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Molecular beam epitaxy of TmTe thin films on SrF\(_{2}\) (111)

Zitieren Sie bitte immer diese URN: urn:nbn:de:bvb:20-opus-300876
  • The odd parity nature of 4f states characterized by strong spin–orbit coupling and electronic correlations has led to a search for novel topological phases among rare earth compounds, such as Kondo systems, heavy Fermions, and homogeneous mixed-valent materials. Our target system is thulium telluride thin films whose bandgap is expected to be tuned as a function of lattice parameter. We systematically investigate the growth conditions of TmxTey thin films on SrF\(_{2}\) (111) substrates by molecular beam epitaxy. The ratio between Te and TmThe odd parity nature of 4f states characterized by strong spin–orbit coupling and electronic correlations has led to a search for novel topological phases among rare earth compounds, such as Kondo systems, heavy Fermions, and homogeneous mixed-valent materials. Our target system is thulium telluride thin films whose bandgap is expected to be tuned as a function of lattice parameter. We systematically investigate the growth conditions of TmxTey thin films on SrF\(_{2}\) (111) substrates by molecular beam epitaxy. The ratio between Te and Tm supply was precisely tuned, resulting in two different crystalline phases, which were confirmed by x-ray diffraction and x-ray photoemission spectroscopy. By investigating the crystalline quality as a function of the substrate temperature, the optimal growth conditions were identified for the desired Tm1Te1 phase. Additional low energy electron diffraction and reflective high energy electron diffraction measurements confirm the epitaxial growth of TmTe layers. X-ray reflectivity measurements demonstrate that homogeneous samples with sharp interfaces can be obtained for varied thicknesses. Our results provide a reliable guidance to prepare homogeneous high-quality TmTe thin films and thus serve as a basis for further electronic investigations.zeige mehrzeige weniger

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Metadaten
Autor(en): S. Müller, F. Spriestersbach, C.-H. Min, C. I. Fornari, F. Reinert
URN:urn:nbn:de:bvb:20-opus-300876
Dokumentart:Artikel / Aufsatz in einer Zeitschrift
Institute der Universität:Fakultät für Physik und Astronomie / Physikalisches Institut
Sprache der Veröffentlichung:Englisch
Titel des übergeordneten Werkes / der Zeitschrift (Englisch):AIP Advances
Erscheinungsjahr:2022
Band / Jahrgang:12
Heft / Ausgabe:2
Aufsatznummer:025319
Originalveröffentlichung / Quelle:AIP Advances 2022, 12(2):025319. DOI: 10.1063/5.0083276
DOI:https://doi.org/10.1063/5.0083276
Allgemeine fachliche Zuordnung (DDC-Klassifikation):5 Naturwissenschaften und Mathematik / 53 Physik / 530 Physik
Freie Schlagwort(e):molecular beam epitaxy; thin films; thulium telluride
Datum der Freischaltung:03.04.2023
Sammlungen:Open-Access-Publikationsfonds / Förderzeitraum 2022
Lizenz (Deutsch):License LogoCC BY: Creative-Commons-Lizenz: Namensnennung