy gap and epitaxially grow bismuthene, i.e., Bi atoms adopting a honeycomb lattice, in a \((\sqrt{3}\times\sqrt{3})\) reconstruction on the semiconductor SiC(0001). In this way, we profit both from the honeycomb symmetry as well as the large spin-orbit coupling of Bi, which, in combination, give rise to a topologically non-trivial band gap on the order of one electronvolt.
An in-depth theoretical analysis demonstrates that the covalent bond between the Si and Bi atoms is not only stabilizing the Bi film but is pivotal to attain the quantum spin Hall phase.
The preparation of high-quality, unreconstructed SiC(0001) substrates sets the basis for the formation of bismuthene and requires an extensive procedure in ultra-pure dry H\(_2\) gas. Scanning tunneling microscopy measurements unveil the (\(1\times1\)) surface periodicity and smooth terrace planes, which are suitable for the growth of single Bi layers by means of molecular beam epitaxy. The chemical configuration of the resulting Bi film and its oxidation upon exposure to ambient atmosphere are inspected with X-ray photoelectron spectroscopy.
Angle-resolved photoelectron spectroscopy reveals the excellent agreement of probed and calculated band structure. In particular, it evidences a characteristic Rashba-splitting of the valence bands at the K point. Scanning tunneling spectroscopy probes signatures of this splitting, as well, and allows to determine the full band gap with a magnitude of \(E_\text{gap}\approx0.8\,\text{eV}\).
Constant-current images and local-density-of-state maps confirm the presence of a planar honeycomb lattice, which forms several domains due to different, yet equivalent, nucleation sites of the (\(\sqrt{3}\times\sqrt{3}\))-Bi reconstruction.
Differential conductivity measurements demonstrate that bismuthene edge states evolve at atomic steps of the SiC substrate. The probed, metallic local density of states is in agreement with the density of states expected from the edge state's energy dispersion found in density functional theory calculations - besides a pronounced dip at the Fermi level.
By means of temperature- and energy-dependent tunneling spectroscopy it is shown that the spectral properties of this suppressed density of states are successfully captured in the framework of the Tomonaga-Luttinger liquid theory and most likely originate from enhanced electronic correlations in the edge channel.