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Thermal effects on (100) CdZnTe substrates as studied by x-ray photoelectron spectroscopy and reflection high energy electron diffraction

Zitieren Sie bitte immer diese URN: urn:nbn:de:bvb:20-opus-37801
  • The influence of different CdZnTe substrate treatments prior to II-VI molecular beam epitaxial growth on surface stoichiometry, oxygen, and carbon contamination has been studied using x-ray photoelectron spectroscopy and reflection high energy electron diffraction. Heating the substrate at 300 °C can eliminate oxygen contamination, but cannot completely remove carbon from the surface. Heating at higher temperatures decreases the carbon contamination only slightly, while increasing the Zn-Cd ratio on the surface considerably. The magnitude ofThe influence of different CdZnTe substrate treatments prior to II-VI molecular beam epitaxial growth on surface stoichiometry, oxygen, and carbon contamination has been studied using x-ray photoelectron spectroscopy and reflection high energy electron diffraction. Heating the substrate at 300 °C can eliminate oxygen contamination, but cannot completely remove carbon from the surface. Heating at higher temperatures decreases the carbon contamination only slightly, while increasing the Zn-Cd ratio on the surface considerably. The magnitude of the latter effect is surprising and is crucial when one is using lattice matched CdZnTe (Zn 4%) substrates.zeige mehrzeige weniger

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Metadaten
Autor(en): Y. S. Wu, Charles R. Becker, A. Waag, R. N. Bicknell-Tassius, G. Landwehr
URN:urn:nbn:de:bvb:20-opus-37801
Dokumentart:Artikel / Aufsatz in einer Zeitschrift
Institute der Universität:Fakultät für Physik und Astronomie / Physikalisches Institut
Sprache der Veröffentlichung:Englisch
ISSN:0003-6951
Erscheinungsjahr:1992
Originalveröffentlichung / Quelle:In: Applied Physics Letters (1992) 60, 15, 1878-1880.
Allgemeine fachliche Zuordnung (DDC-Klassifikation):5 Naturwissenschaften und Mathematik / 53 Physik / 530 Physik
Datum der Freischaltung:23.09.2009
Lizenz (Deutsch):License LogoDeutsches Urheberrecht